公开(公告)号：US20120081538A1

公开(公告)日：2012-04-05

申请号：US13242655

申请日：2011-09-23

申请人： Riki Ogawa ,  Masatoshi Hirono ,  Takeshi Nishizaka ,  Ryoichi Hirano ,  Ikunao Isomura ,  Kazuto Matsuki ,  Fumio Ozaki

发明人： Riki Ogawa ,  Masatoshi Hirono ,  Takeshi Nishizaka ,  Ryoichi Hirano ,  Ikunao Isomura ,  Kazuto Matsuki ,  Fumio Ozaki

IPC分类号： H04N7/18

CPC分类号： G01N21/956

摘要： This pattern inspection apparatus includes an inspection region information storage unit that stores an inspection region specified in a pattern region, a pattern surface height detection unit that detects a pattern surface height signal corresponding to a pattern surface height measurement position on the inspection sample, an autofocus mechanism that focuses on the inspection sample using the pattern surface height signal detected by the pattern surface height detection unit, a determination unit, and an autofocus mechanism control unit. When the determination unit determines that the pattern surface height measurement position is located within the inspection region, the autofocus mechanism control unit drives the autofocus mechanism, and the determination unit determines that the pattern surface height measurement position is not located within the inspection region, the autofocus mechanism control unit stops the autofocus mechanism.

摘要翻译： 该图案检查装置包括：检查区域信息存储单元，其存储在图案区域中指定的检查区域;图案表面高度检测单元，其检测与检查样品上的图案表面高度测量位置对应的图案表面高度信号;自动对焦 使用由图案表面高度检测单元，确定单元和自动对焦机构控制单元检测到的图案表面高度信号来关注检查样本的机构。 当确定单元确定图案表面高度测量位置位于检查区域内时，自动聚焦机构控制单元驱动自动聚焦机构，并且确定单元确定图案表面高度测量位置不位于检查区域内， 自动对焦机构控制单元停止自动对焦机构。

公开(公告)号：US08442320B2

公开(公告)日：2013-05-14

申请号：US12815731

申请日：2010-06-15

申请人： Ikunao Isomura ,  Ryoichi Hirano ,  Nobutaka Kikuiri

发明人： Ikunao Isomura ,  Ryoichi Hirano ,  Nobutaka Kikuiri

IPC分类号： G06K9/00

CPC分类号： G03F1/84 ,  G01N21/95607

摘要： A pattern inspection apparatus includes: an optical image acquiring unit configured to acquire optical image data of a target object on which each of a plurality of identical patterns is respectively formed at a respective corresponding position of a plurality of forming positions with distortion; a cut-out unit configured to cut out a plurality of partial optical image data from the optical image data; a correction unit configured to correct positions of the plurality of partial optical image data by using distortion information from which each amount of distortion of the plurality of identical patterns respectively formed at the respective corresponding position of the plurality of forming positions on the target object can be acquired; and a comparison unit configured to compare a plurality of corrected partial optical image data against each other on a pixel to pixel basis.

摘要翻译： 图案检查装置包括：光学图像获取单元，其被配置为获取其中分别在多个具有失真的多个成形位置的相应对应位置处形成有多个相同图案中的每一个的目标对象的光学图像数据; 切出单元，被配置为从所述光学图像数据切出多个部分光学图像数据; 校正单元，被配置为通过使用失真信息来校正多个部分光学图像数据的位置，所述失真信息分别形成在目标对象上的多个成形位置的各个对应位置处的多个相同图案的每个失真量可以是 获得 以及比较单元，被配置为在像素的基础上比较多个经校正的部分光学图像数据彼此。

公开(公告)号：US08254663B2

公开(公告)日：2012-08-28

申请号：US12395840

申请日：2009-03-02

申请人： Akira Kataoka ,  Ikunao Isomura ,  Ryoichi Hirano ,  Nobutaka Kikuiri ,  Susumu Iida

发明人： Akira Kataoka ,  Ikunao Isomura ,  Ryoichi Hirano ,  Nobutaka Kikuiri ,  Susumu Iida

IPC分类号： G06K9/00

CPC分类号： G06K9/209 ,  G03F1/84 ,  G06T7/0004 ,  G06T2207/30121 ,  G06T2207/30148

摘要： A workpiece inspection apparatus includes a measured image generator unit configured to measure a pattern of a workpiece and generate a measured image; and a comparator unit configured to compare the measured image to a fiducial image, wherein said measured image generator unit includes a light-receiving device having an interconnection of two or more time delay integration (TDI) sensors each being arranged by two or more line sensors each being arranged by two or more pixels, for generating as the measured image an average value of pixel values excluding an abnormal pixel value from pixels of each TDI sensor with respect to a position of the pattern of the workpiece.

