公开(公告)号：US10031420B2

公开(公告)日：2018-07-24

申请号：US15234124

申请日：2016-08-11

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Owendi Ongayi ,  Charlotte Cutler ,  Mingqi Li ,  Shintaro Yamada ,  James Cameron

IPC: G03F7/075 ,  G03F7/11 ,  G03F7/40 ,  G03F7/09 ,  C08G77/28 ,  C08G77/14 ,  G03F7/20 ,  C09D183/08 ,  C09D183/06 ,  C08G77/18 ,  C08G77/00 ,  C08G77/26 ,  G03F7/16 ,  G03F7/32

Abstract: Wet-strippable antireflective compositions comprising one or more silicon-containing polymers that are free of Q-monomers and hydridosilanes as polymerized units are provided. These compositions are useful in the manufacture of various electronic devices.

公开(公告)号：US20230161257A1

公开(公告)日：2023-05-25

申请号：US17491001

申请日：2021-09-30

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Irvinder Kaur ,  Charlotte Cutler ,  Ke Yang ,  Mingqi Li

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/32 ,  G03F7/20

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/327 ,  G03F7/2004

Abstract: A polymer, comprising a first repeating unit derived from a first monomer comprising a single ester acetal group, and a second repeating unit derived from a second monomer comprising a plurality of ester acetal groups.

公开(公告)号：US20160363861A1

公开(公告)日：2016-12-15

申请号：US15234124

申请日：2016-08-11

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Owendi Ongayi ,  Charlotte Cutler ,  Mingqi Li ,  Shintaro Yamada ,  James Cameron

IPC: G03F7/09 ,  C08G77/26 ,  C08G77/18 ,  G03F7/32 ,  C09D183/06 ,  G03F7/16 ,  G03F7/20 ,  C08G77/28 ,  C09D183/08

CPC classification number: G03F7/091 ,  C08G77/14 ,  C08G77/18 ,  C08G77/26 ,  C08G77/28 ,  C08G77/80 ,  C09D183/06 ,  C09D183/08 ,  G03F7/0752 ,  G03F7/168 ,  G03F7/20 ,  G03F7/32

Abstract: Wet-strippable antireflective compositions comprising one or more silicon-containing polymers that are free of Q-monomers and hydridosilanes as polymerized units are provided. These compositions are useful in the manufacture of various electronic devices.

Abstract translation: 提供包含一种或多种不含Q-单体和氢硅烷作为聚合单元的含硅聚合物的可湿剥离的抗反射组合物。 这些组合物可用于制造各种电子装置。

公开(公告)号：US09442377B1

公开(公告)日：2016-09-13

申请号：US14739402

申请日：2015-06-15

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Owendi Ongayi ,  Charlotte Cutler ,  Mingqi Li ,  Shintaro Yamada ,  James Cameron

IPC: G03F7/075 ,  G03F7/11 ,  G03F7/40 ,  G03F7/09 ,  C08G77/28 ,  C08G77/14 ,  G03F7/20 ,  C09D183/08 ,  C09D183/06 ,  C08G77/18

CPC classification number: G03F7/091 ,  C08G77/14 ,  C08G77/18 ,  C08G77/26 ,  C08G77/28 ,  C08G77/80 ,  C09D183/06 ,  C09D183/08 ,  G03F7/0752 ,  G03F7/168 ,  G03F7/20 ,  G03F7/32

Abstract: Wet-strippable antireflective compositions comprising one or more silicon-containing polymers that are free of Q-monomers and hydridosilanes as polymerized units are provided. These compositions are useful in the manufacture of various electronic devices.

Abstract translation: 提供包含一种或多种不含Q-单体和氢硅烷作为聚合单元的含硅聚合物的可湿剥离的抗反射组合物。 这些组合物可用于制造各种电子装置。