公开(公告)号：US20240222148A1

公开(公告)日：2024-07-04

申请号：US18395487

申请日：2023-12-23

申请人： SEMES CO., LTD.

发明人： Ickkyun KIM ,  Sang Yong EOM ,  Cheol PARK ,  Moon Hyung BAE ,  Tae Young KIM

IPC分类号： H01L21/67 ,  H01L21/677

CPC分类号： H01L21/67017 ,  H01L21/67098 ,  H01L21/6715 ,  H01L21/67161 ,  H01L21/67253 ,  H01L21/67766 ,  G03F7/162

摘要： Provided is an airflow control system and airflow control method capable of preventing the inflow of foreign, the airflow control system including at least one grating panel mounted on a floor of a clean room and including a plurality of through holes, a semiconductor manufacturing equipment spaced apart from the grating panel by a gap space by using supports or legs, and including a fan mounted toward the grating panel, and a negative pressure preventer for preventing a negative pressure locally formed in the gap space due to a pressure difference between an outer downward airflow flowing along sides of the semiconductor manufacturing equipment and expelled to an outside through the through holes of the grating panel, and an inner downward airflow flowing from the semiconductor manufacturing equipment to the grating panel by the fan and expelled to the outside through the through holes of the grating panel.