公开(公告)号：US11684955B2

公开(公告)日：2023-06-27

申请号：US17138301

申请日：2020-12-30

Applicant: SEMES CO., LTD.

Inventor： Tae Suk Yun ,  Hyeon Suk Park

IPC: B08B3/08 ,  B08B3/02 ,  B08B13/00 ,  B08B3/10 ,  H01L21/67

CPC classification number: B08B3/08 ,  B08B3/02 ,  B08B3/10 ,  B08B13/00 ,  B08B2203/007 ,  H01L21/67017 ,  H01L21/67051

Abstract: An apparatus for processing a substrate includes a housing having a processing space in which the substrate is processed, a support unit that supports the substrate in the processing space, a nozzle that dispenses a chemical onto the substrate placed on the support unit, a chemical supply unit that supplies the chemical to the nozzle, and a controller that controls the chemical supply unit.

公开(公告)号：US12266546B2

公开(公告)日：2025-04-01

申请号：US17969155

申请日：2022-10-19

Applicant: SEMES CO., LTD.

Inventor： Do Gyeong Ha ,  Tae Suk Yun ,  Moon Soon Choi ,  Gu Yeol An ,  Chae Young Lim ,  Bu Young Jung

IPC: H01L21/67

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a support unit configured to support a substrate; and a liquid supply unit configured to supply a treating liquid onto the substrate supported on the support unit, and wherein the liquid supply unit comprises: a tank configured to have an accommodation space for storing the treating liquid therein; a circulation line configured to circulate the treating liquid stored in the accommodation space; a supplementary line configured to supply the treating liquid to the accommodation space, and at which a valve is installed; a heater installed at the circulation line, and for heating the treating liquid; and a controller is configured to control the valve and the heater.