公开(公告)号：US20070071042A1

公开(公告)日：2007-03-29

申请号：US11278637

申请日：2006-04-04

申请人： Kazuto Matsuki

发明人： Kazuto Matsuki

IPC分类号： H01S3/10 ,  H01S3/00

CPC分类号： G02F1/3525

摘要： A method of operating a laser light source including a wavelength conversion device in which two wavelength laser beams are input to a nonlinear crystal to output a sum frequency wavelength, according to an embodiment of the present invention, comprises: inputting only one wavelength laser beam of the two input wavelength laser beams to the nonlinear crystal; measuring scattered light intensity of the one wavelength laser beam by a light sensitive sensor installed on an optical axis of the sum frequency wavelength output beam; and judging a damage state of the nonlinear crystal based on a measurement value obtained by the intensity measurement by the light sensitive sensor.

摘要翻译： 根据本发明的实施例，一种操作包括其中两个波长激光束被输入到非线性晶体以输出和频波长的波长转换装置的激光源的方法包括：仅输入一个波长激光束 两个输入波长激光束到非线性晶体; 通过安装在和频波长输出光束的光轴上的光敏传感器测量一个波长激光束的散射光强度; 并且基于通过光敏传感器的强度测量获得的测量值来判断非线性晶体的损伤状态。

公开(公告)号：US20120081538A1

公开(公告)日：2012-04-05

申请号：US13242655

申请日：2011-09-23

申请人： Riki Ogawa ,  Masatoshi Hirono ,  Takeshi Nishizaka ,  Ryoichi Hirano ,  Ikunao Isomura ,  Kazuto Matsuki ,  Fumio Ozaki

发明人： Riki Ogawa ,  Masatoshi Hirono ,  Takeshi Nishizaka ,  Ryoichi Hirano ,  Ikunao Isomura ,  Kazuto Matsuki ,  Fumio Ozaki

IPC分类号： H04N7/18

CPC分类号： G01N21/956

摘要： This pattern inspection apparatus includes an inspection region information storage unit that stores an inspection region specified in a pattern region, a pattern surface height detection unit that detects a pattern surface height signal corresponding to a pattern surface height measurement position on the inspection sample, an autofocus mechanism that focuses on the inspection sample using the pattern surface height signal detected by the pattern surface height detection unit, a determination unit, and an autofocus mechanism control unit. When the determination unit determines that the pattern surface height measurement position is located within the inspection region, the autofocus mechanism control unit drives the autofocus mechanism, and the determination unit determines that the pattern surface height measurement position is not located within the inspection region, the autofocus mechanism control unit stops the autofocus mechanism.

摘要翻译： 该图案检查装置包括：检查区域信息存储单元，其存储在图案区域中指定的检查区域;图案表面高度检测单元，其检测与检查样品上的图案表面高度测量位置对应的图案表面高度信号;自动对焦 使用由图案表面高度检测单元，确定单元和自动对焦机构控制单元检测到的图案表面高度信号来关注检查样本的机构。 当确定单元确定图案表面高度测量位置位于检查区域内时，自动聚焦机构控制单元驱动自动聚焦机构，并且确定单元确定图案表面高度测量位置不位于检查区域内， 自动对焦机构控制单元停止自动对焦机构。

公开(公告)号：US07359043B2

公开(公告)日：2008-04-15

申请号：US10743830

申请日：2003-12-24

申请人： Hideo Tsuchiya ,  Yoshihide Kato ,  Kazuto Matsuki ,  Yasushi Sanada ,  Riki Ogawa ,  Takuro Nagao

发明人： Hideo Tsuchiya ,  Yoshihide Kato ,  Kazuto Matsuki ,  Yasushi Sanada ,  Riki Ogawa ,  Takuro Nagao

IPC分类号： G01N21/00 ,  G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： A pattern inspecting method, comprising preparing a sample having a first and a second inspection regions and an imaging device having a plurality of pixels, scanning the first inspection region to a first direction using the imaging device to obtain a first measurement pattern representing at least parts of the first inspection region, scanning the second inspection region to the first direction using the imaging device to obtain a second measurement pattern representing at least parts of the second inspection region, comparing the first measurement pattern and the second measurement pattern with each other to determine presence or absence of a defect formed on the sample, and controlling a scanning condition for scanning a pattern of the second inspection region by the imaging device so as to keep the same with the scanning condition when the pattern of the first inspection region is scanned by the imaging device.

