Power system for sterilization systems employing low frequency plasma
    1.
    发明授权
    Power system for sterilization systems employing low frequency plasma 有权
    使用低频等离子体的灭菌系统的电力系统

    公开(公告)号:US06447719B1

    公开(公告)日:2002-09-10

    申请号:US09677534

    申请日:2000-10-02

    IPC分类号: A61L200

    摘要: The present invention provides a sterilization system that includes a low frequency power feedback control system for controllably adjusting a power applied to a low frequency plasma within a vacuum chamber of the sterilization system to remove gas or vapor species from the article. The power has a frequency of from 0 to approximately 200 kHz. The low frequency power feedback control system includes a power monitor adapted to produce a first signal indicative of the power applied to the low frequency plasma within the vacuum chamber. The low frequency power feedback control system further includes a power control module adapted to produce a second signal in response to the first signal from the power monitor, and a power controller adapted to adjust, in response to the second signal, the power applied to the low frequency plasma to maintain a substantially stable average power applied to the low frequency plasma while the article is being processed.

    摘要翻译: 本发明提供了一种灭菌系统,其包括低频功率反馈控制系统,用于可控地调节施加到灭菌系统的真空室内的低频等离子体的功率,以从制品中除去气体或蒸汽物质。 功率的频率从0到大约200 kHz。 低频功率反馈控制系统包括功率监视器,适于产生指示施加到真空室内的低频等离子体的功率的第一信号。 低频功率反馈控制系统还包括功率控制模块,其适于响应于来自功率监视器的第一信号产生第二信号,以及功率控制器,其适于响应于第二信号调整施加到 低频等离子体,以在物品处理期间保持施加到低频等离子体的基本稳定的平均功率。

    Power system for sterilization systems employing low frequency plasma
    2.
    发明授权
    Power system for sterilization systems employing low frequency plasma 有权
    使用低频等离子体的灭菌系统的电力系统

    公开(公告)号:US06939519B2

    公开(公告)日:2005-09-06

    申请号:US10184153

    申请日:2002-06-27

    摘要: The present invention provides a power feedback control system for controllably maintaining a predetermined average power value of a power applied to a plasma of a sterilization system. The power has a frequency of from 0 to approximately 200 kHz. The power feedback control system includes a power monitor including a current monitor and a voltage monitor. The current monitor is adapted to produce a first signal indicative of a current applied to the plasma. The voltage monitor is adapted to produce a second signal indicative of a voltage applied to the plasma. The power monitor is adapted to produce a third signal in response to the first signal and second signal. The third signal is indicative of the power applied to the plasma. The power feedback control system further includes a power control module adapted to produce a fourth signal in response to the third signal from the power monitor and to a reference signal corresponding to the predetermined average power value. The power feedback control system further includes a power controller adapted to adjust, in response to the fourth signal, the power applied to the plasma to maintain the predetermined average power value of the power applied to the plasma.

    摘要翻译: 本发明提供了一种用于可控地保持施加到灭菌系统的等离子体的功率的预定平均功率值的功率反馈控制系统。 功率的频率从0到大约200 kHz。 功率反馈控制系统包括电流监视器,其包括电流监视器和电压监视器。 电流监视器适于产生指示施加到等离子体的电流的第一信号。 电压监视器适于产生指示施加到等离子体的电压的第二信号。 功率监视器适于响应于第一信号和第二信号产生第三信号。 第三信号表示施加到等离子体的功率。 功率反馈控制系统还包括功率控制模块,其适于响应于来自功率监视器的第三信号和对应于预定平均功率值的参考信号产生第四信号。 功率反馈控制系统还包括功率控制器,其适于响应于第四信号调整施加到等离子体的功率,以维持施加到等离子体的功率的预定平均功率值。

    Sterilization system employing a switching module adapted to pulsate the low frequency power applied to a plasma
    3.
    发明授权
    Sterilization system employing a switching module adapted to pulsate the low frequency power applied to a plasma 有权
    灭菌系统采用适于脉冲施加到等离子体的低频功率的开关模块

    公开(公告)号:US06852277B2

    公开(公告)日:2005-02-08

    申请号:US09812148

    申请日:2001-03-19

    摘要: A sterilization system and method applies low frequency power to a plasma within a vacuum chamber to remove gas or vapor species from an article. The sterilization system includes a switching module adapted to pulsate the low frequency power applied to the plasma and a low frequency power feedback control system for controllably adjusting the low frequency power applied to the plasma. A power monitor is adapted to produce a first signal indicative of the low frequency power applied to the plasma within the vacuum chamber. A power control module is adapted to produce a second signal in response to the first signal from the power monitor, and a power controller is adapted to adjust, in response to the second signal, the low frequency power applied to the plasma to maintain a substantially stable average low frequency power applied to the plasma while the article is being processed.

