Lithographic apparatus and device manufacturing method
    1.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号:US20070273853A1

    公开(公告)日:2007-11-29

    申请号:US11655999

    申请日:2007-01-22

    IPC分类号: G03B27/32

    摘要: A method of transferring an image of a pattern layout onto a surface of a substrate including selecting a first illumination profile for a first area of the pattern layout and a second illumination profile for a second area of the pattern layout; switching illumination profile during transfer of the image of the pattern layout such that the first area of the pattern layout is illuminated with the first illumination profile and the second area is illuminated with the second illumination profile; and projecting an image of the illuminated first and second areas onto the surface of the substrate.

    摘要翻译: 将图案布局的图像转印到基板的表面上的方法,包括为图案布局的第一区域选择第一照明轮廓,以及为图案布局的第二区域选择第二照明轮廓; 在图案布局的图像传送期间切换照明轮廓,使得图案布局的第一区域被第一照明轮廓照亮,并且第二区域被第二照明轮廓照亮; 以及将照射的第一和第二区域的图像投影到基板的表面上。

    Light patterning device using tilting mirrors in a superpixel form
    4.
    发明申请
    Light patterning device using tilting mirrors in a superpixel form 有权
    以超像素形式使用倾斜镜的光图案形成装置

    公开(公告)号:US20060245033A1

    公开(公告)日:2006-11-02

    申请号:US11116338

    申请日:2005-04-28

    IPC分类号: G02B26/00

    摘要: A light patterning system comprises an illumination system that supplies a beam of radiation having a certain wavelength (λ). An array of reflective pixels patterns the beam, wherein the array includes pixels having at least a first tilting mirror that is logically coupled to a second tilting mirror. In an embodiment, the first and second tilting mirrors are (i) substantially adjacent to each other; and (ii) offset in height from each other by a first mirror displacement. A projection system is included that projects the patterned beam onto a target. In alternate embodiment, the array of reflective pixels includes pixels having first through fourth tilting mirrors that are logically coupled to each other. The first through fourth tilting mirrors are (i) respectively offset in height from a reference plane by first through fourth mirror displacements, and (ii) are respectively arranged clockwise in a substantially square pattern.

    摘要翻译: 光图案化系统包括提供具有一定波长(λ)的辐射束的照明系统。 反射像素阵列对光束进行图案化,其中阵列包括至少具有逻辑耦合到第二倾斜镜的第一倾斜镜的像素。 在一个实施例中,第一和第二倾斜镜是(i)基本上彼此相邻; 和(ii)通过第一反射镜位移使高度彼此抵消。 包括将图案化的光束投影到目标上的投影系统。 在替代实施例中,反射像素阵列包括具有彼此逻辑耦合的第一至第四倾斜镜的像素。 第一至第四倾斜镜(i)分别通过第一到第四镜面位移而偏离参考平面,并且(ii)分别以基本上正方形的图案顺时针地布置。

    System and method for generating pattern data used to control a pattern generator
    5.
    发明申请
    System and method for generating pattern data used to control a pattern generator 有权
    用于生成用于控制图案生成器的图案数据的系统和方法

    公开(公告)号:US20060115752A1

    公开(公告)日:2006-06-01

    申请号:US10998991

    申请日:2004-11-30

    IPC分类号: G03C5/00

    摘要: A method and system are used to modify pattern data obtained in relation to a pattern on a static patterning device. It is suggested that, in an example when a maskless lithography tool is used, continuous OPC-enhanced features used for maskless lithography rasterization should include a variation in local amplitude and phase transmittance that matches modulation capabilities of a patterning device being used. The modified pattern data is used by a dynamic patterning device to pattern impinging light, which is then projected onto an object. The system and method comprise using a pattern data generating device, a modification device, a dynamic pattern generator, and a projection system. The pattern data generating device generates pattern data corresponding to a pattern on a static patterning device. The modification device receives the pattern data and modifies the pattern data using characteristics of a type of the dynamic pattern generator being used. The dynamic pattern generator receives the modified patterned data and uses the modified pattern data to pattern the beam of radiation. The projection system projects the patterned beam onto the object.

    摘要翻译: 使用方法和系统来修改相对于静态图案形成装置上的图案获得的图案数据。 建议在使用无掩模光刻工具的示例中,用于无掩模光刻光栅化的连续OPC增强特征应包括与正在使用的图案形成装置的调制能力相匹配的局部振幅和相位透射率的变化。 修改的图案数据由动态图案形成装置用于对入射光进行图案化,然后将其投影到物体上。 该系统和方法包括使用图案数据生成装置,修改装置,动态图案生成器和投影系统。 图案数据生成装置生成与静态图案形成装置上的图案对应的图案数据。 修改设备接收图案数据,并使用所使用的动态图案生成器的类型的特征来修改图案数据。 动态图案生成器接收经修改的图案数据并使用经修改的图案数据来对辐射束进行图案化。 投影系统将图案化的光束投射到物体上。

    Lithographic apparatus and device manufacturing method using interferometric and maskless exposure units
    6.
    发明申请
    Lithographic apparatus and device manufacturing method using interferometric and maskless exposure units 有权
    使用干涉式和无掩模曝光单元的平版印刷设备和器件制造方法

    公开(公告)号:US20070139633A1

    公开(公告)日:2007-06-21

    申请号:US11311640

    申请日:2005-12-20

    IPC分类号: G03B27/54

    摘要: A lithographic system combining an interference exposure unit and a lithography unit. The lithography unit can comprise an array of individually controllable elements. The lithography system can be arranged such that a pitch of the lines exposed by the interference exposure unit is an integer multiple of a size of an exposure area of the lithography unit corresponding to a single individually controllable element.

    摘要翻译: 组合干涉曝光单元和光刻单元的光刻系统。 光刻单元可以包括单独可控元件的阵列。 光刻系统可以布置成使得由干涉曝光单元曝光的线的间距是与单个可单独控制的元件对应的光刻单元的曝光区域的尺寸的整数倍。

    Lithographic apparatus and device manufacturing method using dose control
    7.
    发明申请
    Lithographic apparatus and device manufacturing method using dose control 审中-公开
    平版印刷设备和使用剂量控制的器件制造方法

    公开(公告)号:US20070030471A1

    公开(公告)日:2007-02-08

    申请号:US11580134

    申请日:2006-10-13

    IPC分类号: G03B27/54

    摘要: A system and method are used to manufacture a device using at least one exposure step. Each exposure step projects a patterned beam of radiation onto a substrate. The patterned beam includes a plurality of pixels. Each pixel delivers a radiation dose no greater than a predetermined normal maximum dose to the target portion in the exposure step and/or at least one selected pixel delivers an increased radiation dose, greater than the normal maximum dose. The increased dose may be delivered to compensate for the effect of a defective element at a known position in the array on a pixel adjacent a selected pixel or compensate for underexposure of the target portion at the location of a selected pixel resulting from exposure of that location to a pixel affected by a known defective element in another exposure step.

    摘要翻译: 使用系统和方法来制造使用至少一个曝光步骤的装置。 每个曝光步骤将图案化的辐射束投射到衬底上。 图案化的波束包括多个像素。 每个像素在曝光步骤中向目标部分提供不大于预定正常最大剂量的辐射剂量,和/或至少一个所选择的像素传递大于正常最大剂量的增加的辐射剂量。 可以递送增加的剂量以补偿阵列中与已选择像素相邻的像素处的已知位置处的有缺陷元件的影响,或者补偿由于该位置的曝光导致的所选像素的位置处的目标部分的曝光不足 涉及在另一曝光步骤中受已知缺陷元件影响的像素。