公开(公告)号：US20150212411A1

公开(公告)日：2015-07-30

申请号：US14522771

申请日：2014-10-24

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Sung-Kyun PARK ,  Jeong-Min PARK ,  Jung-Soo LEE ,  Ji-Hyun KIM ,  Jun CHUN ,  Ki-Hyun CHO ,  Hyoc-Min YOUN ,  Tai-Hoon YEO ,  Jin-Sun KIM ,  Byung-Uk KIM

IPC: G03F7/038 ,  G03F7/30 ,  H01L21/027

CPC classification number: G03F7/038 ,  G03F7/027 ,  G03F7/028 ,  G03F7/031 ,  G03F7/033 ,  G03F7/0755 ,  G03F7/30 ,  H01L21/02112 ,  H01L21/02118 ,  H01L21/311 ,  H01L27/1288

Abstract: A photoresist composition a photoresist composition includes about 0.1 to about 30 parts by weight of a photo-initiator, about 1 to 50 parts by weight of a first acrylate monomer including at least five functional groups, about 1 to 50 parts by weight of a second acrylate monomer including at most four functional groups with respect to about 100 parts by weight of an acryl-copolymer.

Abstract translation: 光致抗蚀剂组合物包含约0.1至约30重量份的光引发剂，约1至50重量份的包含至少五个官能团的第一丙烯酸酯单体，约1至50重量份的第二 丙烯酸酯单体，相对于约100重量份的丙烯酸共聚物包括至多四个官能团。

公开(公告)号：US20150205204A1

公开(公告)日：2015-07-23

申请号：US14573624

申请日：2014-12-17

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jun CHUN ,  Jeong-Min PARK ,  Sung-Kyun PARK ,  Ji-Hyun KIM ,  Jin-Ho JU ,  Hyoc-Min YOUN ,  Dong-Myung KIM ,  Jin-Sun KIM ,  Tai-Hoon YEO ,  Byung-Uk KIM

IPC: G03F7/038 ,  G03F7/30

CPC classification number: G03F7/0388 ,  C08F212/34 ,  C08F220/10 ,  C08F220/16 ,  C08F220/18 ,  C08F220/26 ,  G02F2001/13625 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0751 ,  G03F7/30 ,  H01L21/0274 ,  H01L21/31138 ,  H01L51/102

Abstract: A photoresist composition includes an acid-labile polymer that is decomposable by reaction with an acid, a photoacid generator, an organic base having a pKa value of 9 or less and a solvent. Based on 100 parts by weight of the acid-labile polymer, the photoacid generator is about 1 to about 30 parts by weight, and the organic base is about 0.1 to about 5 parts by weight. The solvent is about 50 to about 90 wt % based on the total weight of the composition.

Abstract translation: 光致抗蚀剂组合物包括通过与酸反应可分解的酸不稳定聚合物，光酸产生剂，pKa值为9以下的有机碱和溶剂。 基于100重量份的酸不稳定聚合物，光酸产生剂为约1至约30重量份，有机碱为约0.1至约5重量份。 基于组合物的总重量，溶剂为约50至约90重量％。