公开(公告)号：US20120081538A1

公开(公告)日：2012-04-05

申请号：US13242655

申请日：2011-09-23

申请人： Riki Ogawa ,  Masatoshi Hirono ,  Takeshi Nishizaka ,  Ryoichi Hirano ,  Ikunao Isomura ,  Kazuto Matsuki ,  Fumio Ozaki

发明人： Riki Ogawa ,  Masatoshi Hirono ,  Takeshi Nishizaka ,  Ryoichi Hirano ,  Ikunao Isomura ,  Kazuto Matsuki ,  Fumio Ozaki

IPC分类号： H04N7/18

CPC分类号： G01N21/956

摘要： This pattern inspection apparatus includes an inspection region information storage unit that stores an inspection region specified in a pattern region, a pattern surface height detection unit that detects a pattern surface height signal corresponding to a pattern surface height measurement position on the inspection sample, an autofocus mechanism that focuses on the inspection sample using the pattern surface height signal detected by the pattern surface height detection unit, a determination unit, and an autofocus mechanism control unit. When the determination unit determines that the pattern surface height measurement position is located within the inspection region, the autofocus mechanism control unit drives the autofocus mechanism, and the determination unit determines that the pattern surface height measurement position is not located within the inspection region, the autofocus mechanism control unit stops the autofocus mechanism.

摘要翻译： 该图案检查装置包括：检查区域信息存储单元，其存储在图案区域中指定的检查区域;图案表面高度检测单元，其检测与检查样品上的图案表面高度测量位置对应的图案表面高度信号;自动对焦 使用由图案表面高度检测单元，确定单元和自动对焦机构控制单元检测到的图案表面高度信号来关注检查样本的机构。 当确定单元确定图案表面高度测量位置位于检查区域内时，自动聚焦机构控制单元驱动自动聚焦机构，并且确定单元确定图案表面高度测量位置不位于检查区域内， 自动对焦机构控制单元停止自动对焦机构。

公开(公告)号：US07020323B2

公开(公告)日：2006-03-28

申请号：US10107427

申请日：2002-03-28

申请人： Takeshi Nishizaka ,  Toshiyuki Watanabe

发明人： Takeshi Nishizaka ,  Toshiyuki Watanabe

IPC分类号： G06K9/00

CPC分类号： G06T7/0002 ,  G06T2207/30148

摘要： A pattern defect inspection apparatus comprises an image sensor that generates object pattern data corresponding to the pattern of an object, a design data generator that generates design data representing a pattern to be formed on the object, a resizing device which subjects the design data to expansion or shrinkage process to generate resized pattern data, the resizing device detecting a direction of the pattern in a specific region of the design data, aligning the direction of the pattern of the design data with a specific direction, and recognizing and classifying the shape of the pattern of the design data, and a determining device configured to determine the defect of the pattern by comparing the resized pattern data with the object pattern data.