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公开(公告)号：US20180061649A1
公开(公告)日：2018-03-01
申请号：US15681347
申请日：2017-08-19
Applicant: SEMES CO., LTD.
Inventor： MIN JUNG PARK , JUNG YUL LEE , HYUN HEE LEE , SOO HYUN CHO
IPC: H01L21/302 , H01L21/683 , H01L21/02 , H01L21/311 , H01L21/67 , F26B5/04
Abstract: Disclosed are an apparatus and a method for treating a substrate. The method includes repeatedly rotating the substrate alternately at a first speed and at a second speed while the treatment liquid is supplied, and the second speed is higher than the first speed.
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