DIODE DEVICE AND METHOD OF MANUFACTURING THE SAME
    1.
    发明申请
    DIODE DEVICE AND METHOD OF MANUFACTURING THE SAME 审中-公开
    二极管器件及其制造方法

    公开(公告)号:US20150179825A1

    公开(公告)日:2015-06-25

    申请号:US14332958

    申请日:2014-07-16

    CPC classification number: H01L29/36 H01L29/402 H01L29/66136 H01L29/8611

    Abstract: A diode device may include a first conductivity type first semiconductor region, a second conductivity type second semiconductor region partially formed inside an upper portion of the first semiconductor region, and second conductivity type third semiconductor regions partially formed inside the upper portion of the first semiconductor region, formed on sides of the second semiconductor region, and having an impurity concentration higher than that of the second semiconductor region.

    Abstract translation: 二极管器件可以包括第一导电类型的第一半导体区域,部分地形成在第一半导体区域的上部内的第二导电类型的第二半导体区域,以及部分地形成在第一半导体区域的上部内的第二导电类型的第三半导体区域 形成在第二半导体区域的侧面上,其杂质浓度高于第二半导体区域的杂质浓度。

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