公开(公告)号：US20190019819A1

公开(公告)日：2019-01-17

申请号：US16135003

申请日：2018-09-19

申请人： Samsung Display Co., Ltd.

发明人： Seung-Bo SHIM ,  Jun-Gi KIM ,  Yong-Jun PARK ,  Yang-Ho JUNG ,  Jin-Ho JU

IPC分类号： H01L27/12 ,  G03F1/22 ,  G03F1/38

CPC分类号： H01L27/1288 ,  G03F1/22 ,  G03F1/38 ,  H01L27/124

摘要： An exposure mask includes a first transmission portion, a second transmission portion, and a blocking portion. The first transmission portion is configured to, when illuminated with light, transmit the light at a first energy level. The first transmission portion is disposed in association with formation of a first contact hole in an underlying layer. The second transmission portion is configured to, when illuminated with the light, transmit the light at a second energy level. The second transmission portion is disposed in association with formation of a second contact hole in the underlying layer. The blocking portion is configured to block the light, and is disposed in association with a boundary region between a first region and a second region of the underlying layer. The second transmission portion is further configured to enable the second contact hole to be formed deeper into the underlying layer than the first contact hole.

公开(公告)号：US20130316270A1

公开(公告)日：2013-11-28

申请号：US13835567

申请日：2013-03-15

申请人： SAMSUNG DISPLAY CO., LTD.

发明人： Bong-Yeon KIM ,  Min KANG ,  Seung-Bo SHIM ,  Jong-kwang LEE ,  Jin-Ho JU ,  Jeong-Won KIM ,  Tae-Gyun KIM ,  Chul-Won PARK ,  Jun-Hyuk WOO ,  Hyun-Joo LEE

IPC分类号： G03F1/42

CPC分类号： G03F1/42

摘要： A mask may include a circuit area and a pixel area. The circuit area includes a circuit pattern. The pixel area includes a pixel pattern which is extended in a length direction and an assist pattern which is at an end portion of the pixel pattern and adjacent to the circuit area.

摘要翻译： 掩模可以包括电路区域和像素区域。 电路区域包括电路图案。 像素区域包括在长度方向上延伸的像素图案和处于像素图案的端部并且与电路区域相邻的辅助图案。

公开(公告)号：US20150241774A1

公开(公告)日：2015-08-27

申请号：US14525684

申请日：2014-10-28

申请人： SAMSUNG DISPLAY CO., LTD.

发明人： Jeong-Won KIM ,  Jin-Ho JU ,  Dong-Min KIM ,  Seung-Ki KIM ,  Kwang-Woo PARK ,  Sun-Mi HAHM

IPC分类号： G03F7/038 ,  H01L29/66 ,  H01L27/12 ,  H01L21/467

CPC分类号： H01L27/127 ,  G03F7/0236 ,  H01L27/1225 ,  H01L27/1288 ,  H01L29/66969 ,  H01L29/7869

摘要： A photoresist composition may include a novolak resin, a diazide-based photo-sensitizer, and a solvent. The novolak resin may be prepared by a condensation reaction of a monomer mixture including a cresol mixture, xylenol, and salicylaldehyde. Methods of manufacturing a display substrate using the photoresist composition are also provided.

摘要翻译： 光致抗蚀剂组合物可以包括酚醛清漆树脂，二叠氮基光敏剂和溶剂。 酚醛清漆树脂可以通过包括甲酚混合物，二甲苯酚和水杨醛的单体混合物的缩合反应来制备。 还提供了使用光致抗蚀剂组合物制造显示基板的方法。

公开(公告)号：US20160154297A1

公开(公告)日：2016-06-02

申请号：US15018771

申请日：2016-02-08

申请人： Samsung Display Co., Ltd.

发明人： Seung-Bo SHIM ,  Dong-Hyun YU ,  Jin-Ho JU

IPC分类号： G03F1/50

CPC分类号： G03F1/50 ,  G03F1/00 ,  H01L21/0274 ,  H01L21/31144 ,  H01L21/32 ,  H01L27/1214 ,  H01L27/124 ,  H01L27/1248 ,  H01L27/1259 ,  H01L29/66757 ,  H01L51/0541 ,  H01L51/0545

摘要： A display device includes a substrate including a first region and a second region, a gate line and a data line on the substrate, a thin film transistor on the substrate, being connected to the gate line and the data line, and a pixel electrode connected to the thin film transistor, wherein the second region has a second contact hole of which an area is larger than that of a first contact hole of the first region.

