公开(公告)号：US10682674B2

公开(公告)日：2020-06-16

申请号：US15796415

申请日：2017-10-27

Applicant: SEMES CO., LTD.

Inventor： Younghun Jung ,  Chang Uk Park

IPC: B08B3/10 ,  B08B11/02 ,  H01L21/67 ,  H01L21/683 ,  H01L21/687 ,  B05B9/00 ,  B05C11/10 ,  B08B3/08 ,  C11D11/00 ,  H01L21/02 ,  B08B3/02

Abstract: Embodiments of the inventive concept relate to an apparatus and a method for removing a liquid residing on a substrate. The substrate treating apparatus includes a substrate support unit configured to support the substrate, a liquid supply unit configured to supply a liquid onto the substrate supported by the substrate support unit, and a heating unit configured to heat the substrate supported by the substrate support unit, wherein the substrate support unit includes a support plate having a seating surface, on which the substrate is seated, and having a suction hole on the seating surface, a rotary shaft configured to rotate the support plate, and a vacuum member configured to reduce a pressure of the suction hole such that the substrate seated on the seating surface is vacuum-suctioned on the support plate. Accordingly, the drying efficiency of the substrate may be increased.

公开(公告)号：US10274827B2

公开(公告)日：2019-04-30

申请号：US15622415

申请日：2017-06-14

Applicant: SEMES CO., LTD.

Inventor： Ki Seung Lee ,  Chang Uk Park

IPC: G03F7/16 ,  G03F7/00 ,  G03F7/30 ,  H01L27/00

Abstract: A substrate treating apparatus and a substrate treating method are provided. The substrate treating apparatus comprises: a process chamber; a support member positioned in an inner space of the process chamber to support the substrate; an exhaust line provided to communicate with the interior of the process chamber; an exhaust member for providing a suction pressure to the exhaust line; and a controller for controlling the exhaust member when dividing the substrate treating step in which the treating for the substrate is performed into the first treating step and the second treating step, a difference is generated between the pressure that the exhaust member provides to the exhaust line in the first treating step and the pressure that the exhaust member provides to the exhaust line in the second treating step.