Abstract:
A method for fabricating a semiconductor device includes forming a first mask pattern on a first film to extend in a first direction, forming a first spacer on either side wall of the first mask pattern, forming a second film to cover the first spacer and the first film, and forming a second mask pattern on the second film. The second mask pattern extends in a second direction different from the first direction. The method further includes forming a second spacer on either side wall of the second mask pattern, etching the first film using the first spacer and the second spacer as etch masks to form a contact pattern, and removing the first and second spacers to expose the contact pattern.
Abstract:
A portable terminal is provided. The portable terminal includes a display unit that configured to display a search box and to receive one or more types of inputs among a plurality of types of inputs through at least a part of the search box, and a controller configured to determine a predetermined function corresponding to the one or more types of inputs according to the one or more types of inputs among the plurality of types of inputs and to perform the predetermined function.