公开(公告)号：US20140218710A1

公开(公告)日：2014-08-07

申请号：US14249132

申请日：2014-04-09

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jin CHOI ,  Jin-Ha JEONG ,  Urazaev VLADIMIR ,  Hea-Yun LEE

IPC: H01J37/06

CPC classification number: H01J37/06 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/20 ,  G03F1/78 ,  G03F7/2063 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/0458 ,  H01J2237/31764 ,  H01J2237/31776 ,  Y10S430/143

Abstract: A method of forming a reticle includes: loading a blank reticle; projecting an electron beam; moving a second aperture plate having a first pattern aperture and a second pattern aperture so that the first pattern aperture is directly overlapped by a first aperture of a first aperture plate, the electron beam passing through the first pattern aperture after passing the first aperture; exposing the blank reticle with the electron beam after the electron beam passes the first pattern aperture, to form a first exposure pattern; moving the second aperture plate so that the second pattern aperture is directly overlapped by the first aperture of the first aperture plate, the electron beam passing through the second pattern aperture after passing the first aperture; exposing the blank reticle with the electron beam after the electron beam passes the second pattern aperture, to form a second exposure pattern; and developing the blank reticle having the first and second exposure patterns to form the reticle having first and second patterns.

Abstract translation: 形成掩模版的方法包括：加载空白掩模版; 投射电子束; 移动具有第一图案孔和第二图案孔的第二孔板，使得第一图案孔与第一孔板的第一孔直接重叠，该电子束在通过第一孔之后通过第一图案孔; 在电子束通过第一图案孔之后，用电子束曝光空白掩模版，形成第一曝光图案; 移动所述第二孔板，使得所述第二图案孔径与所述第一孔板的所述第一孔直接重叠，所述电子束在通过所述第一孔之后通过所述第二图案孔; 在电子束通过第二图案孔之后，用电子束曝光空白掩模版，形成第二曝光图案; 并且显影具有第一和第二曝光图案的空白掩模版，以形成具有第一和第二图案的掩模版。