公开(公告)号：US20240100572A1

公开(公告)日：2024-03-28

申请号：US18182498

申请日：2023-03-13

Applicant: SEMES CO., LTD.

Inventor： Sung Hun EOM ,  Tae Won Yun ,  Ha Neul Yoo ,  Ji Hyeong Yu

IPC: B08B3/02 ,  B08B1/00 ,  B08B1/02 ,  B08B3/08

CPC classification number: B08B3/022 ,  B08B1/002 ,  B08B1/02 ,  B08B3/08 ,  H01J37/32357

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a support unit configured to support a substrate; and a cleaning unit configured to clean a bottom surface of the substrate supported on the support unit, and wherein the cleaning unit comprises: a body; and a protrusion formed to be upwardly protruding from the body, and the protrusion is positioned to be spaced apart from the bottom surface.