    摘要翻译: 灭菌系统和方法对真空室内的等离子体施加低频功率以从制品中除去气体或蒸汽物质。 灭菌系统包括适于脉冲施加到等离子体的低频功率的开关模块和用于可控地调节施加到等离子体的低频功率的低频功率反馈控制系统。 功率监视器适于产生指示施加到真空室内的等离子体的低频功率的第一信号。 功率控制模块适于响应于来自功率监视器的第一信号产生第二信号,并且功率控制器适于响应于第二信号调整施加到等离子体的低频功率以维持基本上 在处理物品时施加到等离子体的稳定的平均低频功率。

    Sterilization system employing low frequency plasma
    4.
    发明授权
    Sterilization system employing low frequency plasma 有权
    采用低频等离子体灭菌系统

    公开(公告)号:US06458321B1

    公开(公告)日:2002-10-01

    申请号:US09676919

    申请日:2000-10-02

    IPC分类号: A61L200

    摘要: A method and system for sterilizing an article is provided that includes use of a low frequency (LF) gas discharge plasma. The method includes placing the article in a vacuum chamber and evacuating the vacuum chamber to a predetermined pressure. Gas or vapor species are introduced into the vacuum chamber, and a low frequency plasma is generated within the vacuum chamber, the low frequency plasma having a frequency of from 0 to approximately 200 kHz. The low frequency plasma is maintained for a time period sufficient to substantially remove gas or vapor species from the article. The sterilization system includes a vacuum chamber coupled to a vacuum pump and a vent, a first electrode, and a second electrode. The sterilization system further includes a first region within the vacuum chamber, the first region including a region between the first and second electrodes, and a second region within the vacuum chamber, the second region being in fluid communication with the first region. The sterilization system further includes a source of reactive agent species coupled to the vacuum chamber, a process control monitor, and a low frequency power module including components adapted to apply a low frequency voltage between the first electrode and second electrode to generate a low frequency plasma in the vacuum chamber, the low frequency voltage having a frequency of from 0 to approximately 200 kHz.

    摘要翻译: 提供了一种用于消毒制品的方法和系统,其包括使用低频(LF)气体放电等离子体。 该方法包括将物品放置在真空室中并将真空室抽空至预定压力。 气体或蒸汽物质被引入真空室,并且在真空室内产生低频等离子体,低频等离子体具有从0到大约200kHz的频率。 将低频等离子体保持足以基本上从制品中除去气体或蒸汽物质的时间段。 灭菌系统包括耦合到真空泵和通气口的真空室,第一电极和第二电极。 所述灭菌系统还包括所述真空室内的第一区域,所述第一区域包括所述第一和第二电极之间的区域以及所述真空室内的第二区域,所述第二区域与所述第一区域流体连通。 灭菌系统还包括耦合到真空室的反应剂物质源,过程控制监视器和低频功率模块,其包括适于在第一电极和第二电极之间施加低频电压的部件,以产生低频等离子体 在真空室中,低频电压具有从0到大约200kHz的频率。

    Automation for high throughput semiconductor batch-wafer processing equipment
    5.
    发明授权
    Automation for high throughput semiconductor batch-wafer processing equipment 有权
    高通量半导体批量晶圆加工设备的自动化

    公开(公告)号:US08747052B2

    公开(公告)日:2014-06-10

    申请号:US11827165

    申请日:2007-07-10

    IPC分类号: B66C17/08

    CPC分类号: H01L21/67757

    摘要: An embodiment of the present invention is a technique to automate transfer of parts for high throughput. A boat transfer unit (BTU) arm carrying a boat containing a plurality of parts is rotated from an initial position to a first position that is below a process chamber. The BTU arm engages a boat support that supports the boat. The BTU arm is moved upward to a second position such that the boat partially enters the process chamber at a distance D with respect to an entrance opening of the process chamber. An elevator arm carrying a pedestal is engaged to lower side of the boat support. The BTU arm is moved away from the second position. The elevator arm is moved upward to fully insert the boat inside the process chamber.

