摘要:
Disclosed is a method of separating a butadiene extracting solvent that forms an azeotrope with vinylcyclohexene from a mixture with vinylcyclohexene. The mixture is cooled to a temperature below 0.degree. C. which results in the formation of a vinylcyclohexene phase over an extracting solvent phase and the two phases are physically separated. Also disclosed is apparatus suitable for performing this process.
摘要:
This invention relates to vapor phase reagent dispensing apparatus having a bubbler tube and also a metal seal aligned and in contact with the hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.
摘要:
A partially deactivated reduction catalyst is prepared by reacting palladium on alumina catalyst with benzotrifluoride in an amount of 0.1 to 10.0 millimoles of benzotrifluoride per gram of alumina and hydrogen in an amount ranging from 10 to 2000 moles of hydrogen per mole of benzotrifluoride at a temperature of 200.degree. C. to 300.degree. C. for 30 minutes to 2 hours. The catalyst is useful for the reduction of trifluoromethylbenzonitriles and trifluoromethylbenzylamines to produce the corresponding trifluoromethyltoluenes in high yields. The catalyst is also useful in other hydrogen reduction reactions, e.g., for conversion of o-chlorobenzonitrile, o-chlorobenzylamine and mandelonitrile to toluene and for conversion of phenethylamine to ethylbenzene.
摘要:
A process for the preparation of halogen substituted phthalic anhydrides of the formula: ##STR1## wherein x is a halogen, by the reaction of a halogen substituted tetrahydrophthalic phthalic anhydride of the formula ##STR2## or a geminal dihalogen substituted hexahydrophthalic anhydride of the formula ##STR3## in a vapor or liquid phase while mixed with an air flow and an activated carbon catalyst at an elevated temperature.
摘要:
Novel cylinder passivation procedures to increase the room temperature stability of gaseous tin deuteride (SnD4) are described. Incorporation of specific organic-containing materials, which when applied onto surfaces of a vessel and/or conduit extending therefrom, can increase the shelf life stability of thermodynamically unstable gases stored within such pretreated vessels.
摘要:
This invention relates to a vapor or liquid phase reagent dispensing apparatus having a diptube and also a metal seal aligned and in contact with hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.
摘要:
This invention relates to a vapor or liquid phase reagent dispensing apparatus having a: metal seal aligned and in contact with hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The apparatus also has a temperature sensor and a source chemical level sensor extending through a centrally located portion of the top wall member and generally vertically downwardly to a sump cavity centrally located on a bottom wall member.The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.
摘要:
This invention relates to a vapor or liquid phase reagent dispensing apparatus having a metal seal aligned and in contact with hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The apparatus also has a temperature sensor and a source chemical level sensor extending through a centrally located portion of the top wall member and generally vertically downwardly to a sump cavity centrally located on a bottom wall member. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.
摘要:
This invention relates to organometallic compounds represented by the formula (L1)xM(L2)y wherein M is a metal or metalloid, L1 and L2 are different and are each a hydrocarbon group or a heteroatom-containing group; x is a value of at least 1; y is a value of at least 1; x+y is equal to the oxidation state of M; and wherein (i) L1 has a steric bulk sufficiently large such that, due to steric hinderance, x cannot be a value equal to the oxidation state of M, (ii) L2 has a steric bulk sufficiently small such that, due to lack of steric hinderance, y can be a value equal to the oxidation state of M only in the event that x is not a value of at least 1, and (iii) L1 and L2 have a steric bulk sufficient to maintain a heteroleptic structure in which x+y is equal to the oxidation state of M; a process for producing the organometallic compounds, and a method for producing a film or coating from organometallic precursor compounds.
摘要:
This invention relates to a liquid phase reagent dispensing apparatus having a diptube and alsoa metal seal aligned and in contact with hardened opposing flat surfaces of top wall member and a protuberance[ [;] ]on a side wall member, wherein said hardened opposing flat surfaces of said top wall member and said protuberance have a hardness greater than the hardness of said metal seal.The apparatus further has a temperature sensor and a source chemical level sensor extending through a centrally located portion of the top wall member and generally vertically downwardly to a cavity centrally located on the a bottom wall member [ [,]] . The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.