公开(公告)号：US08957412B2

公开(公告)日：2015-02-17

申请号：US13988372

申请日：2010-11-29

申请人： Ryuuta Yamada ,  Keiko Kurata ,  Shinya Fujimura ,  Hirofumi Fujita ,  Yoshiaki Tsukamoto ,  Takahiro Komatsu ,  Satoru Ohuchi

发明人： Ryuuta Yamada ,  Keiko Kurata ,  Shinya Fujimura ,  Hirofumi Fujita ,  Yoshiaki Tsukamoto ,  Takahiro Komatsu ,  Satoru Ohuchi

IPC分类号： H01L27/32 ,  H01L51/56 ,  H01L51/50 ,  H01L51/52

CPC分类号： H01L27/32 ,  H01L27/3211 ,  H01L51/5056 ,  H01L51/5088 ,  H01L51/5265 ,  H01L51/56 ,  H01L2251/558 ,  H05B33/22

摘要： An organic EL panel comprises anodes, a cathode, organic light-emitting layers, and first functional layers each including a hole injection layer and a hole transport layer. The hole injection layer of each of the R, G, and B colors is made of only a metal oxide including tungsten oxide, and has a thickness of 5 nm to 40 nm. At least one of the hole injection layers has a thickness different from the other hole injection layers. The hole transport layers of the R, G, and B colors are equivalent in thickness. The organic light-emitting layers of the R, G, and B colors are equivalent in thickness.

摘要翻译： 有机EL面板包括阳极，阴极，有机发光层和各自包括空穴注入层和空穴传输层的第一功能层。 R，G和B颜色中的每一个的空穴注入层仅由包含氧化钨的金属氧化物制成，并且具有5nm至40nm的厚度。 至少一个空穴注入层具有与其它空穴注入层不同的厚度。 R，G和B颜色的空穴传输层的厚度相当。 R，G和B颜色的有机发光层的厚度相当。

公开(公告)号：US20130234129A1

公开(公告)日：2013-09-12

申请号：US13988372

申请日：2010-11-29

申请人： Ryuuta Yamada ,  Keiko Kurata ,  Shinya Fujimura ,  Hirofumi Fujita ,  Yoshiaki Tsukamoto ,  Takahiro Komatsu ,  Satoru Ohuchi

发明人： Ryuuta Yamada ,  Keiko Kurata ,  Shinya Fujimura ,  Hirofumi Fujita ,  Yoshiaki Tsukamoto ,  Takahiro Komatsu ,  Satoru Ohuchi

IPC分类号： H01L27/32 ,  H01L51/56

CPC分类号： H01L27/32 ,  H01L27/3211 ,  H01L51/5056 ,  H01L51/5088 ,  H01L51/5265 ,  H01L51/56 ,  H01L2251/558 ,  H05B33/22

摘要： An organic EL panel comprises anodes, a cathode, organic light-emitting layers, and first functional layers each including a hole injection layer and a hole transport layer. The hole injection layer of each of the R, G, and B colors is made of only a metal oxide including tungsten oxide, and has a thickness of 5 nm to 40 nm. At least one of the hole injection layers has a thickness different from the other hole injection layers. The hole transport layers of the R, G, and B colors are equivalent in thickness. The organic light-emitting layers of the R, G, and B colors are equivalent in thickness.

摘要翻译： 有机EL面板包括阳极，阴极，有机发光层和各自包括空穴注入层和空穴传输层的第一功能层。 R，G和B颜色中的每一个的空穴注入层仅由包含氧化钨的金属氧化物制成，并且具有5nm至40nm的厚度。 至少一个空穴注入层具有与其它空穴注入层不同的厚度。 R，G和B颜色的空穴传输层的厚度相当。 R，G和B颜色的有机发光层的厚度相当。

公开(公告)号：US09065069B2

公开(公告)日：2015-06-23

申请号：US14128867

申请日：2011-07-15

申请人： Ryuuta Yamada ,  Satoru Ohuchi ,  Takahiro Komatsu ,  Shinya Fujimura ,  Hirofumi Fujita

