摘要:
A generator for obtaining radioactive gallium-68 from germanium-68 bound in a resin containing unsubstituted phenolic hydroxyl groups. The germanium-68 is loaded into the resin from an aqueous solution of the germanium-68. A physiologically acceptable solution of gallium-68 having an activity of 0.1 to 50 millicuries per milliliter of gallium-68 solution is obtained. The solution is obtained from the bound germanium-68 which forms gallium-68 in situ by eluting the column with a hydrochloric acid solution to form an acidic solution of gallium-68. The acidic solution of gallium-68 can be neutralized.
摘要:
A physiologically acceptable solution of tantalum-178 having an activity of 0.1 to 200 millicuries per milliliter of tantalum-178 solution is provided. The solution is obtained from tungsten-178 bound to a column of an anion exchange resin which forms tantalum-178 in situ by eluting the column with a hydrochloric acid solution containing hydrogen peroxide to form an acidic solution of tantalum-178. The acidic solution of tantalum-178 then is neutralized.
摘要:
A physiologically acceptable solution of gallium-68 fluorides, having an activity of 0.1 to 50 millicuries per milliliter of solution is provided. The solution is obtained from a generator comprising germanium-68 hexafluoride bound to a column of an anion exchange resin which forms gallium-68 in situ by eluting the column with an acid solution to form a solution containing .sup.68 Ga-fluorides. The solution then is neutralized prior to administration.
摘要:
A composition comprising .sup.82 Sr and an adsorbant selected from the group consisting of tin oxide, hydrated tin oxide, polyantimonic acid, titanium oxide, and ferric oxide.A low .sup.82 Sr breakthrough method of generating .sup.82 Rb from a .sup.82 Sr charged adsorbant comprising eluting wherein said adsorbant is selected from the group consisting of tin oxide, polyantimonic acid, titanium oxide, ferric oxide, and hydrated tin oxide.
摘要:
A dental desensitizing two-phase composition wherein one phase contains physiologically acceptable strontium ion and the second phase contains physiologically acceptable fluoride ion. The two phases are mixed when used.
摘要:
A method for the preparation of a technetium-99m complex having the formula[(L).sub.2.sup.99m Tc(X).sub.2 ].sup..sym.X.sup..crclbar.,which comprises adding technetium-99m to a complex having the formula[(L).sub.2 M(X).sub.2 ].sup..sym. X.sup..crclbar.and heating the mixture in the presence of a source of anion X.sup..crclbar., wherein each L is the same or different lipophilic ligand, each X is the same or different monovalent anionic ligand, and M is a non-toxic trivalent metal ion, is disclosed.
摘要:
Topical agent formulations for the treatment of psoriasis containing epidermal growth factor (EGF) as the active agent. EGF precursors or biological equivalents can be used. The formulation can also contain an anti-inflammatory. The formulation can contain sulfadiazine.
摘要:
A family of propylene amine oxime ligands has the formula 2 ##STR1## wherein preferably R.sup.1 is Cl-C4 alkyl or phenyl and each of R, R.sup.2, R.sup.3 and R.sup.4 is H or Cl-C4 alkyl. The technetium-99m complexes of these ligands are lipophilic neutral complexes useful as diagnostic radiopharmaceuticals and particularly for brain scanning. The ligands show stereoisomerism. The preparation and properties of the dl- and meso-stereoisomers, and of the d- and l-enantiomers, are described. The l-enantiomer and the dl-stereoisomer of the preferred compound (2, R=R.sup.1 =R.sup.2 =CH.sub.3, R.sup.3 =R.sup.4 =H) show good retention in the brain.
摘要:
The present invention provides a low .sup.82 Sr breakthrough eluent and method of generating .sup.82 Rb from .sup.82 Sr from a .sup.82 Sr charged inorganic adsorbant column. Eluting is done with a pharmaceutically acceptable saline and buffer solution, which is preferably isotonic .sup.82 Sr breakthroughs of 10.sup.-8 are obtained at clinically useful elution rates greater than 10 ml per minute. Phosphate and carbonate buffers are preferred. Al.sub.2 O.sub.3 and ZrO.sub.2 are preferred inorganic radiation damage resistant adsorbants.