公开(公告)号：US20210397076A1

公开(公告)日：2021-12-23

申请号：US17173245

申请日：2021-02-11

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sanghyun KIM ,  Jinho JEON

IPC: G03F1/24 ,  G03F1/58 ,  G03F1/60 ,  H01L21/033

Abstract: A reticle in an apparatus for extreme ultraviolet (EUV) exposure includes a substrate having an image area and a black border area surrounding the image area, a multi-layer structure on the image area and the black border area of the substrate, the multi-layer structure to reflect EUV light, a capping layer covering the multi-layer structure, first absorber layer patterns on the capping layer in the image area and the black border area, and an absorber structure on the capping layer in the black border area, the absorber structure including one of the first absorber layer patterns, a hard mask pattern, and a second absorber layer pattern sequentially stacked, the absorber structure covering an entire upper surface of the capping layer in the black border area.