发明人： Ryuuta Yamada ,  Satoru Ohuchi ,  Takahiro Komatsu ,  Shinya Fujimura ,  Hirofumi Fujita

IPC分类号： H01L51/40 ,  H01L51/52 ,  H01L51/50 ,  H05B33/02 ,  H05B33/10 ,  H01L51/56 ,  H01L27/32

CPC分类号： H01L51/5234 ,  H01L27/3244 ,  H01L27/3283 ,  H01L51/5012 ,  H01L51/5088 ,  H01L51/56 ,  H05B33/02 ,  H05B33/10

摘要： Method for manufacturing organic EL element including anode, hole injection layer, buffer layer, light-emitting layer, and cathode, layered on substrate in the stated order, and banks defining a light-emission region, and having excellent light-emission characteristics, due to the hole injection layer having excellent hole injection efficiency, being a tungsten oxide layer including an oxygen vacancy structure, formed under predetermined conditions to have an occupied energy level within a binding energy range from 1.8 eV to 3.6 eV lower than a lowest binding energy of a valence band, and after formation, subjected to atmospheric firing at a temperature within 200° C.-230° C. inclusive for a processing time of 15-45 minutes inclusive to have increased film density and improved dissolution resistance against an etching solution, a cleaning liquid, etc., used in a bank forming process.

摘要翻译： 制造具有阳极，空穴注入层，缓冲层，发光层和阴极的有机EL元件的方法，按照所述顺序层叠在基板上，以及限定发光区域的堤，并且具有优异的发光特性 涉及具有优异的空穴注入效率的空穴注入层，其是在预定条件下形成的包含氧空位结构的氧化钨层，以使得占据能级在1.8eV至3.6eV以下的结合能范围内，低于最低结合能 价带，并且在形成之后，在200℃-230℃的温度范围内进行大气烧制，处理时间为15-45分钟，包括提高膜密度和改善对蚀刻溶液的耐溶解性， 清洗液等，用于银行形成过程。

公开(公告)号：US20140145172A1

公开(公告)日：2014-05-29

申请号：US14128727

申请日：2011-07-15

申请人： Ryuuta Yamada ,  Satoru Ohuchi ,  Takahiro Komatsu ,  Shinya Fujimura ,  Hirofumi Fujita

发明人： Ryuuta Yamada ,  Satoru Ohuchi ,  Takahiro Komatsu ,  Shinya Fujimura ,  Hirofumi Fujita

IPC分类号： H01L51/50 ,  H01L51/56

CPC分类号： H01L51/5088 ,  H01L51/5215 ,  H01L51/56 ,  H01L2251/303

摘要： An organic EL element including anode, hole injection layer, buffer layer, light-emitting layer, and cathode, layered on substrate in the stated order, and banks defining a light-emission region, and having excellent light-emission characteristics, due to the hole injection layer having excellent hole injection efficiency, being a tungsten oxide layer including an oxygen vacancy structure, formed under predetermined conditions to have an occupied energy level within a binding energy range from 1.8 eV to 3.6 eV lower than a lowest binding energy of a valence band, and after formation, subjected to atmospheric firing at a temperature within 200° C.-230° C. inclusive for a processing time of 15-45 minutes inclusive to have increased film density and improved dissolution resistance against an etching solution, a cleaning liquid, etc., used in a bank forming process.

摘要翻译： 包括阳极，空穴注入层，缓冲层，发光层和阴极的有机EL元件，按照所述顺序层叠在基板上，以及限定发光区域的堤，并且具有优异的发光特性，由于 在预定条件下形成具有优异的空穴注入效率的空穴注入层，所述空穴注入层是包含氧空位结构的氧化钨层，以使其占据能级在1.8eV至3.6eV以下的结合能范围内，低于化合价的最低结合能 并且在形成之后，在200℃-230℃的温度范围内进行大气烧制，其中包括处理时间为15-45分钟，以提高膜密度和改善对蚀刻溶液的耐溶解性，清洗 液体等，用于银行形成过程。

