公开(公告)号：US08395757B2

公开(公告)日：2013-03-12

申请号：US12773775

申请日：2010-05-04

申请人： Robert Socha ,  Donis Flagello ,  Steve Hansen

发明人： Robert Socha ,  Donis Flagello ,  Steve Hansen

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03F7/705 ,  G03F7/70125 ,  G03F7/70341 ,  G03F7/70566 ,  G03F7/70616

摘要： Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determining image log slope for the at least one point on the illuminator for the at least two polarization states, determining a maximum image log slope (ILS) where the ILS is near zero for the at least one point on the illuminator, and selecting an optimal polarization state corresponding to the at least two polarization states that minimizes an ILS for the at least one point on the illuminator. This may be repeated for a plurality of points on the illuminator.

摘要翻译： 公开的概念包括优化待形成在衬底的表面中的图案的照明的偏振的方法。 通过确定至少两个偏振状态的照明器上的至少一个点的照明强度来确定极化照明，确定用于至少两个偏振状态的照明器上的至少一个点的图像对数斜率，确定最大图像记录 斜率（ILS），其中ILS对于照明器上的至少一个点接近于零，并且选择对应于使得照明器上的至少一个点的ILS最小化的至少两个偏振状态的最佳极化状态。 对于照明器上的多个点可以重复这一点。

公开(公告)号：US20050134822A1

公开(公告)日：2005-06-23

申请号：US10921878

申请日：2004-08-20

申请人： Robert Socha ,  Donis Flagello ,  Steve Hansen

发明人： Robert Socha ,  Donis Flagello ,  Steve Hansen

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/72

CPC分类号： G03F7/705 ,  G03F7/70125 ,  G03F7/70341 ,  G03F7/70566 ,  G03F7/70616

摘要： Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determining image log slope for the at least one point on the illuminator for the at least two polarization states, determining a maximum image log slope (ILS) where the ILS is near zero for the at least one point on the illuminator, and selecting an optimal polarization state corresponding to the at least two polarization states that minimizes an ILS for the at least one point on the illuminator. This may be repeated for a plurality of points on the illuminator.

摘要翻译： 公开的概念包括优化待形成在衬底的表面中的图案的照明的偏振的方法。 通过确定至少两个偏振状态的照明器上的至少一个点的照明强度来确定极化照明，确定用于至少两个偏振状态的照明器上的至少一个点的图像对数斜率，确定最大图像记录 斜率（ILS），其中ILS对于照明器上的至少一个点接近于零，并且选择对应于使得照明器上的至少一个点的ILS最小化的至少两个偏振状态的最佳极化状态。 对于照明器上的多个点可以重复这一点。

公开(公告)号：US20080043215A1

公开(公告)日：2008-02-21

申请号：US11907648

申请日：2007-10-16

申请人： Robert Socha ,  Donis Flagello ,  Steve Hansen

发明人： Robert Socha ,  Donis Flagello ,  Steve Hansen

IPC分类号： G03B27/72

CPC分类号： G03F7/705 ,  G03F7/70125 ,  G03F7/70341 ,  G03F7/70566 ,  G03F7/70616

摘要： Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determining image log slope for the at least one point on the illuminator for the at least two polarization states, determining a maximum image log slope (ILS) where the ILS is near zero for the at least one point on the illuminator, and selecting an optimal polarization state corresponding to the at least two polarization states that minimizes an ILS for the at least one point on the illuminator. This may be repeated for a plurality of points on the illuminator.

摘要翻译： 公开的概念包括优化待形成在衬底的表面中的图案的照明的偏振的方法。 通过确定至少两个偏振状态的照明器上的至少一个点的照明强度来确定极化照明，确定用于至少两个偏振状态的照明器上的至少一个点的图像对数斜率，确定最大图像记录 斜率（ILS），其中ILS对于照明器上的至少一个点接近于零，并且选择对应于使得照明器上的至少一个点的ILS最小化的至少两个偏振状态的最佳极化状态。 对于照明器上的多个点可以重复这一点。

公开(公告)号：US07710544B2

公开(公告)日：2010-05-04

申请号：US11907648

申请日：2007-10-16

申请人： Robert Socha ,  Donis Flagello ,  Steve Hansen

发明人： Robert Socha ,  Donis Flagello ,  Steve Hansen

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03F7/705 ,  G03F7/70125 ,  G03F7/70341 ,  G03F7/70566 ,  G03F7/70616

摘要： Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determining image log slope for the at least one point on the illuminator for the at least two polarization states, determining a maximum image log slope (ILS) where the ILS is near zero for the at least one point on the illuminator, and selecting an optimal polarization state corresponding to the at least two polarization states that minimizes an ILS for the at least one point on the illuminator. This may be repeated for a plurality of points on the illuminator.

