摘要:
The invention relates to a method and a device (16) for detecting volatile analytes in air samples, where a mass sensitive sensor (20) with at least one sensor area (21) which is equipped with a surface layer with selective sensitivity for the analyte(s) to be detected is brought into contact with the air sample to be analyzed, the mass change of the surface layer is detected in the form of electrical signals and the electrical signals are evaluated. It is provided in accordance with the invention that the sensor signal is already evaluated at a point in time at which the maximum sensor signal for the analyte concentration in question is not yet obtained.
摘要:
The present invention relates to a method and a device for detecting fumigants in air samples. The device can be designed for example as a portable analyzer 10 equipped with a stab probe 11 for sampling soil air. There are provided detection means 16 which, upon contact with the air sample, generate electrical signals which depend on the concentration of the fumigants to be detected in the air sample. In accordance with the invention, the detection means 16 comprise at least one mass-sensitive sensor, for example an array of quartz microbalances, which have suitable selective surface layers.
摘要:
The invention relates to a method and a device (16) for detecting volatile analytes in air samples, where a masssensitive sensor (20) with at least one sensor area (21) which is equipped with a surface layer with selective sensitivity for the analyte(s) to be detected is brought into contact with the air sample to be analyzed, the mass change of the surface layer is detected in the form of electrical signals and the electrical signals are evaluated. It is provided in accordance with the invention that the sensor signal is already evaluated at a point in time at which the maximum sensor signal for the analyte concentration in question is not yet obtained.
摘要:
A photoresist that has strong resistance to reactive ion etching, high photosensitivity to mid- and deep UV-light, and high resolution capability is formed by using as the resist material a copolymer of methacrylonitrile and methacrylic acid, and by baking the resist before the exposure to light for improved photosensitivity, and after exposure to light, development, and prior to treatment with reactive ion etching.
摘要:
A process for forming an image with a positive resist using a polymer containing dimethylglutarimide units. The polymer is sensitive to both electron beam and light radiation, has a high glass transition temperature, a high temperature resistance, and is capable of very fine spatial resolution, very suitable for micro circuitry processings.
摘要:
The invention relates to a process for hydrogen transfer to chemical compounds, wherein hydrogen transfer is carried out in a supercritical or subcritical phase using stabilized and dispersed metal particles. The invention further provides for the use of metal colloids stabilized by organic compounds or embedded in organic compounds as catalysts in a process for hydrogen transfer to chemical compounds in a supercritical or subcritical phase so as to avoid the formation of free-radical intermediates during hydrogen transfer.