公开(公告)号：US20240234171A1

公开(公告)日：2024-07-11

申请号：US18406880

申请日：2024-01-08

Applicant: SEMES CO., LTD.

Inventor： Do Hyeon YOON ,  Eun Seok KIM ,  Mi So PARK

IPC: H01L21/67

CPC classification number: H01L21/67028

Abstract: Provided is an apparatus for processing a substrate, the apparatus including: a liquid treatment chamber; a drying chamber; and a light treatment chamber, in which the light treatment chamber includes: a treatment housing having a treatment space in which the substrate is processed; a support member for supporting the substrate in the treatment space; a light source for irradiating the substrate supported on the support member with light in the form of pulses; and a light filter for selecting a set range of wavelengths of the light generated by the light source and allowing the selected wavelengths to pass through.

公开(公告)号：US20250046631A1

公开(公告)日：2025-02-06

申请号：US18792709

申请日：2024-08-02

Applicant: SEMES CO., LTD.

Inventor： Young Hun LEE ,  Do Hyeon YOON ,  Eun Seok KIM

IPC: H01L21/67 ,  H01L21/677

Abstract: Disclosed is a substrate treating apparatus including: a treating chamber for treating a substrate; a transfer unit for loading and unloading the substrate into and from a treatment space in which the substrate is treated in the treating chamber; and a heating unit provided to be loaded into and unloaded from the treatment space, and for cleaning the treatment space by heating, in which the treating chamber includes: a chamber body providing the treatment space; and a support unit for supporting the substrate within the treatment space; and a fluid supply unit for supplying a fluid, which treats the substrate, into the treatment space, and the heating unit includes: a base; and a heater installed on the base.