公开(公告)号：US20130328039A1

公开(公告)日：2013-12-12

申请号：US14000977

申请日：2011-11-18

申请人： Satoru Ohuchi ,  Takahiro Komatsu ,  Ryuuta Yamada ,  Hirofumi Fujita ,  Shinya Fujimura ,  Seiji Nishiyama ,  Kenichi Nendai ,  Kou Sugano ,  Shuhei Yada

发明人： Satoru Ohuchi ,  Takahiro Komatsu ,  Ryuuta Yamada ,  Hirofumi Fujita ,  Shinya Fujimura ,  Seiji Nishiyama ,  Kenichi Nendai ,  Kou Sugano ,  Shuhei Yada

IPC分类号： H01L27/32

CPC分类号： H01L27/3297 ,  H01L27/3244 ,  H01L51/5088 ,  H01L51/5212 ,  H01L51/5228

摘要： A hole injection layer and a second electrode are both formed to be continuous above a first electrode and above an auxiliary wiring. The hole injection layer contains a tungsten oxide. An UPS spectrum, obtained from a UPS measurement, has a protrusion appearing near a Fermi surface and within a region corresponding to a binding energy range lower than a top of a valence band, and the tungsten oxide satisfies a condition, determined from an XPS measurement, that a ratio in a number density of atoms other than tungsten atoms and oxygen atoms to the tungsten atoms does not exceed 0.83.

摘要翻译： 空穴注入层和第二电极均形成为在第一电极上方并且在辅助布线上方连续。 空穴注入层含有氧化钨。 从UPS测量获得的UPS光谱在费米面附近出现突起，并且在与低于价带顶部的结合能量范围相对应的区域内，氧化钨满足从XPS测量值确定的条件 钨原子和氧原子之间的原子数与钨原子的密度比不超过0.83。

公开(公告)号：US20130285042A1

公开(公告)日：2013-10-31

申请号：US13995205

申请日：2012-01-18

申请人： Takahiro Komatsu ,  Satoru Ohuchi ,  Ryuuta Yamada ,  Hirofumi Fujita ,  Shinya Fujimura ,  Seiji Nishiyama ,  Kenichi Nendai ,  Kou Sugano ,  Shuhei Yada

发明人： Takahiro Komatsu ,  Satoru Ohuchi ,  Ryuuta Yamada ,  Hirofumi Fujita ,  Shinya Fujimura ,  Seiji Nishiyama ,  Kenichi Nendai ,  Kou Sugano ,  Shuhei Yada

IPC分类号： H01L51/52 ,  H01L51/56

CPC分类号： H01L51/5203 ,  H01L27/3279 ,  H01L27/329 ,  H01L51/5088 ,  H01L51/56

摘要： The present invention provides an organic EL display panel and an organic EL display apparatus that can be driven at a low voltage and that exhibit excellent light-emitting efficiency. Sequentially fixated on a substrate are: a first electrode; auxiliary wiring; a hole injection layer; a functional layer; and a second electrode. The hole injection layer and the second electrode are both formed to be continuous above the first electrode and above the auxiliary wiring. The second electrode and the auxiliary wiring are electrically connected by the hole injection layer. The hole injection layer contains tungsten oxide and at least 2 nm thick so as to have, in an electronic state thereof, an occupied energy level in a range between 1.8 eV and 3.6 eV lower than a lowest energy level of a valence band in terms of a binding energy.