摘要翻译： 工件检查装置包括测量图像发生器单元，被配置为测量工件的图案并产生测量图像; 以及比较器单元，被配置为将所测量的图像与基准图像进行比较，其中所述测量的图像生成器单元包括具有两个或更多个时间延迟积分（TDI）传感器的互连的光接收装置，每个传感器由两个或更多个线传感器 每个由两个或更多个像素排列，用于相对于工件的图案的位置产生除了每个TDI传感器的像素之外的异常像素值的像素值的平均值作为测量图像。

公开(公告)号：US20110229009A1

公开(公告)日：2011-09-22

申请号：US12815731

申请日：2010-06-15

申请人： Ikunao ISOMURA ,  Ryoichi Hirano ,  Nobutaka Kikuiri

发明人： Ikunao ISOMURA ,  Ryoichi Hirano ,  Nobutaka Kikuiri

IPC分类号： G06T7/00

CPC分类号： G03F1/84 ,  G01N21/95607

摘要： A pattern inspection apparatus includes: an optical image acquiring unit configured to acquire optical image data of a target object on which each of a plurality of identical patterns is respectively formed at a respective corresponding position of a plurality of forming positions with distortion; a cut-out unit configured to cut out a plurality of partial optical image data from the optical image data; a correction unit configured to correct positions of the plurality of partial optical image data by using distortion information from which each amount of distortion of the plurality of identical patterns respectively formed at the respective corresponding position of the plurality of forming positions on the target object can be acquired; and a comparison unit configured to compare a plurality of corrected partial optical image data against each other on a pixel to pixel basis.

摘要翻译： 图案检查装置包括：光学图像获取单元，其被配置为获取其中分别在多个具有失真的多个成形位置的相应对应位置处形成有多个相同图案中的每一个的目标对象的光学图像数据; 切出单元，被配置为从所述光学图像数据切出多个部分光学图像数据; 校正单元，被配置为通过使用失真信息来校正多个部分光学图像数据的位置，所述失真信息分别形成在目标对象上的多个成形位置的各个对应位置处的多个相同图案的每个失真量可以是 获得 以及比较单元，被配置为在像素的基础上比较多个经校正的部分光学图像数据彼此。

公开(公告)号：US20090238446A1

公开(公告)日：2009-09-24

申请号：US12395840

申请日：2009-03-02

申请人： Akira Kataoka ,  Ikunao Isomura ,  Ryoichi Hirano ,  Nobutaka Kikuiri ,  Susumu Iida

发明人： Akira Kataoka ,  Ikunao Isomura ,  Ryoichi Hirano ,  Nobutaka Kikuiri ,  Susumu Iida

IPC分类号： G06K9/62

CPC分类号： G06K9/209 ,  G03F1/84 ,  G06T7/0004 ,  G06T2207/30121 ,  G06T2207/30148

摘要： A workpiece inspection apparatus includes a measured image generator unit configured to measure a pattern of a workpiece and generate a measured image; and a comparator unit configured to compare the measured image to a fiducial image, wherein said measured image generator unit includes a light-receiving device having an interconnection of two or more time delay integration (TDI) sensors each being arranged by two or more line sensors each being arranged by two or more pixels, for generating as the measured image an average value of pixel values excluding an abnormal pixel value from pixels of each TDI sensor with respect to a position of the pattern of the workpiece.