摘要翻译： 公开的概念包括优化待形成在衬底的表面中的图案的照明的偏振的方法。 通过确定至少两个偏振状态的照明器上的至少一个点的照明强度来确定极化照明，确定用于至少两个偏振状态的照明器上的至少一个点的图像对数斜率，确定最大图像记录 斜率（ILS），其中ILS对于照明器上的至少一个点接近于零，并且选择对应于使得照明器上的至少一个点的ILS最小化的至少两个偏振状态的最佳极化状态。 对于照明器上的多个点可以重复这一点。

公开(公告)号：US07292315B2

公开(公告)日：2007-11-06

申请号：US10921878

申请日：2004-08-20

申请人： Robert Socha ,  Donis Flagello ,  Steve Hansen

发明人： Robert Socha ,  Donis Flagello ,  Steve Hansen

IPC分类号： G03B27/54

CPC分类号： G03F7/705 ,  G03F7/70125 ,  G03F7/70341 ,  G03F7/70566 ,  G03F7/70616

摘要： Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determining image log slope for the at least one point on the illuminator for the at least two polarization states, determining a maximum image log slope (ILS) where the ILS is near zero for the at least one point on the illuminator, and selecting an optimal polarization state corresponding to the at least two polarization states that minimizes an ILS for the at least one point on the illuminator. This may be repeated for a plurality of points on the illuminator.

摘要翻译： 公开的概念包括优化待形成在衬底的表面中的图案的照明的偏振的方法。 通过确定至少两个偏振状态的照明器上的至少一个点的照明强度来确定极化照明，确定用于至少两个偏振状态的照明器上的至少一个点的图像对数斜率，确定最大图像记录 斜率（ILS），其中ILS对于照明器上的至少一个点接近于零，并且选择对应于使得照明器上的至少一个点的ILS最小化的至少两个偏振状态的最佳极化状态。 对于照明器上的多个点可以重复这一点。

公开(公告)号：US20070273853A1

公开(公告)日：2007-11-29

申请号：US11655999

申请日：2007-01-22

申请人： Arno Bleeker ,  Donis Flagello ,  Robert Socha ,  James Greeneich ,  Kars Troost

发明人： Arno Bleeker ,  Donis Flagello ,  Robert Socha ,  James Greeneich ,  Kars Troost

IPC分类号： G03B27/32

CPC分类号： G03B27/54 ,  G03F7/70116 ,  G03F7/705

摘要： A method of transferring an image of a pattern layout onto a surface of a substrate including selecting a first illumination profile for a first area of the pattern layout and a second illumination profile for a second area of the pattern layout; switching illumination profile during transfer of the image of the pattern layout such that the first area of the pattern layout is illuminated with the first illumination profile and the second area is illuminated with the second illumination profile; and projecting an image of the illuminated first and second areas onto the surface of the substrate.

摘要翻译： 将图案布局的图像转印到基板的表面上的方法，包括为图案布局的第一区域选择第一照明轮廓，以及为图案布局的第二区域选择第二照明轮廓; 在图案布局的图像传送期间切换照明轮廓，使得图案布局的第一区域被第一照明轮廓照亮，并且第二区域被第二照明轮廓照亮; 以及将照射的第一和第二区域的图像投影到基板的表面上。

公开(公告)号：US20070013888A1

公开(公告)日：2007-01-18

申请号：US11091927

申请日：2005-03-29

申请人： Donis Flagello ,  Robert Socha ,  James Greeneich

发明人： Donis Flagello ,  Robert Socha ,  James Greeneich

IPC分类号： G03B27/54

CPC分类号： G03B27/54 ,  G03F7/70091

摘要： An apparatus and method for providing a variable illumination field for use in lithographic imaging for semiconductor manufacturing includes providing a an illumination system including a variable optical element having an array of addressable elements, each addressable element constructed and arranged to have a variable transmittance.

