公开(公告)号：US12266546B2

公开(公告)日：2025-04-01

申请号：US17969155

申请日：2022-10-19

Applicant: SEMES CO., LTD.

Inventor： Do Gyeong Ha ,  Tae Suk Yun ,  Moon Soon Choi ,  Gu Yeol An ,  Chae Young Lim ,  Bu Young Jung

IPC: H01L21/67

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a support unit configured to support a substrate; and a liquid supply unit configured to supply a treating liquid onto the substrate supported on the support unit, and wherein the liquid supply unit comprises: a tank configured to have an accommodation space for storing the treating liquid therein; a circulation line configured to circulate the treating liquid stored in the accommodation space; a supplementary line configured to supply the treating liquid to the accommodation space, and at which a valve is installed; a heater installed at the circulation line, and for heating the treating liquid; and a controller is configured to control the valve and the heater.