Abstract:
A method and a device for the sulfonation or the sulfation of organic liquid raw materials with an S03/air mixture and other reaction gases in order to perform rapid, highly exothermic gas-liquid reactions in conventional thin-layer falling-film reactors are disclosed. The introduction of the S03/air mixture occurs through several feed locations, which are located within (along) the reaction tube or reaction tubes or in the annular gap of annular-gap falling-film reactors. High peak temperatures, undesirable byproducts, worsening of the color and local oversulfation or oversulfonation, which leads to side reactions, are largely avoided.
Abstract:
A method and a device for the sulfonation or the sulfation of organic liquid raw materials with an SO3/air mixture and other reaction gases in order to perform rapid, highly exothermic gas-liquid reactions in conventional thin-layer falling-film reactors are disclosed. The introduction of the SO3/air mixture occurs through several feed locations, which are located within (along) the reaction tube or reaction tubes or in the annular gap of annular-gap falling-film reactors. High peak temperatures, undesirable byproducts, worsening of the color and local oversulfation or oversulfonation, which leads to side reactions, are largely avoided.
Abstract:
A process for the preparation of sulfated alkanol oxethylates or alkylphenol oxethylates is described. After completion of the reaction with SO.sub.3, 0.1 to 0.5% by weight, relative to the alkanol oxethylates or alkylphenol oxethylates employed, of at least one of the following compounds: water, ethanol, 1-propanol, 2-propanol or n-heptane are admixed to the reaction mixture and liquid and gas are subsequently separated at a temperature of 20.degree. to 60.degree. C. The liquid is then neutralized with aqueous alkali as customary and leads to ether sulfate/water mixtures with considerably reduced contents of 1,4-dioxane which can either be used without further aftertreatment or with a considerably reduced outlay in terms of aftertreatment as personal hygiene agents and for various other purposes.