公开(公告)号：US20210149305A1

公开(公告)日：2021-05-20

申请号：US17084195

申请日：2020-10-29

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.

Inventor： Su Min Lee ,  Jin Kwon ,  Ho-Suk Song

IPC: G03F7/085 ,  G03F7/033 ,  G03F7/004

Abstract: The present invention relates to a photosensitive resin composition and an insulation film prepared therefrom. Since the photosensitive resin composition comprises a blocked isocyanate-based compound, it can form a transparent insulation film while it maintains excellent film retention rate, hardness, and resolution.

公开(公告)号：US20180321535A1

公开(公告)日：2018-11-08

申请号：US15774426

申请日：2016-09-28

Applicant: Rohm and Haas Electronic Materials Korea Ltd.

Inventor： Yeonok Kim ,  Seok-Bong Park ,  Gyung-Sik Choi ,  Su Min Lee

IPC: G02F1/1339 ,  G02F1/13 ,  B05D1/32

CPC classification number: G02F1/13394 ,  B05D1/32 ,  G02F1/1303 ,  G02F2001/13398

Abstract: The present invention relates to a method for preparing a column spacer, and is characterized in using a mask including first, second, and third patterns having different light transmittance. In addition, according to the method for preparing a column spacer of the present invention, a taper angle between a matrix part and a spacer part may increase during manufacturing a column spacer in which the matrix part and the spacer part are continuously connected, and critical dimension of the spacer part may decrease. Therefore, a column spacer with fine patterns may be simply and efficiently manufactured.

公开(公告)号：US20210149306A1

公开(公告)日：2021-05-20

申请号：US17084222

申请日：2020-10-29

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD

Inventor： Jin Kwon ,  Su Min Lee ,  Ho-Suk Song

IPC: G03F7/085 ,  G03F7/004 ,  G03F7/033

Abstract: The present invention relates to a photosensitive resin composition and an insulation film prepared therefrom. The photosensitive resin composition is capable of preparing a colored insulation film without a dye. In addition, the photosensitive resin composition is capable of being cured at a low temperature and preparing an insulation film that is excellent in all of such characteristics as film strength, hardness, and resolution.

公开(公告)号：US10859907B2

公开(公告)日：2020-12-08

申请号：US15774426

申请日：2016-09-28

Applicant: Rohm and Haas Electronic Materials Korea Ltd.

Inventor： Yeonok Kim ,  Seok-Bong Park ,  Gyung-Sik Choi ,  Su Min Lee

IPC: G03F1/50 ,  G02F1/1339

Abstract: The present invention relates to a method for preparing a column spacer, and is characterized in using a mask including first, second, and third patterns having different light transmittance. In addition, according to the method for preparing a column spacer of the present invention, a taper angle between a matrix part and a spacer part may increase during manufacturing a column spacer in which the matrix part and the spacer part are continuously connected, and critical dimension of the spacer part may decrease. Therefore, a column spacer with fine patterns may be simply and efficiently manufactured.