MASK ASSIGNMENT FOR MULTIPLE PATTERNING LITHOGRAPHY
    1.
    发明申请
    MASK ASSIGNMENT FOR MULTIPLE PATTERNING LITHOGRAPHY 有权
    多功能拼图的掩蔽分配

    公开(公告)号:US20130061185A1

    公开(公告)日:2013-03-07

    申请号:US13223706

    申请日:2011-09-01

    IPC分类号: G06F17/50

    摘要: A mechanism is provided for mask assignment for triple patterning lithography. The mechanism identifies tip-to-tip (TT), tip-to-side (TS), and side-to-side (SS) conflicting parts by design rule dependent projection. The mechanism finds stitch location for TT, TS, and SS conflicts separately. The mechanism colors TT, TS, and SS conflicting parts with mask0/mask1, mask0/mask2, mask1/mask2 coloring cycle with each type colored separately. The mechanism uses existing infrastructure of two-way coloring. As a first objective, the mechanism attempts to minimize conflicts. As a second objective, the mechanism attempts to minimize the number of stitches by assigning the two sides of stitches to the same mask. Once coloring of all conflicting parts is done, the mechanism colors non-conflicting parts to maximize minimum overlap of exposures and to use both colors if two sides are different colors and one color if both sides are the same color.

    摘要翻译: 提供了用于三重图案化光刻的掩模分配的机构。 该机制通过设计规则相关的投影来识别尖端到尖端(TT),尖端到侧面(TS)以及侧向(SS)冲突部分。 该机制分别查找TT,TS和SS冲突的针脚位置。 机制颜色TT,TS和SS冲突部分与mask0 / mask1,mask0 / mask2,mask1 / mask2着色循环,每种类型分别着色。 该机制使用现有的双向着色基础设施。 作为第一个目标,该机制试图尽量减少冲突。 作为第二个目的,该机构通过将针脚的两侧分配到相同的面罩来尝试最小化线迹数。 一旦完成所有冲突部分的着色,该机制将颜色非冲突部分,以最大化曝光的最小重叠,并且如果双面是不同的颜色,则使用两种颜色,如果两面是相同颜色,则使用一种颜色。

    Resolving double patterning conflicts
    2.
    发明授权
    Resolving double patterning conflicts 有权
    解决双重图案冲突

    公开(公告)号:US08359556B1

    公开(公告)日:2013-01-22

    申请号:US13171530

    申请日:2011-06-29

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5081

    摘要: A mechanism is provided for resolving patterning conflicts. The mechanism performs decomposition with stitches at all candidate locations to find the solution with the minimum number of conflicts. The mechanism then defines interactions between a layout of a first mask and a layout of a second mask through design rules, as well as interactions of mask1/mask2 with top and bottom layers (i.e., contacts, vial, etc.). The mechanism then gives the decomposed layout and design rule definition to any existing design rule fixing or layout compaction tool to solve native conflicts. The modified design rules are that same-layer spacing equals spacing of single patterning, different-layer spacing equals spacing of final layout, and layer overlap equals minimum overlap length.

    摘要翻译: 提供了解决图案化冲突的机制。 该机制用所有候选位置的针迹进行分解,以最小冲突次数找到解决方案。 该机制然后通过设计规则定义第一掩模的布局和第二掩模的布局之间的相互作用,以及mask1 / mask2与顶层和底层(即,触点,小瓶等)的相互作用。 然后,该机制将分解的布局和设计规则定义提供给任何现有的设计规则修复或布局压缩工具来解决本机冲突。 修改后的设计规则是同层间距等于单一图案间距,不同层间距等于最终布局间距,层重叠等于最小重叠长度。

    Multiple patterning layout decomposition for ease of conflict removal
    3.
    发明授权
    Multiple patterning layout decomposition for ease of conflict removal 有权
    多重图案化布局分解,便于冲突删除

    公开(公告)号:US08516403B2

    公开(公告)日:2013-08-20

    申请号:US13223844

    申请日:2011-09-01

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5068

    摘要: A mechanism is provided for multiple patterning lithography with conflict removal aware coloring. The mechanism makes multiple patterning coloring aware of the conflict removal overhead. The coloring solution explicitly considers ease of conflict removal as one of the coloring objectives. The mechanism pre-computes how much shapes can move in each direction. The mechanism generates a conflict graph where nodes represent shapes in the layout and edges represent conflicts between shapes. The mechanism assigns weights to edges based on available spatial slack between conflicting features. The mechanism then uses the weights to guide multiple patterning coloring. The mechanism prioritizes conflicting features with higher weights to be assigned different colors.

