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公开(公告)号:US20250051573A1
公开(公告)日:2025-02-13
申请号:US18720896
申请日:2022-12-22
Applicant: Sekisui Chemical Co., Ltd
Inventor: Hayate NOMOTO , Taro SHIOJIMA , Tokushige SHICHIRI , Kenichiro SATO , Hidenobu DEGUCHI
IPC: C08L83/12 , C08J5/18 , H01L27/146
Abstract: The present invention aims to provide a curable resin composition capable of forming a film which, even when made thick, is less likely to crack at high temperature under a nitrogen atmosphere, a cured film formed using the curable resin composition, a stack including the cured film, an imaging device including the stack, an semiconductor device including the stack, a method for producing the stack, and a method for producing an element including a bonding electrode for use in production of the stack. Provided is a curable resin composition containing: a polyimide; and a silsesquioxane, the polyimide being contained in an amount of 0.5 parts by weight or more and 50 parts by weight or less relative to 100 parts by weight of the silsesquioxane.
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公开(公告)号:US20230245936A1
公开(公告)日:2023-08-03
申请号:US18010288
申请日:2021-06-18
Applicant: SEKISUI CHEMICAL CO., LTD.
Inventor: Taro SHIOJIMA , Kenichiro SATO , Hidenobu DEGUCHI , Hideaki ISHIZAWA , Munehiro HATAI , Tokushige SHICHIRI
CPC classification number: H01L23/296 , C08G77/44 , C09J5/02 , C09J183/10 , H01L24/05 , H01L24/08 , H01L24/80 , H01L24/03 , H01L21/56 , C08G77/80
Abstract: The present invention aims to provide a stack having high electrical connection reliability, a curable resin composition used for the stack, a method for producing the stack, a method for producing a substrate having a bonding electrode used for producing the stack, a semiconductor device including the stack, and an imaging device including the stack. Provided is a stack sequentially including: a first substrate having an electrode; an organic film; and a second substrate having an electrode, the electrode of the first substrate and the electrode of the second substrate are electrically connected via a through-hole extending through the organic film.
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公开(公告)号:US20250054895A1
公开(公告)日:2025-02-13
申请号:US18722920
申请日:2022-12-22
Applicant: Sekisui Chemical Co., Ltd.
Inventor: Taro SHIOJIMA , Hayate NOMOTO , Kenichiro SATO , Hidenobu DEGUCHI , Tokushige SHICHIRI
IPC: H01L23/00 , C09D183/06 , H01L27/146
Abstract: The present invention aims to provide a curable resin composition that can planarize bonding surfaces and connect elements without leaving surface voids even when the elements have irregularities on the surface, thus imparting high bonding reliability between the elements, a cured film formed using the curable resin composition, a stack including the cured film, an imaging device including the stack, an semiconductor device including the stack, a method for producing the stack, and a method for producing an element including a bonding electrode for use in production of the stack. Provided is a curable resin composition containing: an organosilicon compound; and a solvent, the curable resin composition having a viscosity at 25° C. of 2,000 cP or less, the solvent being contained in an amount of 50% by weight or less in the curable resin composition, the curable resin composition having an adhesion of a score of 0 to 2 as measured by a cross-cut method in conformity with JIS K5600-5-6 using a measurement sample obtained by spin-coating a silicon wafer with the composition, evaporating the solvent, and then heat curing at 300° C. for one hour to form a film.
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