公开(公告)号：US20220083443A1

公开(公告)日：2022-03-17

申请号：US17535578

申请日：2021-11-25

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Hideji Naohara ,  Tomonori Fujiwara ,  Yumiko Hirato ,  Atsushi Sonoda

IPC: G06F11/32 ,  G06F3/0482 ,  G06K9/62

Abstract: A data processing method includes a step of obtaining scores of time-series data by comparing the time-series data with reference data in order to process time-series data acquired in a substrate processing apparatus having one or more processing units, a step of classifying the scores into a plurality of levels, and a step of displaying an evaluation result screen including a display area including a graph showing an occurrence rate of each level of the scores, the number of occurrences of each level, and a graph showing temporal change in the number of occurrences of a worst level of the scores when substrates have been processed through a predetermined method with respect to each of the two or more processing units. Accordingly, a data processing method through which a state of the substrate processing apparatus can be easily ascertained is provided.

公开(公告)号：US10720333B2

公开(公告)日：2020-07-21

申请号：US16198410

申请日：2018-11-21

Applicant: SCREEN Holdings Co, Ltd.

Inventor： Tomonori Fujiwara ,  Nobuyuki Shibayama ,  Yukifumi Yoshida ,  Tetsuya Shibata ,  Akiyoshi Nakano

IPC: H01L21/306 ,  H01L21/67 ,  H01L21/687 ,  H01L21/02

Abstract: A substrate processing apparatus includes: a substrate holder to hold a substrate in a horizontal posture while rotating the substrate about a vertical rotary axis passing through the center of a plane of the substrate; a guard member having a shape extending along at least part of a surface peripheral area of the substrate, the guard member being placed in a position close to the surface peripheral area of the substrate held by the substrate holder in a noncontact manner; a cup being a tubular member with an open top end, the cup being provided so as to surround the substrate held by the substrate holder and the guard member together; and a nozzle from which a processing liquid is discharged to the surface peripheral area of the substrate held by the substrate holder. The nozzle is placed on a side opposite the cup with respect to at least part of the guard member.

公开(公告)号：US10199231B2

公开(公告)日：2019-02-05

申请号：US14487573

申请日：2014-09-16

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Tomonori Fujiwara ,  Nobuyuki Shibayama ,  Yukifumi Yoshida ,  Tetsuya Shibata ,  Akiyoshi Nakano

IPC: H01L21/306 ,  H01L21/67 ,  H01L21/687

Abstract: A substrate processing apparatus includes: a substrate holder to hold a substrate in a horizontal posture while rotating the substrate about a vertical rotary axis passing through the center of a plane of the substrate; a guard member having a shape extending along at least part of a surface peripheral area of the substrate, the guard member being placed in a position close to the surface peripheral area of the substrate held by the substrate holder in a noncontact manner; a cup being a tubular member with an open top end, the cup being provided so as to surround the substrate held by the substrate holder and the guard member together; and a nozzle from which a processing liquid is discharged to the surface peripheral area of the substrate held by the substrate holder. The nozzle is placed on a side opposite the cup with respect to at least part of the guard member.

公开(公告)号：US11829451B2

公开(公告)日：2023-11-28

申请号：US17535578

申请日：2021-11-25

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Hideji Naohara ,  Tomonori Fujiwara ,  Yumiko Hirato ,  Atsushi Sonoda

IPC: G05B23/02 ,  G06F18/2415 ,  G06F11/32 ,  G06F3/0482 ,  G06F18/00

CPC classification number: G06F18/2415 ,  G06F3/0482 ,  G06F11/324 ,  G06F18/00

Abstract: A data processing method includes a step of obtaining scores of time-series data by comparing the time-series data with reference data in order to process time-series data acquired in a substrate processing apparatus having one or more processing units, a step of classifying the scores into a plurality of levels, and a step of displaying an evaluation result screen including a display area including a graph showing an occurrence rate of each level of the scores, the number of occurrences of each level, and a graph showing temporal change in the number of occurrences of a worst level of the scores when substrates have been processed through a predetermined method with respect to each of the two or more processing units. Accordingly, a data processing method through which a state of the substrate processing apparatus can be easily ascertained is provided.

公开(公告)号：US11342190B2

公开(公告)日：2022-05-24

申请号：US16883035

申请日：2020-05-26

Applicant: SCREEN Holdings Co, Ltd.

