公开(公告)号：US10297495B2

公开(公告)日：2019-05-21

申请号：US15943080

申请日：2018-04-02

Applicant: Samsung Electronics Co., Ltd.

Inventor： Mong-sup Lee ,  Sang-jun Lee ,  Yoon-ho Son

IPC: H01L27/108 ,  H01L21/768 ,  H01L21/311 ,  H01L21/764 ,  H01L21/66

Abstract: A method of manufacturing a semiconductor device includes forming a first conductive structure on a substrate, forming an insulation layer on a sidewall of the first conductive structure, forming a second conductive structure a distance apart from the first conductive structure with the insulation layer therebetween, first removing a portion of the insulation layer by performing a first dry cleaning operation, second removing a reactant product used in the first dry cleaning operation or a first byproduct generated as a result of the first dry cleaning operation by performing a first purge operation, and third removing at least a portion of the remaining insulation layer by performing a second dry cleaning operation to form an air gap between the first and second conductive structures.

公开(公告)号：US09570316B2

公开(公告)日：2017-02-14

申请号：US14718293

申请日：2015-05-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Mong-sup Lee ,  Sang-jun Lee ,  Yoon-ho Son

IPC: H01L21/311 ,  H01L21/764 ,  H01L21/768 ,  H01L27/108 ,  H01L21/66

CPC classification number: H01L21/7682 ,  H01L21/31111 ,  H01L21/31116 ,  H01L21/764 ,  H01L21/76895 ,  H01L21/76897 ,  H01L22/12 ,  H01L22/20 ,  H01L27/10855 ,  H01L27/10885

Abstract: A method of manufacturing a semiconductor device includes forming a first conductive structure on a substrate, forming an insulation layer on a sidewall of the first conductive structure, forming a second conductive structure a distance apart from the first conductive structure with the insulation layer therebetween, first removing a portion of the insulation layer by performing a first dry cleaning operation, second removing a reactant product used in the first dry cleaning operation or a first byproduct generated as a result of the first dry cleaning operation by performing a first purge operation, and third removing at least a portion of the remaining insulation layer by performing a second dry cleaning operation to form an air gap between the first and second conductive structures.

Abstract translation: 一种制造半导体器件的方法包括在衬底上形成第一导电结构，在第一导电结构的侧壁上形成绝缘层，形成距离第一导电结构一定距离的第二导电结构，其间具有绝缘层，第一导电结构 通过进行第一次干洗操作来除去绝缘层的一部分，第二次除去在第一次干洗操作中使用的反应物产物或通过进行第一次清洗操作而由第一次干洗操作产生的第一副产物，以及第三次 通过执行第二干式清洁操作来移除剩余绝缘层的至少一部分，以在第一和第二导电结构之间形成气隙。

公开(公告)号：US10290537B2

公开(公告)日：2019-05-14

申请号：US15399247

申请日：2017-01-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： Mong-sup Lee ,  Sang-jun Lee ,  Yoon-ho Son

IPC: H01L21/311 ,  H01L21/764 ,  H01L21/768 ,  H01L27/108 ,  H01L21/66

Abstract: A method of manufacturing a semiconductor device includes forming a first conductive structure on a substrate, forming an insulation layer on a sidewall of the first conductive structure, forming a second conductive structure a distance apart from the first conductive structure with the insulation layer therebetween, first removing a portion of the insulation layer by performing a first dry cleaning operation, second removing a reactant product used in the first dry cleaning operation or a first byproduct generated as a result of the first dry cleaning operation by performing a first purge operation, and third removing at least a portion of the remaining insulation layer by performing a second dry cleaning operation to form an air gap between the first and second conductive structures.

公开(公告)号：US09998582B2

公开(公告)日：2018-06-12

申请号：US15019017

申请日：2016-02-09

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sung-woo Park ,  Sang-jun Lee ,  Jee-hoon Ka

IPC: H04B1/38 ,  H04M1/725

CPC classification number: H04M1/72533 ,  H04W4/70

Abstract: A peripheral device management system includes a node terminal apparatus attached to a peripheral device and configured to detect an operating state of the attached peripheral device through a sensor configured to generate sensing data, and a display apparatus configured to receive the sensing data from the node terminal apparatus, to determine the operating state of the peripheral device based on the sensing data, and to display a user interface (UI) containing the operating state of the peripheral device. Accordingly, the peripheral device management system provides an Internet of things (IOT) service to a peripheral device that may not be capable of supporting an IOT service.

公开(公告)号：US09253476B2

公开(公告)日：2016-02-02

申请号：US13915812

申请日：2013-06-12

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Min-cheol Hwang ,  Jee-hoon Ka ,  Jae-sung Park ,  Jun-ho Sung ,  Bong-geun Lee ,  Sang-jun Lee ,  Bong-hwan Cho

IPC: H04N13/04 ,  H04N9/47 ,  H04N17/00

CPC classification number: H04N13/302 ,  H04N13/341 ,  H04N13/398 ,  H04N17/004

Abstract: A display apparatus is provided. The display apparatus includes an image receiver which receives an image, an image processor which divides the received image into a left-eye image and a right-eye image and processes the same, an image output device which alternatingly outputs the left-eye image and the right-eye image, and a controller which calculates a difference in a pixel value between the left-eye and right-eye images based on units relating to the pixels that constitute the left-eye and right-eye images, detects a crosstalk generating area by using the calculated pixel value difference and a preset response speed of a display panel, and controls so that the detected crosstalk generating area is displayed distinguishably from at least one other area.

Abstract translation: 提供一种显示装置。 显示装置包括接收图像的图像接收器，将接收到的图像分割为左眼图像和右眼图像并将其处理的图像处理器，交替地输出左眼图像的图像输出装置和 右眼图像和基于与构成左眼图像和右眼图像的像素相关的单位来计算左眼图像和右眼图像之间的像素值的差异的控制器检测串扰产生 通过使用计算出的像素值差和显示面板的预设响应速度进行控制，并且控制使得检测到的串扰生成区域与至少一个其他区域可区分地显示。