摘要:
This invention concerns liquid perfluoro-n-alkanes for use in applications demanding high transparency at UV wavelengths ranging from about 150 to 165 nm, especially 157 nm. Uses include optical couplants, optical cements, optical elements, optical inspection media for photolithography at 157 nm exposure wavelength.
摘要:
A method for preparing packages holding liquid alkanes exhibiting high transparency and photochemical stability at wavelength of about 193 nm, wherein a sealable vessel is flushed with an inert gas to form an atmosphere of inert gas, a liquid alkane is charged into the vessel in the atmosphere of inert gas, and the charged vessel is sealed.
摘要:
This invention concerns liquid perfluoro-n-alkanes for use in applications demanding high transparency at UV wavelengths ranging from about 150 to 165 nm, especially 157 nm. Uses include optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and most especially immersion photolithography at 157 nm exposure wavelength.
摘要:
Disclosed are partially fluorinated and fully fluorinated polymers that are substantially transparent to ultraviolet radiation at wavelengths from 187 to 260 nanometers.
摘要:
Provided are liquid perfluoro-n-alkanes that are highly transparent to UV wavelengths ranging from about 150 nm to 165 nm, and to the method by which high transparency may be obtained. The liquid, perfluoro-n-alkanes are useful in optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and immersion photolithography at 157 nm exposure wavelength.
摘要:
This invention relates to a fluoropolymer nanocomposite comprising a fluoropolymer phase and an inorganic oxide phase dispersed throughout, said inorganic oxide phase having either no particles or particles substantially all of which have a particle size of less than about 75 nm which can be determined by small angle x-ray scattering and transmission electron microscopy techniques. These nanocomposites are useful as protective coatings.
摘要:
The present invention is drawn to the use of alkanes that are highly transparent to UV wavelengths ranging from about 170 nm to 260 nm in optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and immersion photolithography, particularly at 193 and 248 nm exposure wavelength.
摘要:
Disclosed are partially fluorinated and fully fluorinated polymers that are substantially transparent to ultraviolet radiation at wavelengths from approximately 150 nanometer to 260 nanometers.
摘要:
Fluoroolefin/acid group or protected acid group-containing copolymers for photoresist compositions and microlithography methods employing the photoresist compositions are described. These copolymer compositions comprise 1) at least one fluoroolefin, preferably hexafluoroisobutylene, and 2) an acid group or a protected acid group (e.g., a t-alkyl ester, preferably a t-butyl ester), which together impart high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm and 193 nm, which makes them useful for lithography at these short wavelengths.
摘要:
Disclosed are partially fluorinated and fully fluorinated polymers that are substantially transparent to ultraviolet radiation at wavelengths from 140 to 186 nanometers.