公开(公告)号：US20220093430A1

公开(公告)日：2022-03-24

申请号：US17474469

申请日：2021-09-14

Applicant: SEMES CO., LTD.

Inventor： Ohyeol KWON ,  Soo Yeon SHIN ,  Hyun Hoo KIM ,  Myung Chan CHO

IPC: H01L21/67 ,  G06T7/00 ,  G06N3/04

Abstract: The inventive concept provides a method to determine whether a substrate treatment process is normal using a deep learning model. The method comprising receiving input on a substrate treatment process video, preprocessing the inputted video, using the deep learning model to study a preprocessed video, and determining whether the substrate treatment process is normal by comparing the trained model and a real time substrate treatment process video.