    摘要翻译: 提供了一种用于具有冲突消除意识着色的多重图案化光刻的机构。 该机制使得多个图案化着色意识到冲突移除开销。 着色解决方案明确地将冲突移除的容易性作为着色目标之一。 该机制预先计算出每个方向上可以移动多少形状。 该机制生成一个冲突图,其中节点表示布局中的形状,边缘表示形状之间的冲突。 该机制基于冲突特征之间的可用空间松弛来为边缘分配权重。 该机构然后使用重量来引导多个图案化着色。 该机制优先处理具有较高权重的冲突特征,以分配不同的颜色。

    Mask assignment for multiple patterning lithography
    4.
    发明授权
    Mask assignment for multiple patterning lithography 有权
    多重图案平版印刷的掩模分配

    公开(公告)号:US08434033B2

    公开(公告)日:2013-04-30

    申请号:US13223706

    申请日:2011-09-01

    IPC分类号: G06F17/50

    摘要: A mechanism is provided for mask assignment for triple patterning lithography. The mechanism identifies tip-to-tip (TT), tip-to-side (TS), and side-to-side (SS) conflicting parts by design rule dependent projection. The mechanism finds stitch location for TT, TS, and SS conflicts separately. The mechanism colors TT, TS, and SS conflicting parts with mask0/mask1, mask0/mask2, mask1/mask2 coloring cycle with each type colored separately. The mechanism uses existing infrastructure of two-way coloring. As a first objective, the mechanism attempts to minimize conflicts. As a second objective, the mechanism attempts to minimize the number of stitches by assigning the two sides of stitches to the same mask. Once coloring of all conflicting parts is done, the mechanism colors non-conflicting parts to maximize minimum overlap of exposures and to use both colors if two sides are different colors and one color if both sides are the same color.

    摘要翻译: 提供了用于三重图案化光刻的掩模分配的机构。 该机制通过设计规则相关的投影来识别尖端到尖端(TT),尖端到侧面(TS)以及侧向(SS)冲突部分。 该机制分别查找TT,TS和SS冲突的针脚位置。 机制颜色TT,TS和SS冲突部分与mask0 / mask1,mask0 / mask2,mask1 / mask2着色循环,每种类型分别着色。 该机制使用现有的双向着色基础设施。 作为第一个目标,该机制试图尽量减少冲突。 作为第二个目的,该机构通过将针脚的两侧分配到相同的面罩来尝试最小化线迹数。 一旦完成所有冲突部分的着色,该机制将颜色非冲突部分,以最大化曝光的最小重叠,并且如果双面是不同的颜色,则使用两种颜色,如果两面是相同颜色,则使用一种颜色。

    Multiple Patterning Layout Decomposition for Ease of Conflict Removal
    5.
    发明申请
    Multiple Patterning Layout Decomposition for Ease of Conflict Removal 有权
    多种图案化布局分解,易于冲突移除

    公开(公告)号:US20130061183A1

    公开(公告)日:2013-03-07

    申请号:US13223844

    申请日:2011-09-01

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5068

    摘要: A mechanism is provided for multiple patterning lithography with conflict removal aware coloring. The mechanism makes multiple patterning coloring aware of the conflict removal overhead. The coloring solution explicitly considers ease of conflict removal as one of the coloring objectives. The mechanism pre-computes how much shapes can move in each direction, The mechanism generates a conflict graph where nodes represent shapes in the layout and edges represent conflicts between shapes. The mechanism assigns weights to edges based on available spatial slack between conflicting features, The mechanism then uses the weights to guide multiple patterning coloring. The mechanism prioritizes conflicting features with higher weights to be assigned different colors.