公开(公告)号：US20150155161A1

公开(公告)日：2015-06-04

申请号：US14295463

申请日：2014-06-04

申请人： SAMSUNG DISPLAY CO., LTD.

发明人： Jun CHUN ,  Ji-Hyun KIM ,  Sung-Kyun PARK ,  Jeong-Min PARK ,  Jung-Soo LEE ,  Jin-Ho JU

IPC分类号： H01L21/027 ,  G03F7/039

CPC分类号： G03F7/0392 ,  C08G77/14 ,  C08G77/26 ,  C09D183/06 ,  C09D183/08 ,  G03F7/0752 ,  G03F7/11 ,  H01L21/32139

摘要： A method of manufacturing a pattern includes forming a pattern material layer on a substrate, forming a protective layer on the pattern material layer, forming a resist layer on the protective layer, selectively exposing the resist layer to light, and developing the selectively exposed resist layer.

摘要翻译： 制造图案的方法包括在基板上形成图案材料层，在图案材料层上形成保护层，在保护层上形成抗蚀剂层，选择性地使抗蚀剂层曝光，并使选择性曝光的抗蚀剂层显影 。

公开(公告)号：US20150126005A1

公开(公告)日：2015-05-07

申请号：US14531758

申请日：2014-11-03

申请人： SAMSUNG DISPLAY CO., LTD.

发明人： Jeong-Won KIM ,  Ki-Hyun CHO ,  Kwang-Woo PARK ,  Chul-Won PARK ,  Jin-Ho JU ,  Dong-Min KIM ,  Eun JEAGAL

IPC分类号： H01L21/027 ,  H01L21/3213 ,  H01L27/12 ,  G03F7/038 ,  G03F7/075

CPC分类号： G03F7/0752 ,  G03F7/0048 ,  G03F7/022 ,  G03F7/0233 ,  G03F7/0236 ,  G03F7/039 ,  G03F7/0757 ,  G03F7/30 ,  G03F7/36 ,  G03F7/42 ,  H01L21/0271 ,  H01L21/0274 ,  H01L21/32133 ,  H01L21/32139 ,  H01L27/1288

摘要： A photoresist composition may include a novolac resin, a diazide-based photosensitive compound, a surfactant represented by Chemical Formula 1 below, and a solvent. R1 and R2 may denote a hydrogen atom or an alkyl group, x may be 10-50, and y may be 10-50.

摘要翻译： 光致抗蚀剂组合物可以包括酚醛清漆树脂，二叠氮基感光性化合物，下述化学式1表示的表面活性剂和溶剂。 R1和R2可以表示氢原子或烷基，x可以是10-50，y可以是10-50。

公开(公告)号：US20130335664A1

公开(公告)日：2013-12-19

申请号：US13733289

申请日：2013-01-03

申请人： SAMSUNG DISPLAY CO., LTD.

发明人： Seung-Bo SHIM ,  Yang-Ho JUNG ,  Jin-Ho JU ,  Da-Woon KIM ,  Jun-Gi KIM

IPC分类号： G02F1/1339

CPC分类号： G02F1/1339 ,  G02F1/133377 ,  G02F1/1341

摘要： A display panel includes a substrate, a thin film transistor on the substrate, a first electrode electrically connected to the thin film transistor, a first insulation layer covering the first electrode, an image displaying layer disposed on the first insulation layer, a second insulation layer disposed on the image displaying layer, a second electrode disposed on the second insulation layer and insulated from the first electrode, and a protecting layer disposed on the second electrode. The protecting layer surrounds a portion of an upper surface and a side surface of the image displaying layer. The protecting layer includes a light curable material.

摘要翻译： 显示面板包括基板，基板上的薄膜晶体管，与薄膜晶体管电连接的第一电极，覆盖第一电极的第一绝缘层，设置在第一绝缘层上的图像显示层，第二绝缘层 设置在图像显示层上的第二电极，设置在第二绝缘层上并与第一电极绝缘的第二电极以及设置在第二电极上的保护层。 保护层围绕图像显示层的上表面和侧表面的一部分。 保护层包括可光固化材料。

公开(公告)号：US20200127022A1

公开(公告)日：2020-04-23

申请号：US16720177

申请日：2019-12-19

申请人： Samsung Display Co., Ltd.

