USE OF PERFLUOROALKANES IN VACUUM ULTRAVIOLET APPLICATIONS
    1.
    发明申请
    USE OF PERFLUOROALKANES IN VACUUM ULTRAVIOLET APPLICATIONS 审中-公开
    在真空紫外线应用中使用全氟烷烃

    公开(公告)号:US20090079953A1

    公开(公告)日:2009-03-26

    申请号:US12117256

    申请日:2008-05-08

    IPC分类号: G03B27/72

    摘要: This invention concerns liquid perfluoro-n-alkanes for use in applications demanding high transparency at UV wavelengths ranging from about 150 to 165 nm, especially 157 nm. Uses include optical couplants, optical cements, optical elements, optical inspection media for photolithography at 157 nm exposure wavelength.

    摘要翻译: 本发明涉及用于在约150至165nm,特别是157nm的UV波长下要求高透明度的应用中的液体全氟正烷烃。 用途包括光学耦合剂,光学水泥,光学元件,用于157nm曝光波长的光刻的光学检查介质。

    Use of perfluoro-n-alkanes in vacuum ultraviolet applications
    3.
    发明授权
    Use of perfluoro-n-alkanes in vacuum ultraviolet applications 失效
    在真空紫外线应用中使用全氟正烷烃

    公开(公告)号:US07402377B2

    公开(公告)日:2008-07-22

    申请号:US10903526

    申请日:2004-07-30

    IPC分类号: G03F7/26

    摘要: This invention concerns liquid perfluoro-n-alkanes for use in applications demanding high transparency at UV wavelengths ranging from about 150 to 165 nm, especially 157 nm. Uses include optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and most especially immersion photolithography at 157 nm exposure wavelength.

    摘要翻译: 本发明涉及用于在约150至165nm,特别是157nm的UV波长下要求高透明度的应用中的液体全氟正烷烃。 用途包括光学耦合剂,光学胶粘剂,光学元件,用于半导体晶片和器件的光学检测介质,最特别是157nm曝光波长的浸没式光刻技术。

    HIGHLY PURIFIED LIQUID PERFLUORO-n-ALKANES AND METHOD FOR PREPARING
    5.
    发明申请
    HIGHLY PURIFIED LIQUID PERFLUORO-n-ALKANES AND METHOD FOR PREPARING 审中-公开
    高纯度液体全氟烷烃和制备方法

    公开(公告)号:US20080124660A1

    公开(公告)日:2008-05-29

    申请号:US11938222

    申请日:2007-11-09

    CPC分类号: G03F7/70216

    摘要: Provided are liquid perfluoro-n-alkanes that are highly transparent to UV wavelengths ranging from about 150 nm to 165 nm, and to the method by which high transparency may be obtained. The liquid, perfluoro-n-alkanes are useful in optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and immersion photolithography at 157 nm exposure wavelength.

    摘要翻译: 提供对于约150nm至165nm的UV波长具有高度透明性的液体全氟正烷烃,以及可获得高透明度的方法。 液体全氟正烷烃可用于光耦合剂,光学粘合剂,光学元件,用于半导体晶片和器件的光学检测介质以及157nm曝光波长的浸没光刻。

    Use of highly purified hydrocarbons in vacuum ultraviolet applications
    7.
    发明授权
    Use of highly purified hydrocarbons in vacuum ultraviolet applications 失效
    在真空紫外线应用中使用高度纯化的碳氢化合物

    公开(公告)号:US07589242B2

    公开(公告)日:2009-09-15

    申请号:US11141285

    申请日:2005-09-14

    IPC分类号: C10M105/02 G03C1/00

    CPC分类号: G03F7/2041

    摘要: The present invention is drawn to the use of alkanes that are highly transparent to UV wavelengths ranging from about 170 nm to 260 nm in optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and immersion photolithography, particularly at 193 and 248 nm exposure wavelength.

    摘要翻译: 本发明涉及在光耦合剂,光学胶粘剂,光学元件,用于半导体晶片和器件的光学检查介质以及浸没式光刻技术中使用对从约170nm至260nm范围内的UV波长高度透明的烷烃,特别是在 193和248 nm的曝光波长。

    Copolymers for photoresists and processes therefor
    9.
    发明授权
    Copolymers for photoresists and processes therefor 失效
    用于光刻胶及其工艺的共聚物

    公开(公告)号:US06872503B2

    公开(公告)日:2005-03-29

    申请号:US10257901

    申请日:2001-05-04

    摘要: Fluoroolefin/acid group or protected acid group-containing copolymers for photoresist compositions and microlithography methods employing the photoresist compositions are described. These copolymer compositions comprise 1) at least one fluoroolefin, preferably hexafluoroisobutylene, and 2) an acid group or a protected acid group (e.g., a t-alkyl ester, preferably a t-butyl ester), which together impart high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm and 193 nm, which makes them useful for lithography at these short wavelengths.

    摘要翻译: 描述了用于光致抗蚀剂组合物的氟烯烃/酸基或被保护的含酸基的共聚物和使用光致抗蚀剂组合物的微光刻方法。 这些共聚物组合物包含1)至少一种氟代烯烃,优选六氟异丁烯,以及2)酸性基团或被保护的酸基团(例如,叔烷基酯,优选叔丁基酯),它们共同赋予高紫外(UV) 这些材料的基本媒体的透明度和可开发性。 本发明的材料具有高的UV透明度,特别是在短波长,例如157nm和193nm,这使得它们可用于在这些短波长处的光刻。