摘要翻译： 本发明提供一种有机EL显示面板和能够以低电压驱动并且表现出优异的发光效率的有机EL显示装置。 顺序地固定在基底上的是：第一电极; 辅助接线; 空穴注入层; 功能层; 和第二电极。 空穴注入层和第二电极都形成为在第一电极上方和辅助布线上方连续。 第二电极和辅助布线通过空穴注入层电连接。 空穴注入层包含氧化钨并且至少2nm厚，以使其在电子状态下的占空能级在1.8eV至3.6eV之间的范围内，低于价带的最低能级 结合能量。

公开(公告)号：US08884281B2

公开(公告)日：2014-11-11

申请号：US13994164

申请日：2011-01-21

申请人： Satoru Ohuchi ,  Ryuuta Yamada ,  Takahiro Komatsu ,  Shinya Fujimura ,  Hirofumi Fujita ,  Kenichi Nendai ,  Kou Sugano ,  Shuhei Yada

发明人： Satoru Ohuchi ,  Ryuuta Yamada ,  Takahiro Komatsu ,  Shinya Fujimura ,  Hirofumi Fujita ,  Kenichi Nendai ,  Kou Sugano ,  Shuhei Yada

IPC分类号： H01L29/08 ,  H01L51/52 ,  H01L51/50 ,  H01L51/56

CPC分类号： H01L51/52 ,  H01L51/5088 ,  H01L51/56 ,  H01L2251/55

摘要： Provided is an organic EL element which withstands mass production of organic EL display panels, and promises driving at a low voltage and high luminous efficiency due to excellent hole-injection efficiency. Specifically, an organic EL element is formed by sequentially laminating an anode, a hole injection layer, a buffer layer, a light-emitting layer, and a cathode on one surface of a substrate. The hole injection layer is a at least 2 nm thick tungsten oxide layer formed under predetermined film forming conditions, and includes an occupied energy level that is 1.8 eV to 3.6 eV lower than a lowest energy level of a valence band of the hole injection layer in terms of a binding energy. This reduces the hole injection barrier between the anode and the hole injection layer and the hole injection barrier between the hole injection layer and the buffer layer.

摘要翻译： 提供一种有机EL元件，其可承受大量生产有机EL显示面板，并且由于优异的空穴注入效率而承诺以低电压和高发光效率驱动。 具体地，通过在基板的一个表面上依次层叠阳极，空穴注入层，缓冲层，发光层和阴极来形成有机EL元件。 空穴注入层是在预定的成膜条件下形成的至少2nm厚的氧化钨层，并且包括比空穴注入层的价带的最低能级低1.8eV至3.6eV的占据能级， 具有约束力的术语。 这样可以减少阳极和空穴注入层之间的空穴注入势垒以及空穴注入层与缓冲层之间的空穴注入势垒。

公开(公告)号：US08829510B2

公开(公告)日：2014-09-09

申请号：US13995205

申请日：2012-01-18

申请人： Takahiro Komatsu ,  Satoru Ohuchi ,  Ryuuta Yamada ,  Hirofumi Fujita ,  Shinya Fujimura ,  Seiji Nishiyama ,  Kenichi Nendai ,  Kou Sugano ,  Shuhei Yada

发明人： Takahiro Komatsu ,  Satoru Ohuchi ,  Ryuuta Yamada ,  Hirofumi Fujita ,  Shinya Fujimura ,  Seiji Nishiyama ,  Kenichi Nendai ,  Kou Sugano ,  Shuhei Yada

IPC分类号： H01L29/08 ,  H01L51/56 ,  H01L51/50 ,  H01L27/32 ,  H01L51/52

CPC分类号： H01L51/5203 ,  H01L27/3279 ,  H01L27/329 ,  H01L51/5088 ,  H01L51/56

摘要： The present invention provides an organic EL display panel and an organic EL display apparatus that can be driven at a low voltage and that exhibit excellent light-emitting efficiency. Sequentially fixated on a substrate are: a first electrode; auxiliary wiring; a hole injection layer; a functional layer; and a second electrode. The hole injection layer and the second electrode are both formed to be continuous above the first electrode and above the auxiliary wiring. The second electrode and the auxiliary wiring are electrically connected by the hole injection layer. The hole injection layer contains tungsten oxide and at least 2 nm thick so as to have, in an electronic state thereof, an occupied energy level in a range between 1.8 eV and 3.6 eV lower than a lowest energy level of a valence band in terms of a binding energy.

