公开(公告)号：US20170293219A1

公开(公告)日：2017-10-12

申请号：US15442780

申请日：2017-02-27

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： DONG-KIL YUN ,  SUNGHOON KIM ,  JAE-EUN LEE ,  HYANGJA YANG

IPC: G03F1/36 ,  G06F17/50

CPC classification number: G03F1/36 ,  G06F17/5081

Abstract: A method for verifying mask data in a computing device includes receiving layout data, receiving mask data, determining an interaction number between a pattern corresponding to the layout data and a pattern corresponding to the mask data, and detecting an error of the mask data based on the interaction number.