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公开(公告)号：US20090246309A1
公开(公告)日：2009-10-01
申请号：US12388653
申请日：2009-02-19
申请人： Ryuta WASHIYA , Takashi Ando , Masahiko Ogino , Noritake Shizawa , Kyoichi Mori , Akihiro Miyauchi
发明人： Ryuta WASHIYA , Takashi Ando , Masahiko Ogino , Noritake Shizawa , Kyoichi Mori , Akihiro Miyauchi
IPC分类号： B29C59/02
CPC分类号： B29C35/0888 , B29C37/0053 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A fine structure imprinting machine is provided which can surely and easily eliminate static electricity in removing a stamper from an imprinting object. The fine structure imprinting machine is adapted to bring the stamper with a fine concavo-convex pattern formed thereon into contact with the imprinting object, thereby to imprint the fine concavo-convex pattern of the stamper onto a surface of the imprinting object. The stamper has a conductive film on at least a pattern formation surface thereof. The stamper is fixed by a conductive holding member, the conductive film is connected to the holding member via the conductor, and the holding member is connected to a ground within the machine.
摘要翻译： 提供了一种精细的结构压印机，其可以确实地和容易地消除从压印对象去除压模的静电。 精细结构压印机适于使压模与形成在其上的精细凹凸图案与压印对象接触，从而将压模的细微凹凸图案压印到压印对象的表面上。 压模至少在其图案形成表面上具有导电膜。 压模由导电保持构件固定，导电膜通过导体连接到保持构件，并且保持构件连接到机器内的地面上。
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2.发明申请公开(公告)号：US20090243126A1
公开(公告)日：2009-10-01
申请号：US12388573
申请日：2009-02-19
申请人： Ryuta Washiya , Takashi Ando , Masahiko Ogino , Akihiro Miyauchi
发明人： Ryuta Washiya , Takashi Ando , Masahiko Ogino , Akihiro Miyauchi
CPC分类号： B29C35/0888 , B29C37/0053 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G11B7/263
摘要： A method of imprinting a microstructure comprising: contacting a stamper comprising a pattern layer with the microstructure of the order of from micrometers to nanometers in one face of the pattern layer and a substrate supporting the pattern layer with an imprinting member having a deformable layer to which the microstructure is imprinted, wherein the pattern layer is supported on a round surface having a prescribed radius of curvature of the substrate, the center of the round surface protruding towards the rear face of the pattern layer; causing the deformable layer on the imprinting member; and separating the stamper from the cured deformable layer.
摘要翻译： 一种压印微结构的方法，包括：将包含图案层的压模与图案层的一个表面中的微米级至数毫米级的微结构接触;以及支撑图案层的基板，其具有可变形层的压印构件， 印刷微结构，其中图案层被支撑在具有规定的基底曲率半径的圆形表面上，圆形表面的中心朝向图案层的背面突出; 使压印构件上的可变形层产生; 以及将所述压模与所述固化的可变形层分离。
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公开(公告)号：US08192637B2
公开(公告)日：2012-06-05
申请号：US12388573
申请日：2009-02-19
申请人： Ryuta Washiya , Takashi Ando , Masahiko Ogino , Akihiro Miyauchi
发明人： Ryuta Washiya , Takashi Ando , Masahiko Ogino , Akihiro Miyauchi
IPC分类号： B44C1/22
CPC分类号： B29C35/0888 , B29C37/0053 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G11B7/263
摘要： A method of imprinting a microstructure comprising: contacting a stamper comprising a pattern layer with the microstructure of the order of from micrometers to nanometers in one face of the pattern layer and a substrate supporting the pattern layer with an imprinting member having a deformable layer to which the microstructure is imprinted, wherein the pattern layer is supported on a round surface having a prescribed radius of curvature of the substrate, the center of the round surface protruding towards the rear face of the pattern layer; causing the deformable layer on the imprinting member; and separating the stamper from the cured deformable layer.
