公开(公告)号：US20170345688A1

公开(公告)日：2017-11-30

申请号：US15607361

申请日：2017-05-26

Applicant: SEMES CO., LTD.

Inventor： HYO WON LEE ,  YOUNG HUN LEE

IPC: H01L21/67 ,  B05C5/02 ,  B05C5/00

CPC classification number: H01L21/67051 ,  B05C5/004 ,  B05C5/02 ,  B05C11/1005 ,  H01L21/67023 ,  H01L21/67034 ,  H01L21/67109 ,  H01L21/67178 ,  H01L21/6719 ,  H01L21/67253 ,  H01L21/67703

Abstract: Disclosed are an apparatus and a method for liquid-treating a substrate. An apparatus for treating a substrate includes a liquid treating unit that liquid-treats a substrate by supplying a liquid onto a substrate, a weight measuring unit that measures a weight of the remained liquid on the substrate, and a transfer unit that transfers the substrate between the liquid treating unit and the weight measuring unit. Accordingly, the weight of the remained liquid may be measured more promptly.