摘要翻译： 工件检查装置包括测量图像发生器单元，被配置为测量工件的图案并产生测量图像; 以及比较器单元，被配置为将所测量的图像与基准图像进行比较，其中所述测量的图像生成器单元包括具有两个或更多个时间延迟积分（TDI）传感器的互连的光接收装置，每个传感器由两个或更多个线传感器 每个由两个或更多个像素排列，用于相对于工件的图案的位置产生除了每个TDI传感器的像素之外的异常像素值的像素值的平均值作为测量图像。

公开(公告)号：US06182369B2

公开(公告)日：2001-02-06

申请号：US09038038

申请日：1998-03-11

申请人： Ryoichi Hirano ,  Shusuke Yoshitake ,  Kazuto Matsuki ,  Toru Tojo

发明人： Ryoichi Hirano ,  Shusuke Yoshitake ,  Kazuto Matsuki ,  Toru Tojo

IPC分类号： G01B5004

CPC分类号： G03F7/70383 ,  G03F7/70433 ,  H01J37/3023 ,  H01J2237/30461 ,  H01J2237/31764

摘要： A pattern forming apparatus comprising a sample base for positioning a sample on the base and moving a drawing position of the sample, a position measuring unit for measuring a position of the sample base, a correcting unit for mutually independently correcting drawing positions at those respective areas into which a whole drawing section of the sample is divided, the drawing position being calculated by the position measuring unit at the respective area, and a drawing unit for drawing a pattern on the sample on the basis of the position of the sample base measured by the position measuring unit and drawing position of the respective area corrected by the correcting unit.

摘要翻译： 一种图案形成装置，包括用于将样本定位在基座上并移动样本的绘制位置的样本基座，用于测量样本基座的位置的位置测量单元，用于相互独立地校正各个区域的绘制位置的校正单元 样本的整个绘图部分被划分成，绘图位置由各个区域的位置测量单元计算，以及绘图单元，用于根据样本的位置根据由 位置测量单元和由校正单元校正的各个区域的绘图位置。

公开(公告)号：US07894051B2

公开(公告)日：2011-02-22

申请号：US12061118

申请日：2008-04-02

申请人： Ryoichi Hirano ,  Riki Ogawa

发明人： Ryoichi Hirano ,  Riki Ogawa

IPC分类号： G01N21/00

CPC分类号： G01N21/956 ,  G01N2021/95676 ,  G03F1/84

摘要： A reticle defect inspection apparatus that controls damage of a reticle by irradiation with an inspection light when the reticle is caused to be at rest is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. The reticle defect inspection apparatus has a dose monitoring part for measuring a dose of the light to the reticle, a comparing part for comparing, after calculating accumulated irradiation from the dose measured by the dose monitoring part, the accumulated irradiation with a preset threshold, and a stop mechanism for stopping irradiation of the reticle with the light when, as a result of the comparison, the accumulated irradiation exceeds the threshold.

摘要翻译： 提供了一种掩模版缺陷检查装置，其通过在使掩模版静止时通过用检查光照射来控制掩模版的损坏。 掩模版缺陷检查装置是使用通过用光照射其上形成图案的掩模版获得的图案图像来检查掩模版上的缺陷的掩模版缺陷检查装置。 所述掩模版缺陷检查装置具有用于测量对所述掩模版的光的剂量的剂量监视部，比较部，根据由所述剂量监视部测定的所述剂量的累积照射计算所述累积照射与预设阈值之间进行比较， 作为比较结果，积累的照射超过阈值的停止机构，用于停止用光照射的掩模版。

公开(公告)号：US20080259323A1

公开(公告)日：2008-10-23

申请号：US12061118

申请日：2008-04-02

申请人： Ryoichi Hirano ,  Riki Ogawa

发明人： Ryoichi Hirano ,  Riki Ogawa

IPC分类号： G01J1/46

CPC分类号： G01N21/956 ,  G01N2021/95676 ,  G03F1/84

摘要： A reticle defect inspection apparatus that controls damage of a reticle by irradiation with an inspection light when the reticle is caused to be at rest is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. The reticle defect inspection apparatus has a dose monitoring part for measuring a dose of the light to the reticle, a comparing part for comparing, after calculating accumulated irradiation from the dose measured by the dose monitoring part, the accumulated irradiation with a preset threshold, and a stop mechanism for stopping irradiation of the reticle with the light when, as a result of the comparison, the accumulated irradiation exceeds the threshold.

