Separating vinylcyclohexene from a butadiene extracting solvent
    1.
    发明授权
    Separating vinylcyclohexene from a butadiene extracting solvent 失效
    从丁二烯提取溶剂中分离乙烯基环己烯

    公开(公告)号:US5382745A

    公开(公告)日:1995-01-17

    申请号:US235738

    申请日:1994-04-29

    IPC分类号: C07C7/00

    CPC分类号: C07C7/00 C07C2101/16

    摘要: Disclosed is a method of separating a butadiene extracting solvent that forms an azeotrope with vinylcyclohexene from a mixture with vinylcyclohexene. The mixture is cooled to a temperature below 0.degree. C. which results in the formation of a vinylcyclohexene phase over an extracting solvent phase and the two phases are physically separated. Also disclosed is apparatus suitable for performing this process.

    摘要翻译: 公开了与乙烯基环己烯的混合物与乙烯基环己烯形成共沸物的丁二烯提取溶剂的方法。 将混合物冷却至低于0℃的温度,这导致在萃取溶剂相上形成乙烯基环己烯相,两相物理分离。 还公开了适于执行该过程的装置。

    BUBBLER APPARATUS AND DELIVERY METHOD
    2.
    发明申请
    BUBBLER APPARATUS AND DELIVERY METHOD 有权
    BUBBLER装置和送货方式

    公开(公告)号:US20080182010A1

    公开(公告)日:2008-07-31

    申请号:US12014270

    申请日:2008-01-15

    摘要: This invention relates to vapor phase reagent dispensing apparatus having a bubbler tube and also a metal seal aligned and in contact with the hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.

    摘要翻译: 本发明涉及一种气相试剂分配装置,其具有起泡管和与顶壁构件的硬化相对的平坦表面对准并与侧壁构件上的突起接触的金属密封件,其中,硬化的相对的平坦表面 顶壁构件和突起的硬度大于金属密封件的硬度。 分配装置可用于分配诸如用于在半导体材料和装置的制造中沉积材料的前体的试剂。

    Catalyst and process for the preparation of trifluoromethyltoluenes
    3.
    发明授权
    Catalyst and process for the preparation of trifluoromethyltoluenes 失效
    用于制备三氟甲基甲苯的催化剂和方法

    公开(公告)号:US5126497A

    公开(公告)日:1992-06-30

    申请号:US718695

    申请日:1991-06-21

    IPC分类号: C07C17/00

    CPC分类号: C07C17/35

    摘要: A partially deactivated reduction catalyst is prepared by reacting palladium on alumina catalyst with benzotrifluoride in an amount of 0.1 to 10.0 millimoles of benzotrifluoride per gram of alumina and hydrogen in an amount ranging from 10 to 2000 moles of hydrogen per mole of benzotrifluoride at a temperature of 200.degree. C. to 300.degree. C. for 30 minutes to 2 hours. The catalyst is useful for the reduction of trifluoromethylbenzonitriles and trifluoromethylbenzylamines to produce the corresponding trifluoromethyltoluenes in high yields. The catalyst is also useful in other hydrogen reduction reactions, e.g., for conversion of o-chlorobenzonitrile, o-chlorobenzylamine and mandelonitrile to toluene and for conversion of phenethylamine to ethylbenzene.

    摘要翻译: 部分失活的还原催化剂是通过使钯/氧化铝催化剂与每摩尔氧化铝为0.1至10.0毫摩尔的三氟甲苯的量和每摩尔三氟甲苯的10至2000摩尔氢的量反应制备的,温度为 在200℃至300℃下搅拌30分钟至2小时。 催化剂可用于还原三氟甲基苯腈和三氟甲基苄胺以高产率生成相应的三氟甲基甲苯。 催化剂也可用于其它氢还原反应,例如用于将邻氯苄腈,邻氯苄胺和扁桃腈转化成甲苯,以及将苯乙胺转化为乙苯。

    Preparation of halogen substituted phthalic anhydride
    4.
    发明授权
    Preparation of halogen substituted phthalic anhydride 失效
    卤素取代邻苯二甲酸酐的制备

