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    Aqueous cold seal release lacquer
    1.
    发明授权
    Aqueous cold seal release lacquer 失效
    水性冷封脱漆

    公开(公告)号：US5466734A

    公开(公告)日：1995-11-14

    申请号：US305224

    申请日：1994-09-13

    申请人： Robert J. Catena ,  Prasad K. Adhikari

    发明人： Robert J. Catena ,  Prasad K. Adhikari

    IPC分类号： C08G69/26 ,  C08G69/28 ,  C09D177/08 ,  C08K5/20

    CPC分类号： C08G69/28 ,  C08G69/265 ,  C09D177/08

    摘要： An aqueous cold seal release varnish comprising the reaction product of a mixture comprising 30-50 parts of a polyamide block copolymer having an acid value of 30-45, 1-5 parts of an amide wax, 10-20 parts of at least one C.sub.1 -C.sub.4 alkanol, 5-10 parts of an amine and 15-55 parts of water. The mixture is dissolved by heating at a temperature of 75.degree.-85.degree. C. for a period of time of not more than 90 minutes to produce a varnish. An aqueous cold seal release lacquer (CSRL) is prepared from the varnish by mixing with a C.sub.1 -C.sub.4 alkanol, water and a surfactant.

    摘要翻译： 一种含水冷密封脱模剂，其包含含有30-50份酸值为30-45的聚酰胺嵌段共聚物，1-5份酰胺蜡，10-20份至少一种C1 -C4链烷醇，5-10份胺和15-55份水。 将混合物在75-85℃的温度下加热溶解不超过90分钟的时间以产生清漆。 通过与C1-C4链烷醇，水和表面活性剂混合，由清漆制备含水冷密封脱模漆（CSRL）。

    Abrasion resistant printing inks
    2.
    发明授权
    Abrasion resistant printing inks 失效
    耐磨印刷油墨

    公开(公告)号：US5173111A

    公开(公告)日：1992-12-22

    申请号：US793745

    申请日：1991-11-18

    申请人： Ramasamy Krishnan ,  Prasad K. Adhikari

    发明人： Ramasamy Krishnan ,  Prasad K. Adhikari

    IPC分类号： C09D11/02

    CPC分类号： C09D11/03

    摘要： Printing inks comprising a pigment and an aqueous or non-aqueous solvent (or a mixture of such solvents) have reduced abrasiveness towards printing surfaces (e.g. gravure printing cylinders) by incorporation in the ink of an alkoxylated dibasic phosphate ester and at least one alkali metal salt of a dialkylsulfosuccinic ester.

    摘要翻译： 包含颜料和水性或非水性溶剂（或这种溶剂的混合物）的印刷油墨通过掺入烷氧基化二元磷酸酯和至少一种碱金属的油墨中而降低了对印刷表面（例如凹版印刷滚筒）的磨损性 二烷基磺基琥珀酸酯的盐。

    METHOD FOR APPLYING AND EXPOSING COATING OR INK COMPOSITIONS ON SUBSTRATES TO RADIATION AND THE PRODUCT THEREOF
    4.
    发明申请
    METHOD FOR APPLYING AND EXPOSING COATING OR INK COMPOSITIONS ON SUBSTRATES TO RADIATION AND THE PRODUCT THEREOF 有权
    在基材上涂覆和暴露涂料或油墨组合物的方法及其产品

    公开(公告)号：US20140002562A1

    公开(公告)日：2014-01-02

    申请号：US13993858

    申请日：2011-12-13

    申请人： Yuemei Zhang ,  Prasad K. Adhikari

    发明人： Yuemei Zhang ,  Prasad K. Adhikari

    IPC分类号： B41J11/00

    CPC分类号： B41J11/002 ,  B05D3/0209 ,  B05D3/067 ,  B05D3/068 ,  B05D5/10 ,  B05D2201/02 ,  B05D2202/00 ,  B41M7/0081 ,  B41M7/009

    摘要： The present invention describes a two-sided radiation exposure method including a step of applying a coating or ink composition on a surface of a nonporous substrate. The applied coating or ink composition surface of the nonporous substrate is exposed to radiation one or more times. In addition, a non-applied surface of the nonporous substrate is exposed to radiation one or more times. The two-sided radiation exposure method improves adhesion and/or curing properties of the coating or ink composition applied on the nonporous substrate. The present invention also describes a radiation exposed, nonporous substrate with a coating or ink composition applied on a surface thereof produced by the steps of the above-mentioned method.

    摘要翻译： 本发明描述了一种双面辐射曝光方法，包括在无孔基材的表面上涂布涂料或油墨组合物的步骤。 将无孔基材的涂布或油墨组合物表面暴露于辐射一次或多次。 此外，将无孔基材的未施加的表面暴露于辐射一次或多次。 双面放射线曝光方法提高涂布在无孔基材上的涂料或油墨组合物的粘附性和/或固化性能。 本发明还描述了通过上述方法的步骤制备的在其表面上涂覆有涂层或油墨组合物的辐射暴露的无孔基材。