公开(公告)号：US20230071737A1

公开(公告)日：2023-03-09

申请号：US17901904

申请日：2022-09-02

Applicant: SEMES CO., LTD.

Inventor： Myung Chan CHO

IPC: H01L21/02 ,  H01L21/67

Abstract: Provided is a substrate treating method. The substrate treating method includes: a first supercritical processing operation of loading a first substrate into a supercritical chamber and supercritically processing the first substrate in the supercritical chamber; a resting operation of maintaining the supercritical chamber in an empty state for a first time until a temperature in the supercritical chamber becomes a preset temperature by opening the supercritical chamber after the first substrate is unloaded from the supercritical chamber; and a second supercritical processing operation of loading a second substrate into the supercritical chamber and supercritically processing the second substrate in the supercritical chamber.

公开(公告)号：US20220093430A1

公开(公告)日：2022-03-24

申请号：US17474469

申请日：2021-09-14

Applicant: SEMES CO., LTD.

Inventor： Ohyeol KWON ,  Soo Yeon SHIN ,  Hyun Hoo KIM ,  Myung Chan CHO

IPC: H01L21/67 ,  G06T7/00 ,  G06N3/04

Abstract: The inventive concept provides a method to determine whether a substrate treatment process is normal using a deep learning model. The method comprising receiving input on a substrate treatment process video, preprocessing the inputted video, using the deep learning model to study a preprocessed video, and determining whether the substrate treatment process is normal by comparing the trained model and a real time substrate treatment process video.