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公开(公告)号：US20120279522A1
公开(公告)日：2012-11-08
申请号：US13139173
申请日：2010-01-26
CPC分类号： C02F5/12 , C02F1/683 , C02F1/70 , C02F1/72 , C02F2209/02 , C02F2209/06 , C02F2303/08
摘要： The present invention provides methods and compositions useful for conditioning and removing solid deposits that have formed on or otherwise accumulated within one or more components including, for example, scale formed within a steam generating system. The aqueous cleaning compositions incorporate one or more quaternary ammonium hydroxides characterized by pKa values no less than about 13.5. These quaternary ammonium hydroxides may be used alone or in combination with one or more additives including, for example, chelating agents, reducing or oxidizing agents, pH adjustment agents, surfactants, corrosion inhibitors, complexing agents, dispersants and combinations thereof.
摘要翻译： 本发明提供了用于调节和除去在一种或多种组分中形成或以其他方式积聚在其中的固体沉积物的方法和组合物，包括例如在蒸汽发生系统内形成的垢。 水性清洁组合物掺入一种或多种以不低于约13.5的pKa值表征的季铵氢氧化物。 这些季铵氢氧化物可以单独使用或与一种或多种添加剂组合使用，包括例如螯合剂，还原剂或氧化剂，pH调节剂，表面活性剂，腐蚀抑制剂，络合剂，分散剂及其组合。
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公开(公告)号：US08728246B2
公开(公告)日：2014-05-20
申请号：US13139173
申请日：2010-01-26
IPC分类号： B08B9/00
CPC分类号： C02F5/12 , C02F1/683 , C02F1/70 , C02F1/72 , C02F2209/02 , C02F2209/06 , C02F2303/08
摘要： The present invention provides methods and compositions useful for conditioning and removing solid deposits that have formed on or otherwise accumulated within one or more components including, for example, scale formed within a steam generating system. The aqueous cleaning compositions incorporate one or more quaternary ammonium hydroxides characterized by pKa values no less than about 13.5. These quaternary ammonium hydroxides may be used alone or in combination with one or more additives including, for example, chelating agents, reducing or oxidizing agents, pH adjustment agents, surfactants, corrosion inhibitors, complexing agents, dispersants and combinations thereof.
摘要翻译： 本发明提供了用于调节和除去在一种或多种组分中形成或以其他方式积聚在其中的固体沉积物的方法和组合物，包括例如在蒸汽发生系统内形成的垢。 水性清洁组合物掺入一种或多种以不低于约13.5的pKa值表征的季铵氢氧化物。 这些季铵氢氧化物可以单独使用或与一种或多种添加剂组合使用，包括例如螯合剂，还原剂或氧化剂，pH调节剂，表面活性剂，腐蚀抑制剂，络合剂，分散剂及其组合。
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