摘要翻译： 一种图案检查方法，包括准备具有第一和第二检查区域的样本和具有多个像素的成像装置，使用成像装置将第一检查区域扫描到第一方向，以获得表示至少部分的第一测量图案 使用所述成像装置将所述第二检查区域扫描到所述第一方向，以获得表示所述第二检查区域的至少一部分的第二测量图案，将所述第一测量图案和所述第二测量图案彼此进行比较，以确定 存在或不存在形成在样品上的缺陷，以及控制用于通过成像装置扫描第二检查区域的图案的扫描条件，以便当第一检查区域的图案被扫描时与扫描条件保持相同 成像装置。

公开(公告)号：US06313476B1

公开(公告)日：2001-11-06

申请号：US09459648

申请日：1999-12-13

申请人： Mitsuko Shimizu ,  Takayuki Abe ,  Hirohito Anze ,  Susumu Oogi ,  Takashi Kamikubo ,  Eiji Murakami ,  Yoshiaki Hattori ,  Tomohiro Iijima ,  Hitoshi Higurashi ,  Kazuto Matsuki

发明人： Mitsuko Shimizu ,  Takayuki Abe ,  Hirohito Anze ,  Susumu Oogi ,  Takashi Kamikubo ,  Eiji Murakami ,  Yoshiaki Hattori ,  Tomohiro Iijima ,  Hitoshi Higurashi ,  Kazuto Matsuki

IPC分类号： A61N500

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J2237/31769

摘要： A charged beam lithography system includes a charged particle gun for generating charged beams, a main deflecting system and a sub-deflecting system for deflecting the charged beams generated by the charged particle gun, and a control computer. The charged beam lithography system is designed to cause the surface of a substrate to be irradiated with the charged beams from the charged particle gun while continuously moving a stage, to write a desired pattern for each of stripes defined by the maximum deflection widths of the main deflecting system and the sub-deflecting system. The charged beam lithography system further comprises: a real time proximity effect correcting circuit for calculating an optimum dosage for each of the stripes by correcting the dosage of the electron beams in view of the influence of the proximity effect; and a cash memory for storing the optimum dosage data for at least two of the stripes. Thus, the charged beam lithography system is designed to shift a divided form of the whole written region using the stripes at each wiring number of times, by a predetermined distance from a predetermined reference position in a direction perpendicular to a stage continuous moving direction, while selectively extracting the optimum dosage data from the cash memory so as to correspond to each of written stripes at each writing number of times, to write patterns. During the writing operation, the optimum dosage data corresponding to the next region to be written are transferred from the real time proximity effect correcting circuit to the cash memory, and the real time proximity effect correcting circuit calculates optimum dosages for the stripes corresponding to regions to be written after next and thereafter.

摘要翻译： 带电束光刻系统包括用于产生带电束的带电粒子枪，用于偏转由带电粒子枪产生的带电束的主偏转系统和副偏转系统以及控制计算机。 带电光束光刻系统被设计成在连续移动平台的同时使来自带电粒子枪的带电束照射衬底的表面，以便为由主体的最大偏转宽度限定的条纹写入期望的图案 偏转系统和副偏转系统。 带电光束光刻系统还包括：实时邻近效应校正电路，用于通过根据邻近效应的影响校正电子束的剂量来计算每个条纹的最佳剂量; 以及用于存储至少两个条纹的最佳剂量数据的现金存储器。 因此，带电光束光刻系统被设计成使用每个布线次数的条纹将整个写入区域的分割形式沿垂直于平台连续移动方向的预定基准位置移动预定距离，同时 从现金存储器中选择性地提取最佳剂量数据，以便在每次写入次数时对应于每个写入条带，以写入模式。 在写入操作期间，对应于要写入的下一区域的最佳剂量数据从实时邻近效应校正电路传送到现金存储器，并且实时邻近效应校正电路针对与区域对应的条纹计算最佳剂量 写在下一个和之后。

公开(公告)号：US5894057A

公开(公告)日：1999-04-13

申请号：US887842

申请日：1997-07-03

申请人： Toshio Yamaguchi ,  Kazuto Matsuki ,  Shuichi Tamamushi ,  Souji Koikari ,  Eiji Murakami ,  Shigehiro Hara

发明人： Toshio Yamaguchi ,  Kazuto Matsuki ,  Shuichi Tamamushi ,  Souji Koikari ,  Eiji Murakami ,  Shigehiro Hara