发明人： Seung-Bo SHIM ,  Jun-Gi KIM ,  Yong-Jun PARK ,  Yang-Ho JUNG ,  Jin-Ho JU

IPC分类号： H01L27/12 ,  G03F1/22 ,  G03F1/38

摘要： An exposure mask includes a first transmission portion, a second transmission portion, and a blocking portion. The first transmission portion is configured to, when illuminated with light, transmit the light at a first energy level. The first transmission portion is disposed in association with formation of a first contact hole in an underlying layer. The second transmission portion is configured to, when illuminated with the light, transmit the light at a second energy level. The second transmission portion is disposed in association with formation of a second contact hole in the underlying layer. The blocking portion is configured to block the light, and is disposed in association with a boundary region between a first region and a second region of the underlying layer. The second transmission portion is further configured to enable the second contact hole to be formed deeper into the underlying layer than the first contact hole.

公开(公告)号：US20150241622A1

公开(公告)日：2015-08-27

申请号：US14488445

申请日：2014-09-17

申请人： SAMSUNG DISPLAY CO., LTD.

发明人： Yang-Ho JUNG ,  Hoon KANG ,  Chul-Won PARK ,  Jin-Ho JU

IPC分类号： F21V8/00 ,  G02B5/30 ,  G02B3/00 ,  G02B5/04

CPC分类号： G02B6/0056 ,  G02B3/0037 ,  G02B5/045 ,  G02B5/3058 ,  G02B6/0053 ,  G02B6/0065 ,  G02F1/133528 ,  G02F2001/133548 ,  G02F2001/133565

摘要： A complex substrate for a display apparatus, the complex substrate includes a lower base substrate including convex and concave patterns, the convex and concave patterns being integral with an upper side of the lower base substrate, a planarizing layer on the lower base substrate, the planarizing layer being integral with the convex and concave patterns, and the planarizing layer having different refractivity from the lower base substrate, and a wire grid pattern on the planarizing layer, the wire grid pattern including a plurality of nano wire metal patterns, each of the nano wire metal patterns having a width of no more than a micrometer.

摘要翻译： 一种显示装置用复合基板，所述复合基板包括下基板，所述下基板包括凸凹图案，所述凸凹图案与所述下基板的上侧一体，所述下基板上的平坦化层， 层与凸形图案和凹形图案成一体，并且具有与下基底基板不同的折射率的平坦化层，以及平面化层上的线栅图案，线栅图案包括多个纳米线金属图案，每个纳米线 具有不超过千分尺的宽度的金属丝图案。

公开(公告)号：US20130210202A1

公开(公告)日：2013-08-15

申请号：US13677172

申请日：2012-11-14

申请人： Samsung Display Co., LTD.

发明人： Hyang-Shik KONG ,  Seung-Bo SHIM ,  Jin-Ho JU ,  Jun-Gi KIM

IPC分类号： H01L29/786 ,  H01L21/02

CPC分类号： H01L29/786 ,  H01L21/02697 ,  H01L21/0274 ,  H01L21/32115 ,  H01L29/66765 ,  H01L29/78603 ,  H01L29/7869

摘要： A method of planarizing a substrate includes forming a conductive pattern on a first surface of a base substrate, forming a positive photoresist layer on the base substrate and the conductive pattern, exposing the positive photoresist layer to light by irradiating a second surface of the base substrate opposite to the first surface with light, developing the positive photoresist layer to form a protruded portion on the conductive pattern, forming a planarizing layer on the base substrate and the protruded portion and eliminating the protruded portion.

摘要翻译： 平面化基板的方法包括在基底基板的第一表面上形成导电图案，在基底基板和导电图案上形成正性光致抗蚀剂层，通过照射基底基板的第二表面将正性光致抗蚀剂层曝光 在第一表面与光相对的位置，显影正性光致抗蚀剂层以在导电图案上形成突出部分，在基底基板和突出部分上形成平坦化层，并且消除突出部分。