    摘要翻译: 提供了一种用于具有冲突消除意识着色的多重图案化光刻的机构。 该机制使得多个图案化着色意识到冲突移除开销。 着色解决方案明确地将冲突移除的容易性作为着色目标之一。 该机制预先计算出每个方向可以移动多少形状。机制生成一个冲突图,其中节点表示布局中的形状,边缘表示形状之间的冲突。 该机制基于冲突特征之间可用的空间松弛来为边缘分配权重。然后,机构使用权重来引导多个图案化着色。 该机制优先处理具有较高权重的冲突特征,以分配不同的颜色。

    RESOLVING DOUBLE PATTERNING CONFLICTS
    6.
    发明申请
    RESOLVING DOUBLE PATTERNING CONFLICTS 有权
    解决双重文字冲突

    公开(公告)号:US20130007674A1

    公开(公告)日:2013-01-03

    申请号:US13171530

    申请日:2011-06-29

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5081

    摘要: A mechanism is provided for resolving patterning conflicts. The mechanism performs decomposition with stitches at all candidate locations to find the solution with the minimum number of conflicts. The mechanism then defines interactions between a layout of a first mask and a layout of a second mask through design rules, as well as interactions of mask1/mask2 with top and bottom layers (i.e., contacts, vial, etc.). The mechanism then gives the decomposed layout and design rule definition to any existing design rule fixing or layout compaction tool to solve native conflicts. The modified design rules are that same-layer spacing equals spacing of single patterning, different-layer spacing equals spacing of final layout, and layer overlap equals minimum overlap length.

    摘要翻译: 提供了解决图案化冲突的机制。 该机制用所有候选位置的针迹进行分解,以最小冲突次数找到解决方案。 该机制然后通过设计规则定义第一掩模的布局和第二掩模的布局之间的相互作用,以及mask1 / mask2与顶层和底层(即,触点,小瓶等)的相互作用。 然后,该机制将分解的布局和设计规则定义提供给任何现有的设计规则修复或布局压缩工具来解决本机冲突。 修改的设计规则是同层间距等于单一图案的间距,不同层间距等于最终布局的间距,层重叠等于最小重叠长度。

    Method and test system for fast determination of parameter variation statistics
    7.
    发明授权
    Method and test system for fast determination of parameter variation statistics 有权
    方法和测试系统,用于快速确定参数变化统计

    公开(公告)号:US08862426B2

    公开(公告)日:2014-10-14

    申请号:US11961442

    申请日:2007-12-20

    摘要: A method and test system for fast determination of parameter variation statistics provides a mechanism for determining process variation and parameter statistics using low computing power and readily available test equipment. A test array having individually selectable devices is stimulated under computer control to select each of the devices sequentially. A test output from the array provides a current or voltage that dependent on a particular device parameter. The sequential selection of the devices produces a voltage or current waveform, characteristics of which are measured using a digital multi-meter that is interfaced to the computer. The rms value of the current or voltage at the test output is an indication of the standard deviation of the parameter variation and the DC value of the current or voltage is an indication of the mean value of the parameter.

    摘要翻译: 用于快速确定参数变化统计的方法和测试系统提供了使用低计算能力和容易获得的测试设备来确定过程变化和参数统计的机制。 在计算机控制下刺激具有可单独选择的装置的测试阵列以依次选择每个装置。 阵列的测试输出提供依赖于特定器件参数的电流或电压。 器件的顺序选择产生电压或电流波形,其特性使用与计算机连接的数字万用表进行测量。 测试输出端的电流或电压的有效值表示参数变化的标准偏差,电流或电压的直流值表示参数的平均值。

    Data compression utilizing longest common subsequence template
    8.
    发明授权
    Data compression utilizing longest common subsequence template 失效
    使用最长公共子序列模板的数据压缩

    公开(公告)号:US08674856B2

    公开(公告)日:2014-03-18

    申请号:US13587669

    申请日:2012-08-16

    IPC分类号: H03M7/34

    CPC分类号: H03M7/30 H03M7/607

    摘要: In response to receipt of an input string, an attempt is made to identify, in a template store, a closely matching template for use as a compression template. In response to identification of a closely matching template that can be used as a compression template, the input string is compressed into a compressed string by reference to a longest common subsequence compression template. Compressing the input string includes encoding, in a compressed string, an identifier of the compression template, encoding substrings of the input string not having commonality with the compression template of at least a predetermined length as literals, and encoding substrings of the input string having commonality with the compression template of at least the predetermined length as a jump distance without reference to a base location in the compression template. The compressed string is then output.

