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    SEMICONDUCTOR MEMORY DEVICE
    2.
    发明公开
    SEMICONDUCTOR MEMORY DEVICE 审中-公开

    公开(公告)号：US20240237334A1

    公开(公告)日：2024-07-11

    申请号：US18350323

    申请日：2023-07-11

    申请人： Samsung Electronics Co., Ltd.

    发明人： Kang In Kim ,  Kyoung Hwan Kim ,  Young Woo Son ,  Sang-Bin Ahn ,  Sang Min Lee ,  Young-Seung Cho

    IPC分类号： H10B12/00

    CPC分类号： H10B12/50 ,  H10B12/315

    摘要： A semiconductor memory device with improved performance and reliability is provided. The semiconductor memory device includes a substrate having a cell region and a peripheral region, a cell region isolation layer that separates the cell region from the peripheral region, and a plurality of cell gate structures, each including a cell gate electrode that extends in a first direction. The cell region includes a plurality of active areas that extend in a second direction different from the first direction, and are between a respective cell element isolation layer and the cell region isolation layer. Each of the active areas includes a first portion and a second portion separated by the cell gate structure, the second portion of the active area is on both sides of a respective one of the first portion of the active area. The active areas includes a normal active area and a dummy active area.

    Substrate treating apparatus
    3.
    发明授权
    Substrate treating apparatus 有权

    公开(公告)号：US10186427B2

    公开(公告)日：2019-01-22

    申请号：US15833184

    申请日：2017-12-06

    申请人： SAMSUNG ELECTRONICS CO., LTD.

    发明人： Kyoung Hwan Kim ,  Ingi Kim ,  Mihyun Park ,  Young-Hoo Kim ,  Ui-soon Park ,  Jung-Min Oh ,  Kuntack Lee ,  Hyosan Lee

    IPC分类号： H01L21/311 ,  H01L21/67

    摘要： A substrate treating apparatus and a method of treating a substrate, the apparatus including a substrate treater that treats a substrate using a chemical solution, the chemical solution including a phosphoric acid aqueous solution and a silicon compound; and a chemical solution supplier that supplies the chemical solution to the substrate treating unit, wherein the chemical solution supplier includes a concentration measurer that measures concentrations of the chemical solutions, the concentration measurer including a first concentration measurer that measures a water concentration of the chemical solution; and a second concentration measurer that measures a silicon concentration of the chemical solution.

    Display apparatus
    4.
    发明授权
    Display apparatus 有权

    公开(公告)号：US12069824B2

    公开(公告)日：2024-08-20

    申请号：US17667309

    申请日：2022-02-08

    申请人： SAMSUNG ELECTRONICS CO., LTD.

    发明人： Ki Hun Kim ,  Kyoung Hwan Kim ,  Seong Soo Kim ,  Won Kyu Park ,  Jin Park ,  Kyeong Jae Lee ,  Byeong Kyu Park

    IPC分类号： H05K5/02 ,  G06F1/16

    CPC分类号： H05K5/0221 ,  G06F1/1607 ,  H05K5/0247 ,  G06F2200/1639

    摘要： A display apparatus including display panel, a rear case to cover a rear of the display panel and the rear case including a cable fixing hole to which a cable is fixed, a connector connected to the cable and fastened to the rear case so that the cable is connected to the rear case, a cable holder to surround a part of the cable and fixed to the cable fixing hole so that the cable is fixed to the rear case, and a clamp to fix the cable holder to the cable fixing hole, wherein the clamp includes a first hook to be fixed to the cable fixing hole, and a second hook having a different shape than a shape of the first hook and to be fixed to the cable fixing hole to have a greater fixing force than a fixing force of the first hook.

    Display apparatus
    5.
    发明授权
    Display apparatus 有权

    公开(公告)号：US11073710B2

    公开(公告)日：2021-07-27

    申请号：US16401764

    申请日：2019-05-02

    申请人： SAMSUNG ELECTRONICS CO., LTD.

    发明人： Kyoung Hwan Kim ,  Do Wan Kim ,  Myeong Gil Kim ,  Min Chul Kim ,  Boum Sik Kim ,  Tae Youn Yoon ,  Sang Min Lee ,  Hyun Jun Jung ,  Hye Ryung Hwang

    IPC分类号： G02F1/1333

    摘要： Provided is a display apparatus including a bezel that is improved to prevent electrostatic discharge (ESD). The display apparatus includes a display panel on which an image is to be displayed, a chassis arranged at a rear side of the display panel and including a conductive material, a bezel configured to support the display panel and including a non-conductive material, and an adhesive including a conductive material and coated on an inner side surface of the bezel such that static electricity is guided away from being discharged toward an inside of the display apparatus.

    Apparatus and methods for manufacturing semiconductor devices and treating substrates
    7.
    发明授权
    Apparatus and methods for manufacturing semiconductor devices and treating substrates 有权
    用于制造半导体器件和处理衬底的装置和方法

    公开(公告)号：US09595434B2

    公开(公告)日：2017-03-14

    申请号：US14704912

    申请日：2015-05-05

    申请人： Samsung Electronics Co., Ltd.

    发明人： Kyoungseob Kim ,  Yongsun Ko ,  Kyoung Hwan Kim ,  SeokHoon Kim ,  Kuntack Lee ,  Hyosan Lee

    IPC分类号： H01L21/00 ,  H01L21/02 ,  H01L21/78 ,  H01L21/67

    CPC分类号： H01L21/02068 ,  H01L21/67051 ,  H01L21/78

    摘要： A method of manufacturing a semiconductor device includes: forming a pattern on a surface of a semiconductor substrate; placing the substrate on a platform of a substrate treatment apparatus; rotating the wafer while applying a cleaning liquid from a first nozzle and a wetting liquid from a second nozzle to treat a first region on the surface of the substrate; vertically changing the distance of the second nozzle together with the first nozzle with respect to the platform; after the vertical change, rotating the wafer while applying the cleaning liquid from the first nozzle and the wetting liquid from the second nozzle to treat a second region on the surface of the substrate; and forming a semiconductor device from the treated substrate.

    摘要翻译： 一种制造半导体器件的方法包括：在半导体衬底的表面上形成图案; 将基板放置在基板处理装置的平台上; 在从第一喷嘴施加清洁液体和来自第二喷嘴的润湿液体的同时旋转晶片以处理基板表面上的第一区域; 与第一喷嘴相对于平台垂直地改变第二喷嘴的距离; 在垂直变化之后，在从第一喷嘴施加清洁液体和来自第二喷嘴的润湿液体的同时转动晶片以处理基板表面上的第二区域; 以及从处理过的衬底形成半导体器件。