利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

8 条记录 (耗时 0.014 秒)

    Holder assembly system and method in an emitted energy system for photolithography
    2.
    发明授权
    Holder assembly system and method in an emitted energy system for photolithography 失效
    用于光刻的发射能量系统中的支架组装系统和方法

    公开(公告)号：US06353232B2

    公开(公告)日：2002-03-05

    申请号：US09772447

    申请日：2001-01-29

    申请人： Edwin G. Haas ,  Michael A. Peacock ,  Robert M. Gutowski

    发明人： Edwin G. Haas ,  Michael A. Peacock ,  Robert M. Gutowski

    IPC分类号： H05H134

    CPC分类号： H05G2/003 ,  G03F7/70033 ,  H05G2/008

    摘要： An emitted energy system for use in photolithography may include a holder assembly operable to precisely align a diffuser and a nozzle. In accordance with one embodiment of the present invention, a holder assembly (30) may comprise a nozzle mounting system (414) coupled to a housing assembly (400) to secure a nozzle (22). A diffuser mounting system (430) may be coupled to the housing assembly (400) to secure a diffuser (28). An alignment system (450) may operate to align the nozzle (22) and the diffuser (28) in a spatial relationship with each other to optimize operation of the diffuser (28) in relation to the nozzle (22).

    摘要翻译： 用于光刻的发射能量系统可以包括可操作以精确对准漫射器和喷嘴的保持器组件。 根据本发明的一个实施例，保持器组件（30）可以包括联接到壳体组件（400）以固定喷嘴（22）的喷嘴安装系统（414）。 扩散器安装系统（430）可以联接到壳体组件（400）以固定扩散器（28）。 对准系统（450）可以操作以使喷嘴（22）和扩散器（28）彼此空间关系对准，以优化扩散器（28）相对于喷嘴（22）的操作。

    Plasma generation
    4.
    发明授权
    Plasma generation 有权
    等离子体生成

    公开(公告)号：US06762424B2

    公开(公告)日：2004-07-13

    申请号：US10202422

    申请日：2002-07-23

    申请人： Neil Wester

    发明人： Neil Wester

    IPC分类号： H05H134

    CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033

    摘要： A photolithography tool includes an anode and a cathode composed of a first material and a second material. The second material has a lower work function than the first material. Electrons emitted from the cathode ionize a gas into a plasma that generates EUV light. The EUV light is focused on a mask to produce an image of a circuit pattern. The image is projected on a semiconductor wafer to produce a circuit.

    摘要翻译： 光刻工具包括由第一材料和第二材料组成的阳极和阴极。 第二种材料具有比第一种材料更低的功能。 从阴极发射的电子将气体电离成产生EUV光的等离子体。 EUV光聚焦在掩模上以产生电路图案的图像。 将图像投影在半导体晶片上以产生电路。

    Fluid nozzle system and method in an emitted energy system for photolithography
    5.
    发明授权
    Fluid nozzle system and method in an emitted energy system for photolithography 失效
    用于光刻的发射能量系统中的流体喷嘴系统和方法

    公开(公告)号：US06437349B1

    公开(公告)日：2002-08-20

    申请号：US09598664

    申请日：2000-06-20

    申请人： Edwin G. Haas ,  Robert M. Gutowski ,  Vincent S. Calia

    发明人： Edwin G. Haas ,  Robert M. Gutowski ,  Vincent S. Calia

    IPC分类号： H05H134

    CPC分类号： H05G2/003 ,  B05B1/005 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70858 ,  H05G2/006

    摘要： An emitted energy system for use in photolithography may include a fluid nozzle. A nozzle and its method of manufacture are provided. A nozzle (22) may include a nozzle cavity (110) disposed within a nozzle body (100) between an up-stream end (102) and a down-stream end (104). A nozzle passage (118) may be defined within the nozzle cavity (110) and extend a longitudinal length (120) from the down-stream end (104) of the nozzle body (100) into the nozzle cavity (110). A discharge orifice (124) may also be defined at the down-stream end (104) of the nozzle cavity (110) and have an associated width (126). The width (126) of the discharge orifice (124) may be substantially less than the longitudinal length (120) of the nozzle passage (118).

    摘要翻译： 用于光刻的发射能量系统可以包括流体喷嘴。 提供喷嘴及其制造方法。 喷嘴（22）可以包括设置在上游端（102）和下游端（104）之间的喷嘴体（100）内的喷嘴腔（110）。 喷嘴通道（118）可以限定在喷嘴空腔（110）内并且将纵向长度（120）从喷嘴体（100）的下游端（104）延伸到喷嘴腔（110）中。 排出口（124）也可以限定在喷嘴腔（110）的下游端（104）处，并且具有相关联的宽度（126）。 排出孔（124）的宽度（126）可以基本上小于喷嘴通道（118）的纵向长度（120）。

    Plasma focus light source with improved pulse power system
    6.
    发明授权
    Plasma focus light source with improved pulse power system 失效
    等离子聚焦光源具有改进的脉冲电源系统

    公开(公告)号：US06566667B1

    公开(公告)日：2003-05-20

    申请号：US09690084

    申请日：2000-10-16

    申请人： William N. Partlo ,  Igor V. Fomenkov ,  I. Roger Oliver ,  Richard M. Ness ,  Daniel L. Birx

    发明人： William N. Partlo ,  Igor V. Fomenkov ,  I. Roger Oliver ,  Richard M. Ness ,  Daniel L. Birx

    IPC分类号： H05H134

    CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  H05G2/005 ,  H05H1/06

    摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. Preferably the electrodes are configured co-axially with the anode on the axis. The anode is preferably hollow and the active gas is introduced through the anode. This permits an optimization of the spectral line source and a separate optimization of the buffer gas. Preferred embodiments present optimization of capacitance values, anode length and shape and preferred active gas delivery systems are disclosed. Preferred embodiments also include a pulse power system comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer. A heat pipe cooling system is described for cooling the central anode.

    摘要翻译： 高能光子源。 一对等离子体夹紧电极位于真空室中。 该室包含工作气体，其包括贵重缓冲气体和被选择用于提供所需光谱线的活性气体。 脉冲电源在电压足够高的电压下提供电脉冲，以在电极之间产生放电，以在工作气体中产生非常高温度，高密度的等离子体夹持，从而在源或活性气体的光谱线处提供辐射。 优选地，电极与轴上的阳极同轴地配置。 阳极优选是中空的，并且活性气体通过阳极引入。 这允许对光谱线源进行优化和缓冲气体的单独优化。 本发明优选的实施例公开了电容值的优化，阳极长度和形状以及优选的活性气体输送系统。 优选实施例还包括脉冲功率系统，其包括充电电容器和包括脉冲变压器的磁压缩电路。 描述了用于冷却中央阳极的热管冷却系统。