IPC分类号： H01J37/305 ,  G03F7/20 ,  H01J37/302 ,  H01L21/027 ,  H01L21/302 ,  G03F9/00 ,  G03C5/00

CPC分类号： H01J37/3026 ,  G03F7/2065 ,  H01J2237/31764 ,  H01J2237/31767 ,  Y10S430/143

摘要： The present invention provides a charged beam drawing method comprising a first step of setting a stripe field independent of drawing pattern definition data and of determining the drawing pattern definition data which belongs to the stripe field set, a second step of setting a sub-field independent of the drawing pattern definition data and of determining the drawing pattern definition data which belongs to the sub-field, among the drawing pattern definition data determined, a third step of drawing the drawing pattern definition data which belongs to the sub-field onto an object to be subjected to drawing, a fourth step of shifting a position of the stripe field by a first predetermined value, and of shifting a position of the sub-field by a second predetermined value, and a fifth step of repeating the first to fourth steps for at least two times.

摘要翻译： 本发明提供了一种带电波束绘制方法，包括：第一步骤，设置与绘制图案定义数据无关的条带字段，并确定属于条带字段集的绘图模式定义数据;第二步，设置子场独立 并且在确定的绘图模式定义数据中确定属于该子场的绘图模式定义数据，以及将属于子场的绘图模式定义数据绘制到一个对象上的第三步骤 要进行绘制的第四步骤，将条纹域的位置移动第一预定值，并且将子场的位置移位第二预定值，第五步骤，重复第一至第四步骤 至少两次。

公开(公告)号：US5760410A

公开(公告)日：1998-06-02

申请号：US842508

申请日：1997-04-24

申请人： Kazuto Matsuki ,  Shuichi Tamamushi ,  Toshio Yamaguchi ,  Ryoichi Yoshikawa

发明人： Kazuto Matsuki ,  Shuichi Tamamushi ,  Toshio Yamaguchi ,  Ryoichi Yoshikawa

IPC分类号： G03F7/20 ,  H01J37/317 ,  H01L21/027 ,  H01J37/302

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31764 ,  H01J2237/31769

摘要： An electron beam lithography apparatus is provided for drawing a exposure pattern on a sample by dividing the exposure pattern into a plurality of pattern elements and individually directing the electron beam to the sample at the pattern element. The size of the pattern element is adjusted in accordance with a gradient of a spatial variation of a back scattering dose. By doing so, it is possible to suppress distortion at the exposure area of one shot and to suppress an uneven edge of an exposure area row. If the size of the pattern element is made uniformly smaller, the drawing throughput is markedly lowered. The sizes of the pattern element varies in accordance with the gradient of a spatial variation of the back scattering dose and it is, therefore, possible to suppress a fall in the drawing throughput.

摘要翻译： 提供一种电子束光刻设备，用于通过将曝光图案分成多个图案元素并将电子束单独地引导到图案元件处的样品，来将样品上的曝光图案绘制。 根据背散射剂量的空间变化的梯度来调整图案元素的尺寸。 通过这样做，可以抑制一次曝光区域的变形并抑制曝光区域行的不均匀边缘。 如果图案元件的尺寸均匀地变小，则绘图吞吐量显着降低。 图案元素的尺寸根据背散射剂量的空间变化的梯度而变化，因此可以抑制绘图生成量的下降。

公开(公告)号：US20130222782A1

公开(公告)日：2013-08-29

申请号：US13600123

申请日：2012-08-30

申请人： Kentaro KASA ,  Manabu Takakuwa ,  Ryoichi Inanami ,  Kazuto Matsuki ,  Tetsuro Nakasugi ,  Hiroshi Koizumi ,  Minoru Inomoto

发明人： Kentaro KASA ,  Manabu Takakuwa ,  Ryoichi Inanami ,  Kazuto Matsuki ,  Tetsuro Nakasugi ,  Hiroshi Koizumi ,  Minoru Inomoto

IPC分类号： G03B27/58

CPC分类号： G03F7/70783 ,  G03F7/707

摘要： According to one embodiment, a substrate holding apparatus includes a main unit and a plurality of first support units. The main unit has a major surface. The main unit has a plate configuration. The first support units are disposed on the major surface. Each of the first support units includes a suction-holding unit capable of holding a substrate by suction. The suction-holding unit is movable along a first direction perpendicular to the major surface and a second direction parallel to the major surface.