    公开(公告)号:US4978760A

    公开(公告)日:1990-12-18

    申请号:US160035

    申请日:1988-02-24

    申请人: Ronald F. Spohn

    发明人: Ronald F. Spohn

    CPC分类号: C07C51/567

    摘要: A process for the preparation of halogen substituted phthalic anhydrides of the formula: ##STR1## wherein x is a halogen, by the reaction of a halogen substituted tetrahydrophthalic phthalic anhydride of the formula ##STR2## or a geminal dihalogen substituted hexahydrophthalic anhydride of the formula ##STR3## in a vapor or liquid phase while mixed with an air flow and an activated carbon catalyst at an elevated temperature.

    Diptube apparatus and delivery method
    6.
    发明授权
    Diptube apparatus and delivery method 有权
    Diptube设备和送货方式

    公开(公告)号:US08114479B2

    公开(公告)日:2012-02-14

    申请号:US13101653

    申请日:2011-05-05

    IPC分类号: B05B17/00 B29D23/00 B67D7/00

    摘要: This invention relates to a vapor or liquid phase reagent dispensing apparatus having a diptube and also a metal seal aligned and in contact with hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.

    摘要翻译: 本发明涉及一种蒸汽或液相试剂分配装置,其具有汲取管以及与顶壁构件和侧壁构件上的突起的硬化相对的平坦表面对准并接触的金属密封件,其中硬化的相对的平坦表面 顶壁构件和突起的硬度大于金属密封件的硬度。 分配装置可用于分配诸如用于在半导体材料和装置的制造中沉积材料的前体的试剂。

    APPARATUS AND METHOD FOR DELIVERING VAPOR PHASE REAGENT TO A DEPOSITION CHAMBER
    7.
    发明申请
    APPARATUS AND METHOD FOR DELIVERING VAPOR PHASE REAGENT TO A DEPOSITION CHAMBER 有权
    用于将蒸气相试剂递送到沉积室的装置和方法

    公开(公告)号:US20080179767A1

    公开(公告)日:2008-07-31

    申请号:US12014194

    申请日:2008-01-15

    IPC分类号: B01D19/00 B01D47/02 C23C16/00

    摘要: This invention relates to a vapor or liquid phase reagent dispensing apparatus having a: metal seal aligned and in contact with hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The apparatus also has a temperature sensor and a source chemical level sensor extending through a centrally located portion of the top wall member and generally vertically downwardly to a sump cavity centrally located on a bottom wall member.The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.

    摘要翻译: 本发明涉及一种蒸汽或液相试剂分配装置,具有:金属密封件对准并与顶壁构件的硬化相对的平坦表面和侧壁构件上的突起接触,其中顶壁的硬化相对的平坦表面 构件和突起的硬度大于金属密封件的硬度。 该装置还具有温度传感器和源化学水平传感器,其通过顶壁构件的中心定位的部分延伸并且大致垂直向下延伸到位于底壁构件上方的集水腔。 分配装置可用于分配诸如用于在半导体材料和装置的制造中沉积材料的前体的试剂。

    Apparatus and method for delivering vapor phase reagent to a deposition chamber
    8.
    发明授权
    Apparatus and method for delivering vapor phase reagent to a deposition chamber 有权
    将蒸气相试剂输送到沉积室的装置和方法

    公开(公告)号:US08512635B2

    公开(公告)日:2013-08-20

    申请号:US12014194

    申请日:2008-01-15

    IPC分类号: G01N21/00

    摘要: This invention relates to a vapor or liquid phase reagent dispensing apparatus having a metal seal aligned and in contact with hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The apparatus also has a temperature sensor and a source chemical level sensor extending through a centrally located portion of the top wall member and generally vertically downwardly to a sump cavity centrally located on a bottom wall member. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.