摘要翻译： 一种压印微结构的方法，包括：将包含图案层的压模与图案层的一个表面中的微米级至数毫米级的微结构接触;以及支撑图案层的基板，其具有可变形层的压印构件， 印刷微结构，其中图案层被支撑在具有规定的基底曲率半径的圆形表面上，圆形表面的中心朝向图案层的背面突出; 使压印构件上的可变形层产生; 以及将所述压模与所述固化的可变形层分离。
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公开(公告)号：US20080229948A1
公开(公告)日：2008-09-25
申请号：US12019839
申请日：2008-01-25
申请人： Ryuta Washiya , Takashi Ando , Masahiko Ogino , Hideaki Kataho , Akihiro Miyauchi , Kosuke Kuwabara
发明人： Ryuta Washiya , Takashi Ando , Masahiko Ogino , Hideaki Kataho , Akihiro Miyauchi , Kosuke Kuwabara
IPC分类号： B41F1/40
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint device transfers a micropattern created on a stamper onto a material to be transferred, by bringing the stamper and the material to be transferred into contact with each other. The imprint device has a flow passage for discharging a fluid to a rear surface of the stamper or the material to be transferred, to thereby bend the stamper or the material to be transferred.
摘要翻译： 压印装置通过使压模和被转印材料彼此接触来将形成在压模上的微图案转印到待转印的材料上。 压印装置具有用于将流体排放到压模的后表面或待转印的材料的流动通道，从而弯曲压模或要转印的材料。
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公开(公告)号：US20100189836A1
公开(公告)日：2010-07-29
申请号：US12692135
申请日：2010-01-22
IPC分类号： B29C59/02
CPC分类号： G11B5/82 , B29C43/021 , B29C2043/025 , B29C2043/3411 , B29C2043/3488 , B29C2043/3602 , B29C2043/3634 , B29C2043/5038 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G11B5/743 , G11B7/263
摘要： In a micropattern transfer device, a stamper on which a fine indented pattern is formed is brought into contact with a material to be transferred, and the fine indented pattern on the stamper is transferred onto a surface of the material to be transferred. The micropattern transfer device includes a holding mechanism which holds an entire outer circumferential portion of the material to be transferred. The holding mechanism holds the material to be transferred such that a distance between the material to be transferred and the stamper is substantially equal to or shorter than a distance between the holding mechanism and the stamper.
摘要翻译： 在微图案转印装置中，形成有精细凹凸图案的压模与要转印的材料接触，压模上的精细凹入图案被转印到待转印材料的表面上。 微图案转印装置包括保持待转印材料的外周部分的保持机构。 保持机构保持要被转印的材料，使得被转印材料和压模之间的距离基本上等于或短于保持机构和压模之间的距离。
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公开(公告)号：US08186992B2
公开(公告)日：2012-05-29
申请号：US12692135
申请日：2010-01-22
IPC分类号： B29C59/00
CPC分类号： G11B5/82 , B29C43/021 , B29C2043/025 , B29C2043/3411 , B29C2043/3488 , B29C2043/3602 , B29C2043/3634 , B29C2043/5038 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G11B5/743 , G11B7/263
摘要： In a micropattern transfer device, a stamper on which a fine indented pattern is formed is brought into contact with a material to be transferred, and the fine indented pattern on the stamper is transferred onto a surface of the material to be transferred. The micropattern transfer device includes a holding mechanism which holds an entire outer circumferential portion of the material to be transferred. The holding mechanism holds the material to be transferred such that a distance between the material to be transferred and the stamper is substantially equal to or shorter than a distance between the holding mechanism and the stamper.
摘要翻译： 在微图案转印装置中，形成有精细凹凸图案的压模与要转印的材料接触，压模上的精细凹入图案被转印到待转印材料的表面上。 微图案转印装置包括保持待转印材料的外周部分的保持机构。 保持机构保持要被转印的材料，使得被转印材料和压模之间的距离基本上等于或短于保持机构和压模之间的距离。
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公开(公告)号：US20120029110A1
公开(公告)日：2012-02-02
申请号：US13193658
申请日：2011-07-29
IPC分类号： C08F220/10
CPC分类号： G11B5/855 , C08F2/50 , C08F290/064 , C08F290/067 , C08F220/10 , C08F222/10
摘要： A photopolymerizable resin composition for transferring a microstructure, which allows a thinner and uniform thin film to be formed, a transfer accuracy of extremely smaller microfine pattern to be excellent, and a curing time of the thin film to be shortened, is provided. The photopolymerizable resin composition for transferring a microstructure comprises the following component (A), component (B), component (C), component (D) and component (E) at the rate described below: (A) a 6 to 15-functional acrylate; in 0.5 to 10 mass % (B) an acrylate with a weight-average molecular weight (Mw) of 1000 to 10000; in 0.5 to 10 mass % (C) an acrylate having a benzene ring; in 0.5 to 10 mass % (D) a reactive diluent; in 80 to 98 mass % (E) a photopolymerization initiator; in 0.1 to 5 mass %.