摘要翻译： 提供了一种掩模版缺陷检查装置，其通过在使掩模版静止时通过用检查光照射来控制掩模版的损坏。 掩模版缺陷检查装置是使用通过用光照射其上形成图案的掩模版获得的图案图像来检查掩模版上的缺陷的掩模版缺陷检查装置。 所述掩模版缺陷检查装置具有用于测量对所述掩模版的光的剂量的剂量监视部，比较部，根据由所述剂量监视部测定的所述剂量的累积照射计算所述累积照射与预设阈值之间进行比较， 作为比较结果，积累的照射超过阈值的停止机构，用于停止用光照射的掩模版。

公开(公告)号：US5912468A

公开(公告)日：1999-06-15

申请号：US841762

申请日：1997-04-28

申请人： Ryoichi Hirano ,  Souji Koikari ,  Kazuto Matsuki ,  Shusuke Yoshitake ,  Toru Tojo

发明人： Ryoichi Hirano ,  Souji Koikari ,  Kazuto Matsuki ,  Shusuke Yoshitake ,  Toru Tojo

IPC分类号： G21K5/04 ,  G01Q30/00 ,  G01Q70/02 ,  G03F7/20 ,  H01J37/317 ,  H01L21/027 ,  H01J37/30

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/30455

摘要： An object of the present invention is to provide a charged particle exposure system which can prevent the shift of an orbit of an electron beam in the vicinity of a periphery of a substrate when drawing a pattern onto the substrate, thereby making it possible to draw the pattern with high accuracy. According to the present invention, there is provided a charged particle beam exposure system comprising a holder for holding a substrate, a beam source for emitting a charged particle beam onto a surface of the substrate, beam scanning means for scanning the charged particle beam to draw a pattern on the surface of the substrate, a first electrical conductive block coming in electrical contact with a surface of a peripheral portion of the substrate, a first DC power supply unit for supplying an arbitrary voltage to the first electrical conductive block, a second electrical conductive block arranged to cover upside of the first electrical conductive block and upside of a peripheral portion along the periphery of the substrate, and to be electrically insulated from the substrate, and a second DC power supply unit for supplying the other arbitrary voltage to the second electrical conductive block.

摘要翻译： 本发明的目的是提供一种带电粒子曝光系统，其可以在将图案画到基板上时防止电子束在基板周围附近的轨道偏移，从而可以将 图案精度高。 根据本发明，提供了一种带电粒子束曝光系统，包括用于保持基板的保持器，用于将带电粒子束发射到基板的表面上的光束源;用于扫描带电粒子束以绘制的束扫描装置 衬底表面上的图案，与衬底的周边部分的表面电接触的第一导电块，用于向第一导电块提供任意电压的第一直流电源单元，第二电导体块 导电块，其布置成覆盖所述第一导电块的上侧和沿着所述衬底的周边的周边部分的上侧，并且与所述衬底电绝缘;以及第二DC电源单元，用于将所述另一任意电压提供给所述第二导电块 导电块。

公开(公告)号：US08049897B2

公开(公告)日：2011-11-01

申请号：US12047844

申请日：2008-03-13

申请人： Ryoichi Hirano ,  Riki Ogawa

发明人： Ryoichi Hirano ,  Riki Ogawa

IPC分类号： G01N21/55

CPC分类号： G01N21/95607 ,  G01N2021/95676 ,  G01N2201/0631

摘要： A reticle defect inspection apparatus that suppresses deterioration of optical components resulting from luminescent spots generated by an integrator and can sustain a defect inspection with high precision for a long time is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. And the apparatus includes an illuminating optical system for irradiating the reticle with an inspection light and a detecting optical system for detecting a pattern image of the reticle irradiated with the inspection light, wherein the illuminating optical system comprises an integrator for equalizing illumination distribution of the inspection light and a moving mechanism for enabling the integrator to slightly move in a direction perpendicular to an optical axis of the integrator.

摘要翻译： 提供了一种掩模版缺陷检查装置，其抑制由积分器产生的发光点导致的光学部件的劣化，并且能够长期高精度地进行缺陷检查。 掩模版缺陷检查装置是使用通过用光照射其上形成图案的掩模版获得的图案图像来检查掩模版上的缺陷的掩模版缺陷检查装置。 该装置包括用于用检查光照射标线的照明光学系统和用于检测用检查光照射的掩模版的图案图像的检测光学系统，其中照明光学系统包括用于均衡检查的照明分布的积分器 光和移动机构，用于使积分器能够在垂直于积分器的光轴的方向上稍微移动。