    摘要翻译: 响应于输入字符串的接收,尝试在模板存储器中识别紧密匹配的模板以用作压缩模板。 响应于可以用作压缩模板的紧密匹配的模板的识别,通过参考最长的公共子序列压缩模板将输入字符串压缩成压缩字符串。 压缩输入字符串包括在压缩字符串中编码压缩模板的标识符,将与压缩模板具有至少预定长度的压缩模板不一致的输入字符串的子串编码为文字,以及编码具有共同性的输入字符串的子串 至少具有预定长度的压缩模板作为跳跃距离,而不参考压缩模板中的基本位置。 然后输出压缩字符串。

    METHOD FOR POST DECOMPOSITION DENSITY BALANCING IN INTEGRATED CIRCUIT LAYOUTS, RELATED SYSTEM AND PROGRAM PRODUCT
    9.
    发明申请
    METHOD FOR POST DECOMPOSITION DENSITY BALANCING IN INTEGRATED CIRCUIT LAYOUTS, RELATED SYSTEM AND PROGRAM PRODUCT 有权
    一体化电路中分解密度平衡的方法,相关系统和程序产品

    公开(公告)号:US20140065728A1

    公开(公告)日:2014-03-06

    申请号:US13596126

    申请日:2012-08-28

    IPC分类号: H01L21/66 G05B19/418

    摘要: Embodiments of the invention provide a method of modifying a decomposed integrated circuit (IC) layout. The method includes providing a decomposed IC layout, the decomposed IC layout including a set of colors; determining a density of each color in the decomposed IC layout, wherein each color includes a plurality of features formed by a related exposure; separating the decomposed IC layout into a set of tiles; determining a first color with a minimum density in one tile of the set of tiles and a second color with a maximum density in tile, the first color including a first set of first features and the second color including a first set of second features; and replacing the first set of second features on the tile with a second set of first features, and the first set of first features on the tile with a second set of second features.

    摘要翻译: 本发明的实施例提供了一种修改分解的集成电路(IC)布局的方法。 该方法包括提供分解的IC布局,分解的IC布局包括一组颜色; 确定分解的IC布局中的每种颜色的浓度,其中每种颜色包括通过相关曝光形成的多个特征; 将分解的IC布局分离成一组瓦片; 确定所述瓦片组中的一个瓦片中具有最小密度的第一颜色和具有瓦片中最大密度的第二颜色,所述第一颜色包括第一组第一特征,所述第二颜色包括第一组第二特征; 以及用第二组第一特征替换所述瓦片上的所述第一组第二特征,以及所述瓦片上的所述第一组第一特征具有第二组第二特征。

    High Speed Large Scale Dictionary Matching
    10.
    发明申请
    High Speed Large Scale Dictionary Matching 有权
    高速大字典匹配

    公开(公告)号:US20130332146A1

    公开(公告)日:2013-12-12

    申请号:US13490832

    申请日:2012-06-07

    IPC分类号: G06F17/21

    CPC分类号: G06F17/2735

    摘要: A mechanism is provided for dictionary matching. The mechanism loads a plurality of dictionary memory arrays with a set of dictionary words and updates a plurality of status arrays. Each status array of the plurality of status arrays corresponds to a respective one of the plurality of dictionary memory arrays. Each entry of a given status array stores a status bit, which indicates whether a corresponding entry of the corresponding dictionary memory array stores a valid dictionary word. The mechanism receives an input data word and generates a hash value based on the input data word. The mechanism reads a dictionary word from each of the dictionary memory arrays and a status bit from each of the status arrays using the hash value as a read address. The mechanism determines whether a dictionary memory array within the plurality of dictionary memory arrays stores a valid dictionary word that matches the input data word.

    摘要翻译: 提供了字典匹配的机制。 该机构使用一组字典字加载多个字典存储器阵列并更新多个状态阵列。 多个状态阵列中的每个状态阵列对应于多个字典存储器阵列中的相应一个。 给定状态阵列的每个条目存储状态位,其指示对应的字典存储器阵列的相应条目是否存储有效的字典字。 该机制接收输入数据字,并根据输入数据字生成哈希值。 该机制使用散列值作为读取地址从每个字典存储器阵列读取字典字,并从每个状态数组中读取状态位。 该机构确定多个字典存储器阵列内的字典存储器阵列是否存储与输入数据字匹配的有效字典字。