摘要翻译： 提供了用于转印微结构的可光聚合树脂组合物，其允许形成更薄且均匀的薄膜，极小的微细图案的转印精度优异，并且缩短薄膜的固化时间。 用于转移微结构的光聚合性树脂组合物以下述速度包含以下组分（A），组分（B），组分（C），组分（D）和组分（E）：（A）6至15官能 丙烯酸酯; 0.5〜10质量％（B）重均分子量（Mw）为1000〜10000的丙烯酸酯; 为0.5〜10质量％（C）具有苯环的丙烯酸酯; 为0.5〜10质量％（D）反应性稀释剂; 80〜98质量％（E）光聚合引发剂; 为0.1〜5质量％。
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公开(公告)号：US20100255139A1
公开(公告)日：2010-10-07
申请号：US12752808
申请日：2010-04-01
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B29C33/00 , B29C43/021 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/3602 , B29C2043/5808 , B82Y10/00 , B82Y40/00
摘要： A micropattern transfer stamper has a space that hermetically contains fluid, on an opposite side of a surface with an indented pattern formed thereon of a pattern forming sheet member. The pattern forming sheet member is convexly bent by pressure of the fluid contained in the space. When the indented pattern is transferred onto the material to be transferred, the pattern forming sheet member deforms following the surface of the material to be transferred.
摘要翻译： 在图案形成片部件的形成有凹凸图案的表面的相对侧上，微图案转印印模具有气密地含有流体的空间。 图案形成片构件通过包含在空间中的流体的压力而凸起地弯曲。 当凹入图案转印到待转印的材料上时，图案形成片材随着要转印的材料的表面变形。
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公开(公告)号：US20120205838A1
公开(公告)日：2012-08-16
申请号：US13370413
申请日：2012-02-10
IPC分类号： B29C59/16
CPC分类号： G03F7/0002 , B29C33/3878 , B82Y10/00 , B82Y40/00
摘要： A microstructure transferring device is characterized in that the device comprises a stamper made from a first photo-curable resin composition cured with light with a first wavelength, and a light source emitting light with a second wavelength longer than the first wavelength. The microstructure is transferred to an impression receptor supplied with a second photo-curable resin composition, which is curable with light with the second wavelength emitted by the light source.
摘要翻译： 微结构转印装置的特征在于，该装置包括由用第一波长的光固化的第一光固化树脂组合物制成的压模和发射长于第一波长的第二波长的光的光源。 将微结构转移到提供有第二光固化树脂组合物的印模受体中，该第二光固化树脂组合物可用由光源发出的第二波长的光固化。
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公开(公告)号：US08770965B2
公开(公告)日：2014-07-08
申请号：US13370413
申请日：2012-02-10
IPC分类号： B29C35/08
CPC分类号： G03F7/0002 , B29C33/3878 , B82Y10/00 , B82Y40/00
摘要： A microstructure transferring device is characterized in that the device comprises a stamper made from a first photo-curable resin composition cured with light with a first wavelength, and a light source emitting light with a second wavelength longer than the first wavelength. The microstructure is transferred to an impression receptor supplied with a second photo-curable resin composition, which is curable with light with the second wavelength emitted by the light source.
摘要翻译： 微结构转印装置的特征在于，该装置包括由用第一波长的光固化的第一光固化树脂组合物制成的压模和发射长于第一波长的第二波长的光的光源。 将微结构转移到提供有第二光固化树脂组合物的印模受体中，该第二光固化树脂组合物可用由光源发出的第二波长的光固化。
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