HEATING UNIT, SUBSTRATE TREATING APPARATUS INCLUDING THE SAME, METHOD OF CONTROLLING HEATING UNIT

    公开(公告)号:US20230072272A1

    公开(公告)日:2023-03-09

    申请号:US17902056

    申请日:2022-09-02

    Abstract: Provided is a heating unit including: a heating plate for heating a substrate; a heater installed in the heating plate; and a control unit for controlling the heater, in which wherein the heater includes: a first heater; and a second heater installed at a position different from a position of the first heater, and the control unit includes: a power source for transferring power to at least one of the first heater and the second heater; and a switching module for connecting the first heater and the second heater in series or connecting the first heater and the second heater in parallel.

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