公开(公告)号：US20160194756A1

公开(公告)日：2016-07-07

申请号：US14972598

申请日：2015-12-17

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hongtaek LIM ,  Jeonghoon NAM ,  Chul PARK ,  Youngchae SEO ,  Jaihyung WON ,  Seungmoo LEE ,  Donghoon HAN

IPC: C23C16/455 ,  C23C16/44

CPC classification number: C23C16/45512 ,  C23C16/4412 ,  C23C16/45565 ,  C23C16/45574 ,  C23C16/45591

Abstract: A semiconductor processing apparatus includes a susceptor supporting a processing target, a gas box spaced apart from the susceptor, the gas box including a concave region facing an upper surface of the processing target, and an inclined surface at an outer side of the concave region, an inclination angle of the inclined surface of the gas box relative to an upper surface of the susceptor is more than 10° and less than 35°, and a shower head within the concave region of the gas box.

Abstract translation: 一种半导体处理装置，包括支撑处理对象的基座，与基座间隔开的气箱，包括面对加工对象的上表面的凹部的气体盒和凹部的外侧的倾斜面， 气箱的倾斜面相对于基座的上表面的倾斜角度大于10°且小于35°，以及在气箱的凹入区域内的喷头。