Inventor： Tomonori Fujiwara ,  Nobuyuki Shibayama ,  Yukifumi Yoshida ,  Tetsuya Shibata ,  Akiyoshi Nakano

IPC: H01L21/306 ,  H01L21/67 ,  H01L21/687 ,  H01L21/02

Abstract: A substrate processing apparatus includes: a spin base rotatable in a horizontal plane about a centered rotary axis; a holder to hold a substrate above the spin base; a lower surface processing unit to discharge a processing liquid toward a lower surface of the substrate held by the holder. The holder includes: a plurality of first abutting members that abut the substrate from a position obliquely below said substrate and that hold the substrate in a horizontal posture in a position spaced from an upper surface of said spin base; a plurality of second abutting members that abut the substrate from a position lateral to said substrate and that hold said substrate in a horizontal posture in a position spaced from the upper surface of said spin base. A switching mechanism switches between a first holding condition state where the first abutting members hold the substrate and a second holding condition state where the second abutting members hold the substrate; wherein, in the second holding condition state, the first abutting members are spaced from the substrate, and in the first holding condition state, an upper surface of the substrate is in a position above an upper end surface of each of the first and second abutting members are spaced from the substrate.

公开(公告)号：US11243862B2

公开(公告)日：2022-02-08

申请号：US16543611

申请日：2019-08-18

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Hideji Naohara ,  Tomonori Fujiwara ,  Yumiko Hirato ,  Atsushi Sonoda

IPC: G06F11/32 ,  G06F3/0482 ,  G06K9/62

Abstract: A data processing method includes a step of obtaining scores of time-series data by comparing the time-series data with reference data in order to process time-series data acquired in a substrate processing apparatus having one or more processing units, a step of classifying the scores into a plurality of levels, and a step of displaying an evaluation result screen including a graph showing an occurrence rate of each level of the scores, the number of occurrences of each level, and a graph showing temporal change in the number of occurrences of a worst level of the scores when substrates have been processed through a predetermined method with respect to the processing units. Accordingly, a data processing method through which a state of the substrate processing apparatus can be easily ascertained is provided.

公开(公告)号：US10058900B2

公开(公告)日：2018-08-28

申请号：US14487499

申请日：2014-09-16

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Tomonori Fujiwara ,  Nobuyuki Shibayama ,  Yukifumi Yoshida

IPC: H01L21/02 ,  H01L21/67 ,  B08B3/08 ,  H01L21/687

CPC classification number: B08B3/08 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/68728

Abstract: A substrate processing apparatus includes a substrate holder, and a discharge head for peripheral area from which a fluid is discharge toward a surface peripheral area of the substrate held on the substrate holder. The discharge head for peripheral area includes multiple nozzles, and a support part that supports the nozzles integrally. The nozzles include a processing liquid nozzle from which a processing liquid is discharged toward the surface peripheral area, and a gas nozzle from which gas is discharged toward the surface peripheral area. The gas nozzle is placed upstream of a rotative direction of the substrate relative to the processing liquid nozzle.

公开(公告)号：US11710629B2

公开(公告)日：2023-07-25

申请号：US17349702

申请日：2021-06-16

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Tomonori Fujiwara ,  Nobuyuki Shibayama ,  Yukifumi Yoshida

IPC: H01L21/02 ,  B08B3/08 ,  H01L21/67 ,  H01L21/687

CPC classification number: H01L21/02087 ,  B08B3/08 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/68728

Abstract: A substrate processing apparatus includes a substrate holder, and a discharge head for peripheral area from which a fluid is discharge toward a surface peripheral area of the substrate held on the substrate holder. The discharge head for peripheral area includes multiple nozzles, and a support part that supports the nozzles integrally. The nozzles include a processing liquid nozzle from which a processing liquid is discharged toward the surface peripheral area, and a gas nozzle from which gas is discharged toward the surface peripheral area. The gas nozzle is placed upstream of a rotative direction of the substrate relative to the processing liquid nozzle.

公开(公告)号：US11094529B2

公开(公告)日：2021-08-17

申请号：US16040330

申请日：2018-07-19

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Tomonori Fujiwara ,  Nobuyuki Shibayama ,  Yukifumi Yoshida

IPC: H01L21/02 ,  B08B3/08 ,  H01L21/67 ,  H01L21/687

Abstract: A substrate processing apparatus includes a substrate holder, and a discharge head for peripheral area from which a fluid is discharge toward a surface peripheral area of the substrate held on the substrate holder. The discharge head for peripheral area includes multiple nozzles, and a support part that supports the nozzles integrally. The nozzles include a processing liquid nozzle from which a processing liquid is discharged toward the surface peripheral area, and a gas nozzle from which gas is discharged toward the surface peripheral area. The gas nozzle is placed upstream of a rotative direction of the substrate relative to the processing liquid nozzle.