    摘要翻译: 本发明的一个实施例是用于自动化用于高通量的部件的传送的技术。 携带包含多个部件的船的船传送单元(BTU)臂从初始位置旋转到处理室下方的第一位置。 BTU手臂接合支撑船的船支架。 BTU臂向上移动到第二位置,使得船相对于处理室的入口以距离D部分地进入处理室。 携带基座的电梯臂接合到船体支撑件的下侧。 BTU臂从第二个位置移开。 电梯臂向上移动以将船完全插入处理室内。

    Monitoring heater condition to predict or detect failure of a heating element
    6.
    发明申请
    Monitoring heater condition to predict or detect failure of a heating element 审中-公开
    监控加热器状态以预测或检测加热元件的故障

    公开(公告)号:US20080183404A1

    公开(公告)日:2008-07-31

    申请号:US12008597

    申请日:2008-01-11

    IPC分类号: G01R19/00 G08B21/00 G06F19/00

    CPC分类号: G01R31/024

    摘要: An embodiment of the invention is a technique to generate warning of a failure of a heating element. An operational value of at least one of operating parameters of the heating element in a heater zone of a heating unit is monitored. A remaining life value of the at least one of the operating parameters is estimated. A warning is generated if the operational value exceeds a threshold value relative to the remaining life value.

    摘要翻译: 本发明的实施例是产生加热元件故障的警告的技术。 监视加热单元的加热器区域中的加热元件的操作参数中的至少一个的操作值。 估计所述至少一个操作参数的剩余寿命值。 如果操作值超过相对于剩余寿命值的阈值,则产生警告。

    Heating element structure with efficient heat generation and mechanical stability
    7.
    发明申请
    Heating element structure with efficient heat generation and mechanical stability 审中-公开
    加热元件结构具有高效的发热和机械稳定性

    公开(公告)号:US20060193366A1

    公开(公告)日:2006-08-31

    申请号:US11338132

    申请日:2006-01-23

    IPC分类号: H05B3/62

    摘要: An embodiment of the present invention is a heating element structure. A first tray has an inner boundary and an outer boundary. The inner and outer boundaries define a space. A first heating element fit to the first tray and surrounding the inner boundary generates heat when power is applied. The heating element expands in the space within a temperature range.

    摘要翻译: 本发明的实施例是加热元件结构。 第一托盘具有内边界和外边界。 内部和外部边界定义一个空间。 第一加热元件适合于第一托盘并围绕内边界,在施加电力时产生热量。 加热元件在空间内在温度范围内膨胀。

    THERMAL PROCESSING APPARATUS WITH OPTIMIZED STRUCTURAL SUPPORT MECHANISM
    8.
    发明申请
    THERMAL PROCESSING APPARATUS WITH OPTIMIZED STRUCTURAL SUPPORT MECHANISM 审中-公开
    具有优化结构支持机制的热处理设备

    公开(公告)号:US20120061377A1

    公开(公告)日:2012-03-15

    申请号:US13230839

    申请日:2011-09-12

    IPC分类号: H05B3/68

    CPC分类号: H01L21/67098

    摘要: A thermal processing apparatus is disclosed which separates the load bearing components from the thermal components, improving heating time, cooling time, thermal response, and energy efficiency. The thermal processing apparatus comprises an array of cylindrical heating elements which rest on support plates of high temperature, low density material. The support plates and heating elements are then supported by a rigid skeletal structure for load bearing support.

    摘要翻译: 公开了一种热加工装置,其将负载部件与热部件分离,提高加热时间,冷却时间,热响应和能量效率。 该热处理装置包括一组圆柱形加热元件,该阵列放置在高温低密度材料的支撑板上。 然后支撑板和加热元件由用于承载支撑的刚性骨架结构支撑。

    Automation for high throughput semiconductor batch-wafer processing equipment
    9.
    发明申请
    Automation for high throughput semiconductor batch-wafer processing equipment 有权
    高通量半导体批量晶圆加工设备的自动化

    公开(公告)号:US20080118333A1

    公开(公告)日:2008-05-22

    申请号:US11827165

    申请日:2007-07-10

    IPC分类号: H01L21/677

    CPC分类号: H01L21/67757

    摘要: An embodiment of the present invention is a technique to automate transfer of parts for high throughput. A boat transfer unit (BTU) arm carrying a boat containing a plurality of parts is rotated from an initial position to a first position that is below a process chamber. The BTU arm engages a boat support that supports the boat. The BTU arm is moved upward to a second position such that the boat partially enters the process chamber at a distance D with respect to an entrance opening of the process chamber. An elevator arm carrying a pedestal is engaged to lower side of the boat support. The BTU arm is moved away from the second position. The elevator arm is moved upward to fully insert the boat inside the process chamber.

    摘要翻译: 本发明的一个实施例是用于自动化用于高通量的部件的传送的技术。 携带包含多个部件的船的船只传送单元(BTU)臂从初始位置旋转到处理室下方的第一位置。 BTU手臂接合支撑船的船支架。 BTU臂向上移动到第二位置,使得船相对于处理室的入口以距离D部分地进入处理室。 携带基座的电梯臂接合到船体支撑件的下侧。 BTU臂从第二个位置移开。 电梯臂向上移动以将船完全插入处理室内。