METHOD FOR LIFTING SUBSTRATE AND APPARATUS FOR TREATING SUBSTRATE

    公开(公告)号:US20210202296A1

    公开(公告)日:2021-07-01

    申请号:US17138427

    申请日:2020-12-30

    Abstract: A method for lifting a substrate includes raising the substrate off a support plate having the substrate placed thereon, by using a lift pin, in which the lift pin raises the substrate off the support plate while vertically moving between a lowered position spaced apart downward from the support plate by a first distance and a raised position spaced apart upward from the support plate by a second distance, and the lift pin is brought into contact with the substrate in an interval in which the lift pin is decelerated or moved at a constant velocity.

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