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    Method for manufacturing a sputtering target
    2.
    发明授权
    Method for manufacturing a sputtering target 失效
    溅射靶的制造方法

    公开(公告)号：US07754027B2

    公开(公告)日：2010-07-13

    申请号：US11892755

    申请日：2007-08-27

    Applicant: Rong-Zhi Chen ,  Jye-Long Lee ,  In-Ting Hong ,  Jui-Tung Chang ,  Pa-Tsui Sze

    Inventor： Rong-Zhi Chen ,  Jye-Long Lee ,  In-Ting Hong ,  Jui-Tung Chang ,  Pa-Tsui Sze

    IPC: H01F1/01

    CPC classification number: B22D27/06 ,  C21D8/0226 ,  C21D8/0273 ,  C22F1/10 ,  C23C14/3414

    Abstract: A method for manufacturing a sputtering target includes the steps of: providing a highly pure matrix material containing a magnetic metal, and a highly pure precious metal ingot material; cleaning the surfaces of the matrix material and the precious metal ingot; vacuum melting the matrix material and the precious metal ingot to obtain a molten alloy; pouring the molten alloy in a mold having a cooling system while maintaining a surface of the molten alloy at a molten state by arc heating until the pouring is finished, thereby forming the molten alloy into a cast blank; hot working the cast blank; and annealing the cast blank after the hot working.

    Abstract translation: 制造溅射靶的方法包括以下步骤：提供含有磁性金属和高纯贵金属锭材料的高纯度基质材料; 清理基体材料和贵金属锭的表面; 真空熔化基体材料和贵金属锭，得到熔融合金; 将熔融合金倾倒在具有冷却系统的模具中，同时通过电弧加热将熔融合金的表面保持在熔融状态，直到浇注完成，从而将熔融合金形成铸坯; 热工作铸坯; 并在热加工后退火铸坯。

    Reflective alloy film
    3.
    发明申请
    Reflective alloy film 审中-公开
    反光合金膜

    公开(公告)号：US20060093511A1

    公开(公告)日：2006-05-04

    申请号：US10980680

    申请日：2004-11-03

    Applicant: Jhewn-Kuang Chen ,  Huan-Chien Tung ,  Jye-Long Lee

    Inventor： Jhewn-Kuang Chen ,  Huan-Chien Tung ,  Jye-Long Lee

    IPC: C22C5/06

    CPC classification number: C22C5/06 ,  C22C5/08 ,  C23C14/14 ,  G02B5/0808 ,  G11B7/24 ,  G11B7/258 ,  G11B7/259

    Abstract: A reflective alloy film having high strength, high corrosion resistance, and high reflectivity includes 0.01-2.0 at % of at least one strengthening element, 0.01-2.0 at % of at least one anti-corrosive element, 0.01-3.0 at % of at least one reflective element, and a balance amount of silver. The total atomic percentage of the strengthening element, the anti-corrosive element, and the reflective element is less than 5.0. The reflective alloy film is useful as a reflective layer or a semi-reflective layer for various electronic devices, such as flat panel displays and optical storage media.

    Abstract translation: 具有高强度，高耐腐蚀性和高反射率的反射合金膜包括至少一种强化元素的0.01-2.0at％，至少一种抗腐蚀元素的0.01-2.0at％，至少0.01-3.0at％ 一个反射元件和一个平衡量的银。 强化元素，防腐蚀元件和反射元件的总原子百分比小于5.0。 反射型合金膜可用作各种电子器件的反射层或半反射层，例如平板显示器和光学存储介质。

    FILM STRUCTURE AND METHOD FOR MANUFACTURING THE SAME
    5.
    发明申请
    FILM STRUCTURE AND METHOD FOR MANUFACTURING THE SAME 审中-公开
    胶片结构及其制造方法

    公开(公告)号：US20120052288A1

    公开(公告)日：2012-03-01

    申请号：US12962636

    申请日：2010-12-07

    Applicant: Huan-Chien TUNG ,  Jye-Long LEE ,  Chun-Hao CHIU

    Inventor： Huan-Chien TUNG ,  Jye-Long LEE ,  Chun-Hao CHIU

    IPC: B32B5/16 ,  C23C14/14 ,  C23C14/35

    CPC classification number: C23C14/185 ,  C23C14/0015 ,  Y10T428/256

    Abstract: A film structure is described. The film structure includes a substrate and a metal film. The film structure is formed on the substrate by a physical vapor deposition method. A bottom diameter of particles forming the metal film is substantially between 0.05 μm and 2 μm, and a height of the particles of the metal film is substantially between 0.05 μm and 3 μm. The metal film has a brightness, a first chroma and a second chroma in a visible light region, which includes a wavelength range between 380 nm and 770 nm, the brightness is substantially between 65 and 95, the first chroma is substantially between −2.1 and 2.1, and the second chroma is substantially between −2.1 and 2.1

    Abstract translation: 描述膜结构。 膜结构包括基底和金属膜。 通过物理气相沉积法在衬底上形成膜结构。 形成金属膜的颗粒的底部直径基本上在0.05μm和2μm之间，并且金属膜的颗粒的高度基本上在0.05μm和3μm之间。 金属膜在可见光区域具有亮度，第一色度和第二色度，其包括380nm和770nm之间的波长范围，亮度基本上在65和95之间，第一色度基本上在-2.1和 2.1，第二色度基本上在-2.1和2.1之间

    Method for manufacturing a sputtering target
    6.
    发明申请
    Method for manufacturing a sputtering target 失效
    溅射靶的制造方法

    公开(公告)号：US20090056840A1

    公开(公告)日：2009-03-05

    申请号：US11892755

    申请日：2007-08-27

    Applicant: Rong-Zhi Chen ,  Jye-Long Lee ,  In-Ting Hong ,  Jui-Tung Chang ,  Pa-Tsui Sze

    Inventor： Rong-Zhi Chen ,  Jye-Long Lee ,  In-Ting Hong ,  Jui-Tung Chang ,  Pa-Tsui Sze

    IPC: C21D1/26 ,  B22D23/00 ,  B22D7/00

    CPC classification number: B22D27/06 ,  C21D8/0226 ,  C21D8/0273 ,  C22F1/10 ,  C23C14/3414

    Abstract: A method for manufacturing a sputtering target includes the steps of: providing a highly pure matrix material containing a magnetic metal, and a highly pure precious metal ingot material; cleaning the surfaces of the matrix material and the precious metal ingot; vacuum melting the matrix material and the precious metal ingot to obtain a molten alloy; pouring the molten alloy in a mold having a cooling system while maintaining a surface of the molten alloy at a molten state by arc heating until the pouring is finished, thereby forming the molten alloy into a cast blank; hot working the cast blank; and annealing the cast blank after the hot working.

    Abstract translation: 制造溅射靶的方法包括以下步骤：提供含有磁性金属和高纯贵金属锭材料的高纯度基质材料; 清理基体材料和贵金属锭的表面; 真空熔化基体材料和贵金属锭，得到熔融合金; 将熔融合金倾倒在具有冷却系统的模具中，同时通过电弧加热将熔融合金的表面保持在熔融状态，直到浇注完成，从而将熔融合金形成铸坯; 热工作铸坯; 并在热加工后退火铸坯。

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