公开(公告)号：US20120168689A1

公开(公告)日：2012-07-05

申请号：US13109525

申请日：2011-05-17

申请人： Rong-Zhi CHEN ,  Hung-Shuo CHUNG ,  Chin-Lin HUANG ,  Jye-Long LEE ,  Shu-Hua CHEN ,  Jui-Tung CHANG

发明人： Rong-Zhi CHEN ,  Hung-Shuo CHUNG ,  Chin-Lin HUANG ,  Jye-Long LEE ,  Shu-Hua CHEN ,  Jui-Tung CHANG

IPC分类号： H01B1/22

CPC分类号： H01B1/22

摘要： A lead-free conductive paste composition includes silumin powder, lead-free glass frits, an organic binder, stearic acid zinc, and aluminum powder.

摘要翻译： 无铅导电糊组合物包括硅铝粉，无铅玻璃料，有机粘合剂，硬脂酸锌和铝粉。

公开(公告)号：US20110241253A1

公开(公告)日：2011-10-06

申请号：US12939174

申请日：2010-11-04

申请人： Rong-Zhi CHEN ,  Chun-Hao CHIU ,  Jui-Tung CHANG ,  Deng-Far HSU ,  Chih-Huang LAI

发明人： Rong-Zhi CHEN ,  Chun-Hao CHIU ,  Jui-Tung CHANG ,  Deng-Far HSU ,  Chih-Huang LAI

IPC分类号： B28B3/00 ,  B28B1/00

CPC分类号： C23C14/3414 ,  B22F3/14 ,  C22C1/0433 ,  C22C1/05

摘要： A method for manufacturing a cobalt (Co) alloy-based ceramic composite sputtering target is provided. A cobalt ingot and a chromium (Cr) ingot are melted in vacuum and then nebulized to form a cobalt-chromium (CoCr) alloy powder. Additionally, a ceramic powder and a platinum powder are wetly mixed to form a platinum-ceramic (Pt-ceramic) slurry, in which the ceramic powder is applied onto the platinum powder's surface uniformly. Next, the CoCr alloy powder and the Pt-ceramic slurry are wetly mixed to form a CoCrPt-ceramic slurry. Thereafter, the CoCrPt-ceramic slurry is dried, molded and compressed to form the cobalt alloy-based ceramic composite sputtering target. The resulted cobalt alloy-based ceramic composite sputtering target, which has a fine and dense structure, uniform composition and lower magnetic permeability, is beneficial to a magnetron sputter deposition process, as well as a film sputtering process used in the magnetic recording industry.

摘要翻译： 提供了一种制造钴（Co）合金系陶瓷复合溅射靶的方法。 钴锭和铬（Cr）锭在真空中熔化，然后喷雾形成钴 - 铬（CoCr）合金粉末。 另外，将陶瓷粉末和铂粉末湿式混合以形成铂 - 陶瓷（Pt-陶瓷）浆料，其中将陶瓷粉末均匀地涂覆在铂粉末的表面上。 接着，将CoCr合金粉末和Pt-陶瓷浆料湿混，形成CoCrPt陶瓷浆料。 然后，将CoCrPt陶瓷浆料干燥，成型并压缩，形成钴合金系陶瓷复合溅射靶。 得到的钴合金系陶瓷复合溅射靶具有精细且致密的结构，组成均匀性和较低的磁导率，有利于磁控溅射沉积工艺以及在磁记录工业中使用的薄膜溅射工艺。