Enhanced cooling IMP coil support
    1.
    发明授权
    Enhanced cooling IMP coil support 有权
    增强冷却IMP线圈支持

    公开(公告)号:US06376807B1

    公开(公告)日:2002-04-23

    申请号:US09350619

    申请日:1999-07-09

    IPC分类号: H05B338

    CPC分类号: H01L21/67103

    摘要: The present invention generally provides a substrate processing system having a thermally conductive and electrically insulative member coupled to a heated member that provides for heat dissipation from the heated member. In a preferred embodiment, the present invention provides for heat dissipation through thermal conductance of an electrically insulated coil in an IMP reaction chamber.

    摘要翻译: 本发明通常提供一种基板处理系统,其具有耦合到加热构件的导热和电绝缘构件,其提供来自加热构件的散热。 在优选实施例中,本发明通过IMP反应室中的电绝缘线圈的热传导提供散热。

    Methods and apparatus for ionized metal plasma copper deposition with enhanced in-film particle performance
    3.
    发明授权
    Methods and apparatus for ionized metal plasma copper deposition with enhanced in-film particle performance 失效
    用于电离金属等离子体铜沉积的方法和装置,具有增强的膜内颗粒性能

    公开(公告)号:US06235163B1

    公开(公告)日:2001-05-22

    申请号:US09350556

    申请日:1999-07-09

    IPC分类号: C23C1434

    摘要: An improved system for performing plasma enhanced PVD of copper, aluminum, tungsten or other metallic material is disclosed. The system has markedly improved performance in the critical area of unwanted in-film particle deposits. The improved performance is provided by lowering the operating temperature of the RF coil used in the plasma enhanced PVD system and by carefully smoothing the outer surface of the RF coil. High conductivity material in the coil supports, increased contact area between the coil supports and the RF coil, and the use of active cooling of the coil further enhance the performance of the system.

    摘要翻译: 公开了一种用于执行铜,铝,钨或其它金属材料的等离子体增强PVD的改进的系统。 该系统在不需要的膜内颗粒沉积的关键区域显着改善了性能。 通过降低等离子体增强PVD系统中使用的RF线圈的工作温度以及仔细地平滑RF线圈的外表面来提供改进的性能。 线圈支架中的高导电性材料,线圈支架与RF线圈之间的接触面积增加,线圈主动冷却的使用进一步增强了系统的性能。

    Small epicyclic magnetron with controlled radial sputtering profile
    4.
    发明授权
    Small epicyclic magnetron with controlled radial sputtering profile 有权
    具有受控径向溅射特性的小型行星磁控管

    公开(公告)号:US06852202B2

    公开(公告)日:2005-02-08

    申请号:US10418710

    申请日:2003-04-17

    IPC分类号: C23C14/35 H01J37/34

    CPC分类号: H01J37/3408 H01J37/3455

    摘要: A small unbalanced magnet assembly is scanned in a retrograde planetary or epicyclic path about the back of a target being plasma sputtered including an orbital rotation about the center axis of the target and a planetary rotation about another axis rotating about the target center axis. The magnet assembly may pass through the target center, thus allowing full target coverage. A geared planetary mechanism may include a rotating drive plate, a fixed center gear, and an idler and a follower gear rotatably supported in the drive plate supporting a cantilevered magnet assembly on the side of the drive plate facing the target. The erosion profile may be controlled by varying the rotation rate through the rotation cycle or by modulating the target power. A second planetary stage may be added or non-circular gears be used. Auxiliary electromagnetic coils may create a focusing magnetic field.

    摘要翻译: 小型不平衡磁体组件以逆行星行星或行星路径围绕目标物的背面进行扫描,等离子体溅射包括围绕目标的中心轴线的轨道旋转和围绕围绕目标中心轴线旋转的另一轴线的行星旋转。 磁体组件可以穿过目标中心,从而允许完全的目标覆盖。 齿轮行星机构可以包括旋转驱动板,固定中心齿轮和惰轮以及可旋转地支撑在驱动板中的从动齿轮,该驱动板支撑在与驱动板对置的驱动板侧的悬臂磁体组件。 可以通过改变通过旋转周期的旋转速率或通过调节目标功率来控制侵蚀曲线。 可以添加第二行星级或使用非圆形齿轮。 辅助电磁线圈可产生聚焦磁场。