PHYSICAL VAPOR DEPOSITION PROCESS AND APPARATUS THEREFOR
    1.
    发明申请
    PHYSICAL VAPOR DEPOSITION PROCESS AND APPARATUS THEREFOR 审中-公开
    物理蒸气沉积工艺及其设备

    公开(公告)号:US20070160775A1

    公开(公告)日:2007-07-12

    申请号:US11306740

    申请日:2006-01-10

    IPC分类号: C23C8/00 C23C16/00

    摘要: A PVD process and apparatus for depositing a coating from multiple sources of materials with different vapor pressures. The process entails forming molten pools of different first and second materials in a coating chamber of the apparatus, supporting an article within the chamber, and evaporating the molten pools with an energy beam to deposit a coating on the article with a controlled composition that contains at least a first metal and a relatively lesser amount of at least one reactive metal having a lower vapor pressure than the first metal. The first material contains at least the first metal, and the second material contains the reactive metal and at least a second metal. The second and reactive metals are combined to cause the second material to have a lower melting temperature and wider melting range than the reactive metal.

    摘要翻译: 用于从具有不同蒸汽压力的多种材料源沉积涂层的PVD工艺和设备。 该方法需要在装置的涂覆室中形成不同的第一和第二材料的熔池,在室内支撑物品,并用能量束蒸发熔池,以将涂层沉积在具有受控组成的包含在 至少一种第一金属和相对较少量的至少一种具有比第一金属更低的蒸气压的活性金属。 第一材料至少包含第一金属,第二材料包含反应性金属和至少第二金属。 将第二和反应性金属组合以使第二材料具有比反应性金属更低的熔融温度和更宽的熔化范围。