Semiconductor devices including vertical channel transistors

    公开(公告)号:US10199497B2

    公开(公告)日:2019-02-05

    申请号:US15672767

    申请日:2017-08-09

    Abstract: A semiconductor device includes an active pillar that protrudes above a substrate, the active pillar including a pair of vertical sections and a body interconnection between the pair of vertical sections, and each of the pair of vertical sections having a channel body and a lower impurity region below the channel body, word lines coupled to respective channel bodies, and buried bit lines in contact with respective lower impurity regions, wherein the channel bodies are connected to the substrate through the body interconnection.

    Three-dimensional semiconductor memory devices

    公开(公告)号:US10784311B2

    公开(公告)日:2020-09-22

    申请号:US16503937

    申请日:2019-07-05

    Abstract: A three-dimensional semiconductor memory device includes first to third cell array layers sequentially stacked on a substrate. Each of the first to third cell array layers includes memory cells arranged along first and second directions crossing each other and parallel to a top surface of the substrate. Each of the memory cells includes a variable resistance element and a tunnel field effect transistor connected in series. The device further includes bit lines extending along the first direction between the first and second cell array layers and at least one source line extending along either the first direction or the second direction between the second and third cell array layers. The memory cells of the first and second cell array layers share the bit lines, and the memory cells of the second and third cell array layers share the source line.

    Three-dimensional semiconductor memory devices

    公开(公告)号:US10388699B2

    公开(公告)日:2019-08-20

    申请号:US15586307

    申请日:2017-05-04

    Abstract: A three-dimensional semiconductor memory device includes first to third cell array layers sequentially stacked on a substrate. Each of the first to third cell array layers includes memory cells arranged along first and second directions crossing each other and parallel to a top surface of the substrate. Each of the memory cells includes a variable resistance element and a tunnel field effect transistor connected in series. The device further includes bit lines extending along the first direction between the first and second cell array layers and at least one source line extending along either the first direction or the second direction between the second and third cell array layers. The memory cells of the first and second cell array layers share the bit lines, and the memory cells of the second and third cell array layers share the source line.

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