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公开(公告)号：US4223166A
公开(公告)日：1980-09-16
申请号：US14515
申请日：1979-02-23
申请人： Roland Jaeger , Kurt Huber
发明人： Roland Jaeger , Kurt Huber
摘要： A process for the production of 4-bromo-2-chloro-phenols of the formula ##STR1## wherein X represents hydrogen or chlorine is disclosed which process comprises the bromination of a 2-chlorphenol of the formula ##STR2## wherein X has the meaning given above in the presence of a compound of the formula ##STR3## in which R.sub.1 represents an alkyl group having 1 to 8 carbon atoms, or the phenyl or benzyl group,R.sub.2 and R.sub.3 independently of one another represent an alkyl group having 1 to 8 carbon atoms,R.sub.4 represents hydrogen, or an alkyl group having 1 to 8 carbon atoms, andX represents chlorine, bromine, or iodine or the hydrogen sulfate anion.The new process substantially avoids the undesired formation of the 2,6-isomers and the 4-bromo-2-chlorophenols are obtained in excellent purity.
摘要翻译： 公开了制备式“IMAGE”的4-溴-2-氯苯酚的方法，其中X代表氢或氯，该方法包括溴化式IMA的2-氯酚，其中X具有意义 在其中R 1表示具有1至8个碳原子的烷基或苯基或苄基的化合物“IMAGE”的存在下，R 2和R 3彼此独立地表示具有1至8个碳原子的烷基 碳原子，R 4表示氢或碳原子数1〜8的烷基，X表示氯，溴或碘或硫酸氢根阴离子。 新方法基本上避免了不希望的2,6-异构体的形成，并且以优异的纯度获得了4-溴-2-氯苯酚。
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公开(公告)号：US20080299681A1
公开(公告)日：2008-12-04
申请号：US12021791
申请日：2008-01-29
CPC分类号： H01L21/76877 , H01L21/2855 , H01L21/76865 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： For providing control of two-step or a multi-step deposition process, a method and a corresponding deposition system is provided comprising providing a deposition process having at least two sub-processes employing different sets of process parameters, wherein each set of process parameters comprises at least one process parameter. The method comprises controllably generating an actual value for at least one first process parameter by taking into account at least one previous value of the respective first process parameter, wherein each first process parameter is a process parameter of said at least two sets of process parameters.
摘要翻译： 为了提供两步或多步沉积过程的控制，提供了一种方法和相应的沉积系统，其包括提供具有采用不同工艺参数集的至少两个子过程的沉积工艺，其中每组工艺参数包括 至少一个过程参数。 该方法包括通过考虑到相应的第一过程参数的至少一个先前值来可控地生成至少一个第一过程参数的实际值，其中每个第一过程参数是所述至少两组过程参数的过程参数。
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公开(公告)号：US08585877B2
公开(公告)日：2013-11-19
申请号：US13416025
申请日：2012-03-09
CPC分类号： H01L21/76877 , H01L21/2855 , H01L21/76865 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： For providing control of two-step or a multi-step deposition process, a method and a corresponding deposition system is provided comprising providing a deposition process having at least two sub-processes employing different sets of process parameters, wherein each set of process parameters comprises at least one process parameter. The method comprises controllably generating an actual value for at least one first process parameter by taking into account at least one previous value of the respective first process parameter, wherein each first process parameter is a process parameter of said at least two sets of process parameters.
摘要翻译： 为了提供两步或多步沉积过程的控制，提供了一种方法和相应的沉积系统，其包括提供具有采用不同工艺参数集的至少两个子过程的沉积工艺，其中每组工艺参数包括 至少一个过程参数。 该方法包括通过考虑到相应的第一过程参数的至少一个先前值来可控地生成至少一个第一过程参数的实际值，其中每个第一过程参数是所述至少两组过程参数的过程参数。
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公开(公告)号：US08163571B2
公开(公告)日：2012-04-24
申请号：US12021791
申请日：2008-01-29
IPC分类号： H01L21/00
CPC分类号： H01L21/76877 , H01L21/2855 , H01L21/76865 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： For providing control of two-step or a multi-step deposition process, a method and a corresponding deposition system is provided comprising providing a deposition process having at least two sub-processes employing different sets of process parameters, wherein each set of process parameters comprises at least one process parameter. The method comprises controllably generating an actual value for at least one first process parameter by taking into account at least one previous value of the respective first process parameter, wherein each first process parameter is a process parameter of said at least two sets of process parameters.
摘要翻译： 为了提供两步或多步沉积过程的控制，提供了一种方法和相应的沉积系统，其包括提供具有采用不同工艺参数集的至少两个子过程的沉积工艺，其中每组工艺参数包括 至少一个过程参数。 该方法包括通过考虑到相应的第一过程参数的至少一个先前值来可控地生成至少一个第一过程参数的实际值，其中每个第一过程参数是所述至少两组过程参数的过程参数。
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公开(公告)号：US06560268B1
公开(公告)日：2003-05-06
申请号：US09624633
申请日：2000-07-24
申请人： Eckard Deichsel , Roland Jaeger , Peter Unger
发明人： Eckard Deichsel , Roland Jaeger , Peter Unger
IPC分类号： H01S308
CPC分类号： B82Y20/00 , G02F1/3523 , G02F1/3556 , G02F2201/346 , G02F2202/108 , H01S3/08059 , H01S3/1118 , H01S3/113
摘要： A resonator mirror with a saturable absorber for a laser wavelength &lgr;L formed of a series of layers of a plurality of semiconductor layers on a substrate, wherein a Bragg reflector formed of a plurality of alternately arranged layers comprising a first material with an index of refraction nH and a second material with a lower index of refraction NL compared with the latter is grown on a surface of the substrate. It is characterized in that a threefold layer is grown on the Bragg reflector, wherein a single quantum layer is embedded within two layers outside an intensity minimum for the laser radiation &lgr;L and the threefold layer has a combined optical thickness of λ L 2 .
摘要翻译： 一种具有用于由衬底上的多个半导体层的一系列层形成的用于激光波长的可饱和吸收体的谐振镜，其中由多个交替布置的层形成的布拉格反射器包括折射率nH的第一材料 并且在衬底的表面上生长具有比后者折射率低的第二材料NL。 其特征在于，在布拉格反射器上生长三层，其中单个量子层嵌入在用于激光辐射lambdL的强度最小值之外的两层内，并且三层具有组合的光学厚度
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