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公开(公告)号：US10186427B2
公开(公告)日：2019-01-22
申请号：US15833184
申请日：2017-12-06
发明人： Kyoung Hwan Kim , Ingi Kim , Mihyun Park , Young-Hoo Kim , Ui-soon Park , Jung-Min Oh , Kuntack Lee , Hyosan Lee
IPC分类号： H01L21/311 , H01L21/67
摘要： A substrate treating apparatus and a method of treating a substrate, the apparatus including a substrate treater that treats a substrate using a chemical solution, the chemical solution including a phosphoric acid aqueous solution and a silicon compound; and a chemical solution supplier that supplies the chemical solution to the substrate treating unit, wherein the chemical solution supplier includes a concentration measurer that measures concentrations of the chemical solutions, the concentration measurer including a first concentration measurer that measures a water concentration of the chemical solution; and a second concentration measurer that measures a silicon concentration of the chemical solution.
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公开(公告)号：US09852921B2
公开(公告)日：2017-12-26
申请号：US15175062
申请日：2016-06-07
发明人： Kyoung Hwan Kim , Ingi Kim , Mihyun Park , Young-Hoo Kim , Ui-soon Park , Jung-Min Oh , Kuntack Lee , Hyosan Lee
IPC分类号： G01N15/06 , G01N33/00 , G01N33/48 , H01L21/311 , H01L21/67
CPC分类号： H01L21/31111 , H01L21/67086 , H01L21/67253 , H01L21/67288
摘要： A substrate treating apparatus and a method of treating a substrate, the apparatus including a substrate treater that treats a substrate using a chemical solution, the chemical solution including a phosphoric acid aqueous solution and a silicon compound; and a chemical solution supplier that supplies the chemical solution to the substrate treating unit, wherein the chemical solution supplier includes a concentration measurer that measures concentrations of the chemical solutions, the concentration measurer including a first concentration measurer that measures a water concentration of the chemical solution; and a second concentration measurer that measures a silicon concentration of the chemical solution.
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