    摘要翻译: 本发明涉及一种蒸汽或液相试剂分配装置,其具有对准并与顶壁构件的硬化相对的平坦表面和侧壁构件上的突起接触的金属密封件,其中顶壁构件的硬化相对的平坦表面 并且突起的硬度大于金属密封件的硬度。 该装置还具有温度传感器和源化学水平传感器,其通过顶壁构件的中心定位的部分延伸并且大致垂直向下延伸到位于底壁构件上方的集水腔。 分配装置可用于分配诸如用于在半导体材料和装置的制造中沉积材料的前体的试剂。

    Heteroleptic organometallic compounds
    9.
    发明授权
    Heteroleptic organometallic compounds 有权
    杂音有机金属化合物

    公开(公告)号:US07956207B2

    公开(公告)日:2011-06-07

    申请号:US11899784

    申请日:2007-09-07

    IPC分类号: C07F7/00 C07F11/00 C23C16/00

    CPC分类号: C07F7/10

    摘要: This invention relates to organometallic compounds represented by the formula (L1)xM(L2)y wherein M is a metal or metalloid, L1 and L2 are different and are each a hydrocarbon group or a heteroatom-containing group; x is a value of at least 1; y is a value of at least 1; x+y is equal to the oxidation state of M; and wherein (i) L1 has a steric bulk sufficiently large such that, due to steric hinderance, x cannot be a value equal to the oxidation state of M, (ii) L2 has a steric bulk sufficiently small such that, due to lack of steric hinderance, y can be a value equal to the oxidation state of M only in the event that x is not a value of at least 1, and (iii) L1 and L2 have a steric bulk sufficient to maintain a heteroleptic structure in which x+y is equal to the oxidation state of M; a process for producing the organometallic compounds, and a method for producing a film or coating from organometallic precursor compounds.

    摘要翻译: 本发明涉及由式(L1)xM(L2)y表示的有机金属化合物,其中M是金属或准金属,L1和L2不同,并且各自是烃基或含杂原子的基团; x是至少为1的值; y值至少为1; x + y等于M的氧化态; 并且其中(i)L1具有足够大的空间体积,使得由于空间阻力,x不能是等于M的氧化态的值,(ii)L2具有足够小的空间体积,使得由于缺乏 空间阻碍,y只有在x不是至少为1的值的情况下才可以是等于M的氧化态的值,以及(iii)L1和L2具有足够的空间体积以保持其中x的杂波结构 + y等于M的氧化态; 一种生产有机金属化合物的方法,以及一种由有机金属前体化合物制备薄膜或涂层的方法。

    DIPTUBE APPARATUS AND METHOD FOR DELIVERING VAPOR PHASE REAGENT TO A DEPOSITION CHAMBER
    10.
    发明申请
    DIPTUBE APPARATUS AND METHOD FOR DELIVERING VAPOR PHASE REAGENT TO A DEPOSITION CHAMBER 有权
    用于将蒸气相试剂递送到沉积室的DIPTUBE装置和方法

    公开(公告)号:US20080178809A1

    公开(公告)日:2008-07-31

    申请号:US12014237

    申请日:2008-01-15

    IPC分类号: C23C16/448 B05C11/10 B01D1/30

    摘要: This invention relates to a liquid phase reagent dispensing apparatus having a diptube and alsoa metal seal aligned and in contact with hardened opposing flat surfaces of top wall member and a protuberance[ [;] ]on a side wall member, wherein said hardened opposing flat surfaces of said top wall member and said protuberance have a hardness greater than the hardness of said metal seal.The apparatus further has a temperature sensor and a source chemical level sensor extending through a centrally located portion of the top wall member and generally vertically downwardly to a cavity centrally located on the a bottom wall member [ [,]] . The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.

    摘要翻译: 液相试剂分配装置本发明涉及一种液相试剂分配装置,其具有汲取管,以及金属密封件,其对准并与顶壁构件的硬化相对的平坦表面和侧壁构件上的突起[[]接触),其中所述硬化的相对平面 所述顶壁构件和所述突起的表面具有大于所述金属密封件的硬度的硬度。 该设备还具有温度传感器和源化学水平传感器,其通过顶壁构件的中心定位的部分并且大致垂直向下延伸到位于底壁构件[[,])上方的空腔。 分配装置可用于分配诸如用于在半导体材料和装置的制造中沉积材料的前体的试剂。