摘要翻译： 本发明提供一种有机EL显示面板和能够以低电压驱动并且表现出优异的发光效率的有机EL显示装置。 顺序地固定在基底上的是：第一电极; 辅助接线; 空穴注入层; 功能层; 和第二电极。 空穴注入层和第二电极都形成为在第一电极上方和辅助布线上方连续。 第二电极和辅助布线通过空穴注入层电连接。 空穴注入层包含氧化钨并且至少2nm厚，以使其在电子状态下的占空能级在1.8eV至3.6eV之间的范围内，低于价带的最低能级，就 结合能量。

公开(公告)号：US20140147952A1

公开(公告)日：2014-05-29

申请号：US14128867

申请日：2011-07-15

申请人： Ryuuta Yamada ,  Satoru Ohuchi ,  Takahiro Komatsu ,  Shinya Fujimura ,  Hirofumi Fujita

发明人： Ryuuta Yamada ,  Satoru Ohuchi ,  Takahiro Komatsu ,  Shinya Fujimura ,  Hirofumi Fujita

IPC分类号： H01L51/52 ,  H01L51/56 ,  H01L51/50

CPC分类号： H01L51/5234 ,  H01L27/3244 ,  H01L27/3283 ,  H01L51/5012 ,  H01L51/5088 ,  H01L51/56 ,  H05B33/02 ,  H05B33/10

摘要： Method for manufacturing organic EL element including anode, hole injection layer, buffer layer, light-emitting layer, and cathode, layered on substrate in the stated order, and banks defining a light-emission region, and having excellent light-emission characteristics, due to the hole injection layer having excellent hole injection efficiency, being a tungsten oxide layer including an oxygen vacancy structure, formed under predetermined conditions to have an occupied energy level within a binding energy range from 1.8 eV to 3.6 eV lower than a lowest binding energy of a valence band, and after formation, subjected to atmospheric firing at a temperature within 200° C.-230° C. inclusive for a processing time of 15-45 minutes inclusive to have increased film density and improved dissolution resistance against an etching solution, a cleaning liquid, etc., used in a bank forming process.

公开(公告)号：US09324964B2

公开(公告)日：2016-04-26

申请号：US14128727

申请日：2011-07-15

申请人： Ryuuta Yamada ,  Satoru Ohuchi ,  Takahiro Komatsu ,  Shinya Fujimura ,  Hirofumi Fujita

发明人： Ryuuta Yamada ,  Satoru Ohuchi ,  Takahiro Komatsu ,  Shinya Fujimura ,  Hirofumi Fujita

IPC分类号： H01L51/50 ,  H01L51/52 ,  H01L51/56

CPC分类号： H01L51/5088 ,  H01L51/5215 ,  H01L51/56 ,  H01L2251/303

摘要： An organic EL element including anode, hole injection layer, buffer layer, light-emitting layer, and cathode, layered on substrate in the stated order, and banks defining a light-emission region, and having excellent light-emission characteristics, due to the hole injection layer having excellent hole injection efficiency, being a tungsten oxide layer including an oxygen vacancy structure, formed under predetermined conditions to have an occupied energy level within a binding energy range from 1.8 eV to 3.6 eV lower than a lowest binding energy of a valence band, and after formation, subjected to atmospheric firing at a temperature within 200 ° C. -230 ° C. inclusive for a processing time of 15-45 minutes inclusive to have increased film density and improved dissolution resistance against an etching solution, a cleaning liquid, etc., used in a bank forming process.

摘要翻译： 包括阳极，空穴注入层，缓冲层，发光层和阴极的有机EL元件，按照所述顺序层叠在基板上，以及限定发光区域的堤，并且具有优异的发光特性，由于 在预定条件下形成具有优异的空穴注入效率的空穴注入层，所述空穴注入层是包含氧空位结构的氧化钨层，以使其占据能级在1.8eV至3.6eV以下的结合能范围内，低于化合价的最低结合能 并且在形成之后，在200℃-230℃的温度范围内进行大气烧制，包括处理时间为15-45分钟，以提高膜密度和改善对蚀刻溶液的溶解性，清洗 液体等，用于银行形成过程。