摘要翻译： 一种用于提供用于半导体制造的光刻成像的可变照明场的装置和方法，包括提供包括具有可寻址元件阵列的可变光学元件的照明系统，每个可寻址元件被构造和布置成具有可变透射率。

公开(公告)号：US20060204090A1

公开(公告)日：2006-09-14

申请号：US11359781

申请日：2006-02-23

申请人： Robert Socha ,  Jang Chen

发明人： Robert Socha ,  Jang Chen

IPC分类号： G06K9/00

CPC分类号： G03F7/705 ,  G03F7/70125

摘要： Optimization of illumination for a full-chip layer is disclosed. A pitch frequency of the full-chip layer is determined so as to generate a pitch frequency histogram of the full-chip layer. The pitch frequency indicates how often a given pitch occurs in the full-chip layer. The pitch frequency histogram is equated to be the first eigenfunction from the sum of coherent system representation of a transformation cross coefficient. An integral equation for the first eigenfunction of the transformation cross coefficient is solved so as to define the optimal illumination for imaging the full-chip layer.

公开(公告)号：US09080282B2

公开(公告)日：2015-07-14

申请号：US13361375

申请日：2012-01-30

申请人： Michael J. Zambrowicz ,  Stephen L. Harris ,  Robert Socha

发明人： Michael J. Zambrowicz ,  Stephen L. Harris ,  Robert Socha

IPC分类号： F26B25/00 ,  D06F58/04 ,  D06F58/28

CPC分类号： D06F58/04 ,  D06F58/28 ,  D06F2058/2838 ,  D06F2058/2883

摘要： A laundry dryer includes a drum. A moisture sensing system detects an average moisture content of launderable items as they are dried within the drum and provides a moisture signal to an electronic controller. A user interface presenting a setpoint selection element such that when a moisture setpoint is selected by a machine operator during a drying cycle, an operational state of the dryer machine is controlled by the electronic controller based on the moisture setpoint and the moisture signal.

摘要翻译： 洗衣机包括滚筒。 湿度感测系统检测洗涤物品在滚筒内干燥时的平均含水量，并向电子控制器提供湿度信号。 一种用户界面，其呈现设定点选择元件，使得当在干燥循环期间机器操作者选择湿度设定点时，干燥机的操作状态由电子控制器基于湿度设定点和湿度信号来控制。

公开(公告)号：US20090053621A1

公开(公告)日：2009-02-26

申请号：US12186410

申请日：2008-08-05

申请人： Robert Socha

发明人： Robert Socha

IPC分类号： G03F1/00

CPC分类号： G06T7/001 ,  G03F7/70091 ,  G03F7/70125 ,  G03F7/70425 ,  G03F7/70433 ,  G03F7/705

摘要： An illumination source is optimized by changing the intensity and shape of the illumination source to form an image in the image plane that maximizes the minimum ILS at user selected fragmentation points while forcing the intensity at the fragmentation points to be within a small intensity range. An optimum mask may be determined by changing the magnitude and phase of the diffraction orders to form an image in the image plane that maximizes the minimum ILS at user selected fragmentation points while forcing the intensity at the fragmentation points to be within a small intensity range. Primitive rectangles having a size set to a minimum feature size of a mask maker are assigned to the located minimum and maximum transmission areas ad centered at a desired location. The edges of the primitive rectangle are varied to match optimal diffraction orders O(m,n). The optimal CPL mask OCPL(x,y) is then formed.

摘要翻译： 通过改变照射源的强度和形状来优化照明光源，以在图像平面中形成图像，使得在用户选择的碎片点处的最小ILS最大化，同时迫使碎裂点处的强度处于小的强度范围内。 可以通过改变衍射级的大小和相位来确定最佳掩模，以在图像平面中形成使用户选择的碎片点处的最小ILS最大化的图像，同时迫使碎裂点处的强度在小的强度范围内。 具有设置为掩模制造者的最小特征尺寸的尺寸的原始矩形被分配给位于期望位置的所定位的最小和最大传输区域。 改变原始矩形的边缘以匹配最佳衍射阶数O（m，n）。 然后形成最佳CPL掩模OCPL（x，y）。