摘要翻译： 根据一个实施例，一种基板保持装置包括主单元和多个第一支撑单元。 主机具有主要表面。 主机具有板配置。 第一支撑单元设置在主表面上。 每个第一支撑单元包括能够通过抽吸来保持基板的吸持保持单元。 抽吸保持单元可沿垂直于主表面的第一方向和平行于主表面的第二方向移动。

公开(公告)号：US07539222B2

公开(公告)日：2009-05-26

申请号：US11278637

申请日：2006-04-04

申请人： Kazuto Matsuki

发明人： Kazuto Matsuki

IPC分类号： H01S3/10

CPC分类号： G02F1/3525

摘要： A method of operating a laser light source including a wavelength conversion device in which two wavelength laser beams are input to a nonlinear crystal to output a sum frequency wavelength, according to one embodiment includes inputting only one wavelength laser beam of the two input wavelength laser beams to the nonlinear crystal; measuring scattered light intensity of the one wavelength laser beam by a light sensitive sensor installed on an optical axis of the sum frequency wavelength output beam; and judging a damage state of the nonlinear crystal based on a measurement value obtained of the intensity measurement by the light sensitive sensor.

摘要翻译： 根据一个实施例的操作包括其中两个波长激光束被输入到非线性晶体以输出和频波长的波长转换装置的激光源的方法包括仅输入两个输入波长激光束的一个波长激光束 到非线性晶体; 通过安装在和频波长输出光束的光轴上的光敏传感器测量一个波长激光束的散射光强度; 以及基于由所述光敏传感器测量的强度测量值来判断所述非线性晶体的损伤状态。

公开(公告)号：US06182369B2

公开(公告)日：2001-02-06

申请号：US09038038

申请日：1998-03-11

申请人： Ryoichi Hirano ,  Shusuke Yoshitake ,  Kazuto Matsuki ,  Toru Tojo

发明人： Ryoichi Hirano ,  Shusuke Yoshitake ,  Kazuto Matsuki ,  Toru Tojo

IPC分类号： G01B5004

CPC分类号： G03F7/70383 ,  G03F7/70433 ,  H01J37/3023 ,  H01J2237/30461 ,  H01J2237/31764

摘要： A pattern forming apparatus comprising a sample base for positioning a sample on the base and moving a drawing position of the sample, a position measuring unit for measuring a position of the sample base, a correcting unit for mutually independently correcting drawing positions at those respective areas into which a whole drawing section of the sample is divided, the drawing position being calculated by the position measuring unit at the respective area, and a drawing unit for drawing a pattern on the sample on the basis of the position of the sample base measured by the position measuring unit and drawing position of the respective area corrected by the correcting unit.

摘要翻译： 一种图案形成装置，包括用于将样本定位在基座上并移动样本的绘制位置的样本基座，用于测量样本基座的位置的位置测量单元，用于相互独立地校正各个区域的绘制位置的校正单元 样本的整个绘图部分被划分成，绘图位置由各个区域的位置测量单元计算，以及绘图单元，用于根据样本的位置根据由 位置测量单元和由校正单元校正的各个区域的绘图位置。

公开(公告)号：US09188879B2

公开(公告)日：2015-11-17

申请号：US13600123

申请日：2012-08-30

申请人： Kentaro Kasa ,  Manabu Takakuwa ,  Ryoichi Inanami ,  Kazuto Matsuki ,  Tetsuro Nakasugi ,  Hiroshi Koizumi ,  Minoru Inomoto

发明人： Kentaro Kasa ,  Manabu Takakuwa ,  Ryoichi Inanami ,  Kazuto Matsuki ,  Tetsuro Nakasugi ,  Hiroshi Koizumi ,  Minoru Inomoto

IPC分类号： G03B27/58 ,  G03F7/20

CPC分类号： G03F7/70783 ,  G03F7/707

摘要： According to one embodiment, a substrate holding apparatus includes a main unit and a plurality of first support units. The main unit has a major surface. The main unit has a plate configuration. The first support units are disposed on the major surface. Each of the first support units includes a suction-holding unit capable of holding a substrate by suction. The suction-holding unit is movable along a first direction perpendicular to the major surface and a second direction parallel to the major surface.

摘要翻译： 根据一个实施例，一种基板保持装置包括主单元和多个第一支撑单元。 主机具有主要表面。 主机具有板配置。 第一支撑单元设置在主表面上。 每个第一支撑单元包括能够通过抽吸来保持基板的吸持保持单元。 抽吸保持单元可沿垂直于主表面的第一方向和平行于主表面的第二方向移动。